A silicon-etched probe for 3-D coordinate measurements with an uncertainty below 0.1 μm

H. Haitjema; W.O. Pril; P.H.J. Schellekens

doi:10.1109/19.982938

A silicon-etched probe for 3-D coordinate measurements with an uncertainty below 0.1 μm

H. Haitjema, W.O. Pril, P.H.J. Schellekens

Mechanical Engineering

Research output: Contribution to journal › Article › Academic › peer-review

28 Citations (Scopus)

Abstract

The increasing demand for accurate coordinate measurements on products demands new concepts of probe design. Results of some realized designs will be given. One of the most promising utilizes microtechnology and etching in silicon in order to realize the necessary dimensional design with flexure hinges. Microtechnology is also used for the detection system; strain gages are integrated in the probe. Results for two probes will be given and possible future developments will be discussed.

Original language	English
Pages (from-to)	1519-1523
Journal	IEEE Transactions on Instrumentation and Measurement
Volume	50
Issue number	6
DOIs	https://doi.org/10.1109/19.982938
Publication status	Published - 2001

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abstract = "The increasing demand for accurate coordinate measurements on products demands new concepts of probe design. Results of some realized designs will be given. One of the most promising utilizes microtechnology and etching in silicon in order to realize the necessary dimensional design with flexure hinges. Microtechnology is also used for the detection system; strain gages are integrated in the probe. Results for two probes will be given and possible future developments will be discussed.",

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A silicon-etched probe for 3-D coordinate measurements with an uncertainty below 0.1 μm

Abstract

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