A multiphysics modeling approach for thermal aberration prediction and control in extreme ultraviolet lithography

Michel Habets, R.W.H. Merks, Siep Weiland, Wim Coene

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

2 Citations (Scopus)
21 Downloads (Pure)
Original languageEnglish
Title of host publicationImaging and Applied Optics 2015
Place of PublicationWashington, D.C.
PublisherOptical Society of America (OSA)
Number of pages3
ISBN (Print)9781943580002
DOIs
Publication statusPublished - 2015
EventAdaptive Optics: Analysis, Methods & Systems 2015 (AO 2015), June 7-11, 2015, Arlington, VA, USA - Arlington, VA, United States
Duration: 7 Jun 201511 Jun 2015

Publication series

NameOSA Technical Digest

Conference

ConferenceAdaptive Optics: Analysis, Methods & Systems 2015 (AO 2015), June 7-11, 2015, Arlington, VA, USA
Abbreviated titleAO 2015
CountryUnited States
CityArlington, VA
Period7/06/1511/06/15

Cite this

Habets, M., Merks, R. W. H., Weiland, S., & Coene, W. (2015). A multiphysics modeling approach for thermal aberration prediction and control in extreme ultraviolet lithography. In Imaging and Applied Optics 2015 [AOM4B.2] (OSA Technical Digest). Optical Society of America (OSA). https://doi.org/10.1364/AOMS.2015.AOM4B.2