A novel commercial plasma source for ultrahigh-rate deposition of silicon nitride for solar cells

P.J. Oever, van den; W.M.M. Kessels; B. Hoex; R.C.M. Bosch; A.J.M. van Erven; M.D. Bijker; M.C.M. Sanden, van de

A novel commercial plasma source for ultrahigh-rate deposition of silicon nitride for solar cells

P.J. Oever, van den
, W.M.M. Kessels
, B. Hoex
, R.C.M. Bosch
, A.J.M. van Erven
, M.D. Bijker
, M.C.M. Sanden, van de

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

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Abstract

Recently, a new inline tool for high rate deposition of silicon nitride for (multi) crystalline silicon solar cells, the "DEPx", was introduced. This tool uses the so called expanding thermal plasma (ETP) technique operated on an Ar-NH3 gas mixture to dissociate SiH4. We will discuss some of the important properties of this remote and high density plasma in terms of ion densities, radical densities (N, NH, NH2) and the NH3 consumption degree.

Original language	English
Title of host publication	Proceedings 20th European Photovoltaic Solar Energy Conference, Barcelona, Spain
Pages	1395-
Publication status	Published - 2005

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@inproceedings{6546f694d0984087a8a3e26adb3c38ad,

title = "A novel commercial plasma source for ultrahigh-rate deposition of silicon nitride for solar cells",

abstract = "Recently, a new inline tool for high rate deposition of silicon nitride for (multi) crystalline silicon solar cells, the {"}DEPx{"}, was introduced. This tool uses the so called expanding thermal plasma (ETP) technique operated on an Ar-NH3 gas mixture to dissociate SiH4. We will discuss some of the important properties of this remote and high density plasma in terms of ion densities, radical densities (N, NH, NH2) and the NH3 consumption degree.",

author = "\{Oever, van den\}, P.J. and W.M.M. Kessels and B. Hoex and R.C.M. Bosch and \{van Erven\}, A.J.M. and M.D. Bijker and \{Sanden, van de\}, M.C.M.",

year = "2005",

language = "English",

pages = "1395--",

booktitle = "Proceedings 20th European Photovoltaic Solar Energy Conference, Barcelona, Spain",

}

TY - GEN

T1 - A novel commercial plasma source for ultrahigh-rate deposition of silicon nitride for solar cells

AU - Oever, van den, P.J.

AU - Kessels, W.M.M.

AU - Hoex, B.

AU - Bosch, R.C.M.

AU - van Erven, A.J.M.

AU - Bijker, M.D.

AU - Sanden, van de, M.C.M.

PY - 2005

Y1 - 2005

N2 - Recently, a new inline tool for high rate deposition of silicon nitride for (multi) crystalline silicon solar cells, the "DEPx", was introduced. This tool uses the so called expanding thermal plasma (ETP) technique operated on an Ar-NH3 gas mixture to dissociate SiH4. We will discuss some of the important properties of this remote and high density plasma in terms of ion densities, radical densities (N, NH, NH2) and the NH3 consumption degree.

AB - Recently, a new inline tool for high rate deposition of silicon nitride for (multi) crystalline silicon solar cells, the "DEPx", was introduced. This tool uses the so called expanding thermal plasma (ETP) technique operated on an Ar-NH3 gas mixture to dissociate SiH4. We will discuss some of the important properties of this remote and high density plasma in terms of ion densities, radical densities (N, NH, NH2) and the NH3 consumption degree.

M3 - Conference contribution

SP - 1395-

BT - Proceedings 20th European Photovoltaic Solar Energy Conference, Barcelona, Spain

ER -

A novel commercial plasma source for ultrahigh-rate deposition of silicon nitride for solar cells

Abstract

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