A perspective on stage dynamics and control

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Abstract

In the semiconductor industry, a wafer stepper is used to expose the pattern on a mask (‘reticle’) onto a wafer. Accurate positioning of the reticle and the wafer is of crucial importance for creating a working IC. This paper reflects on the stage dynamics and control design in Stepper technology, introduces the modifications needed to successfully implement Scanner technology, and shows the further improvements in dualstage TWINSCAN systems.
Original languageEnglish
Title of host publicationProceedings of the ASPE 2008 Spring Topical Meeting "Precision Mechanical Design and Mechatronics for Sub-50 nm Semiconductor Equipment", April 7-8 2008, Berkeley, California
PublisherAmerican Society of Precision Engineering (ASPE)
Pages1-3
Publication statusPublished - 2008
Eventconference; ASPE 2008 Spring Topical Meeting -
Duration: 1 Jan 2008 → …

Conference

Conferenceconference; ASPE 2008 Spring Topical Meeting
Period1/01/08 → …
OtherASPE 2008 Spring Topical Meeting

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