A multiphysics modeling approach for thermal aberration prediction and control in extreme ultraviolet lithography

Michel Habets; R.W.H. Merks; Siep Weiland; Wim Coene

doi:10.1364/AOMS.2015.AOM4B.2

A multiphysics modeling approach for thermal aberration prediction and control in extreme ultraviolet lithography

Michel Habets
, R.W.H. Merks
, Siep Weiland
, Wim Coene

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

6 Citations (Scopus)

23 Downloads (Pure)

Original language	English
Title of host publication	Imaging and Applied Optics 2015
Place of Publication	Washington, D.C.
Publisher	Optical Society of America (OSA)
Number of pages	3
ISBN (Print)	9781943580002
DOIs	https://doi.org/10.1364/AOMS.2015.AOM4B.2
Publication status	Published - 2015
Event	Adaptive Optics: Analysis, Methods & Systems 2015 (AO 2015), June 7-11, 2015, Arlington, VA, USA - Arlington, VA, United States Duration: 7 Jun 2015 → 11 Jun 2015

Publication series

Name	OSA Technical Digest

Conference

Conference	Adaptive Optics: Analysis, Methods & Systems 2015 (AO 2015), June 7-11, 2015, Arlington, VA, USA
Abbreviated title	AO 2015
Country/Territory	United States
City	Arlington, VA
Period	7/06/15 → 11/06/15

Access to Document

10.1364/AOMS.2015.AOM4B.2

Cite this

@inproceedings{2c5d1cd6c4144e64befb8ad0513b3fb4,

title = "A multiphysics modeling approach for thermal aberration prediction and control in extreme ultraviolet lithography",

author = "Michel Habets and R.W.H. Merks and Siep Weiland and Wim Coene",

year = "2015",

doi = "10.1364/AOMS.2015.AOM4B.2",

language = "English",

isbn = "9781943580002",

series = "OSA Technical Digest",

publisher = "Optical Society of America (OSA)",

booktitle = "Imaging and Applied Optics 2015",

address = "United States",

note = "Adaptive Optics: Analysis, Methods \& Systems 2015 (AO 2015), June 7-11, 2015, Arlington, VA, USA, AO 2015 ; Conference date: 07-06-2015 Through 11-06-2015",

}

Habets, M, Merks, RWH, Weiland, S & Coene, W 2015, A multiphysics modeling approach for thermal aberration prediction and control in extreme ultraviolet lithography. in Imaging and Applied Optics 2015., AOM4B.2, OSA Technical Digest, Optical Society of America (OSA), Washington, D.C., Adaptive Optics: Analysis, Methods & Systems 2015 (AO 2015), June 7-11, 2015, Arlington, VA, USA, Arlington, VA, United States, 7/06/15. https://doi.org/10.1364/AOMS.2015.AOM4B.2

A multiphysics modeling approach for thermal aberration prediction and control in extreme ultraviolet lithography. / Habets, Michel; Merks, R.W.H.; Weiland, Siep et al.
Imaging and Applied Optics 2015. Washington, D.C.: Optical Society of America (OSA), 2015. AOM4B.2 (OSA Technical Digest).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - A multiphysics modeling approach for thermal aberration prediction and control in extreme ultraviolet lithography

AU - Habets, Michel

AU - Merks, R.W.H.

AU - Weiland, Siep

AU - Coene, Wim

PY - 2015

Y1 - 2015

U2 - 10.1364/AOMS.2015.AOM4B.2

DO - 10.1364/AOMS.2015.AOM4B.2

M3 - Conference contribution

AN - SCOPUS:84935123767

SN - 9781943580002

T3 - OSA Technical Digest

BT - Imaging and Applied Optics 2015

PB - Optical Society of America (OSA)

CY - Washington, D.C.

T2 - Adaptive Optics: Analysis, Methods & Systems 2015 (AO 2015), June 7-11, 2015, Arlington, VA, USA

Y2 - 7 June 2015 through 11 June 2015

ER -