A model for the deposition of a-C: H using an expanding thermal arc

W. M.M. Kessels; J. W.A.M. Gielen; M. C.M. Van De Sanden; L. J. Van Ijzendoorn; E. H.A. Dekempeneer; D. C. Schram

doi:10.1016/S0257-8972%2897%2900358-7

A model for the deposition of a-C: H using an expanding thermal arc

W. M.M. Kessels, J. W.A.M. Gielen, M. C.M. Van De Sanden, L. J. Van Ijzendoorn, E. H.A. Dekempeneer, D. C. Schram

Research output: Contribution to journal › Article › Academic › peer-review

14 Citations (Scopus)

Abstract

Amorphous hydrogenated carbon films have been deposited at high growth rates (10-70 nm/s) by seeding acetylene in an expanding thermal argon plasma. The influence of the substrate temperature in the range of -50-300°C on the film properties, e.g. refractive index, hydrogen content and the growth rate, has been investigated. From this, in combination with earlier results, a first attempt at a qualitative deposition model is given.

Original language	English
Pages (from-to)	1584-1589
Number of pages	6
Journal	Surface and Coatings Technology
Volume	98
Issue number	1-3
DOIs	https://doi.org/10.1016/S0257-8972%2897%2900358-7 https://doi.org/10.1016/S0257-8972(97)00358-7 https://doi.org/10.1016/S0257-8972(97)00358-7
Publication status	Published - 1998

Keywords

a-C:H
Deposition
Growth model
Substrate temperature

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Kessels, W. M. M., Gielen, J. W. A. M., Van De Sanden, M. C. M., Van Ijzendoorn, L. J., Dekempeneer, E. H. A., & Schram, D. C. (1998). A model for the deposition of a-C: H using an expanding thermal arc. Surface and Coatings Technology, 98(1-3), 1584-1589. https://doi.org/10.1016/S0257-8972%2897%2900358-7, https://doi.org/10.1016/S0257-8972(97)00358-7, https://doi.org/10.1016/S0257-8972(97)00358-7

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abstract = "Amorphous hydrogenated carbon films have been deposited at high growth rates (10-70 nm/s) by seeding acetylene in an expanding thermal argon plasma. The influence of the substrate temperature in the range of -50-300°C on the film properties, e.g. refractive index, hydrogen content and the growth rate, has been investigated. From this, in combination with earlier results, a first attempt at a qualitative deposition model is given.",

keywords = "a-C:H, Deposition, Growth model, Substrate temperature",

author = "Kessels, {W. M.M.} and Gielen, {J. W.A.M.} and {Van De Sanden}, {M. C.M.} and {Van Ijzendoorn}, {L. J.} and Dekempeneer, {E. H.A.} and Schram, {D. C.}",

year = "1998",

doi = "10.1016/S0257-8972%2897%2900358-7",

language = "English",

volume = "98",

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Kessels, WMM, Gielen, JWAM, Van De Sanden, MCM , Van Ijzendoorn, LJ, Dekempeneer, EHA & Schram, DC 1998, 'A model for the deposition of a-C: H using an expanding thermal arc', Surface and Coatings Technology, vol. 98, no. 1-3, pp. 1584-1589. https://doi.org/10.1016/S0257-8972%2897%2900358-7, https://doi.org/10.1016/S0257-8972(97)00358-7, https://doi.org/10.1016/S0257-8972(97)00358-7

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T1 - A model for the deposition of a-C

T2 - H using an expanding thermal arc

AU - Kessels, W. M.M.

AU - Gielen, J. W.A.M.

AU - Van De Sanden, M. C.M.

AU - Van Ijzendoorn, L. J.

AU - Dekempeneer, E. H.A.

AU - Schram, D. C.

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N2 - Amorphous hydrogenated carbon films have been deposited at high growth rates (10-70 nm/s) by seeding acetylene in an expanding thermal argon plasma. The influence of the substrate temperature in the range of -50-300°C on the film properties, e.g. refractive index, hydrogen content and the growth rate, has been investigated. From this, in combination with earlier results, a first attempt at a qualitative deposition model is given.

AB - Amorphous hydrogenated carbon films have been deposited at high growth rates (10-70 nm/s) by seeding acetylene in an expanding thermal argon plasma. The influence of the substrate temperature in the range of -50-300°C on the film properties, e.g. refractive index, hydrogen content and the growth rate, has been investigated. From this, in combination with earlier results, a first attempt at a qualitative deposition model is given.

KW - a-C:H

KW - Deposition

KW - Growth model

KW - Substrate temperature

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EP - 1589

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

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