TY - JOUR
T1 - A model for the deposition of a-C
T2 - H using an expanding thermal arc
AU - Kessels, W. M.M.
AU - Gielen, J. W.A.M.
AU - Van De Sanden, M. C.M.
AU - Van Ijzendoorn, L. J.
AU - Dekempeneer, E. H.A.
AU - Schram, D. C.
PY - 1998
Y1 - 1998
N2 - Amorphous hydrogenated carbon films have been deposited at high growth rates (10-70 nm/s) by seeding acetylene in an expanding thermal argon plasma. The influence of the substrate temperature in the range of -50-300°C on the film properties, e.g. refractive index, hydrogen content and the growth rate, has been investigated. From this, in combination with earlier results, a first attempt at a qualitative deposition model is given.
AB - Amorphous hydrogenated carbon films have been deposited at high growth rates (10-70 nm/s) by seeding acetylene in an expanding thermal argon plasma. The influence of the substrate temperature in the range of -50-300°C on the film properties, e.g. refractive index, hydrogen content and the growth rate, has been investigated. From this, in combination with earlier results, a first attempt at a qualitative deposition model is given.
KW - a-C:H
KW - Deposition
KW - Growth model
KW - Substrate temperature
UR - http://www.scopus.com/inward/record.url?scp=0006044742&partnerID=8YFLogxK
U2 - 10.1016/S0257-8972%2897%2900358-7
DO - 10.1016/S0257-8972%2897%2900358-7
M3 - Article
VL - 98
SP - 1584
EP - 1589
JO - Surface and Coatings Technology
JF - Surface and Coatings Technology
SN - 0257-8972
IS - 1-3
ER -