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A new concept for spatially divided deep reactive ion etching with ALD based passivation
F. Roozeboom, B.J. Kniknie, A.M. Lankhorst, G.J.J. Winands, R. Knaapen, M. Smets, P. Poodt, G. Dingemans, W. Keuning, W.M.M. Kessels
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review
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