A process for topographically selective deposition on 3D nanostructures by ion implantation

W.-H. Kim, F.S.M. Hashemi, A.J.M. Mackus, J. Singh, K. Yeongin, D. Bobb-Semple, Y. Fan, T. Kaufman-Osborn, L. Godet, S.F. Bent

Research output: Contribution to journal › Article › Academic › peer-review