@inproceedings{2c5d1cd6c4144e64befb8ad0513b3fb4,
title = "A multiphysics modeling approach for thermal aberration prediction and control in extreme ultraviolet lithography",
author = "Michel Habets and R.W.H. Merks and Siep Weiland and Wim Coene",
year = "2015",
doi = "10.1364/AOMS.2015.AOM4B.2",
language = "English",
isbn = "9781943580002",
series = "OSA Technical Digest",
publisher = "Optical Society of America (OSA)",
booktitle = "Imaging and Applied Optics 2015",
address = "United States",
note = "Adaptive Optics: Analysis, Methods & Systems 2015 (AO 2015), June 7-11, 2015, Arlington, VA, USA, AO 2015 ; Conference date: 07-06-2015 Through 11-06-2015",
}