A model for the deposition of a-C: H using an expanding thermal arc

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Abstract

Amorphous hydrogenated carbon films have been deposited at high growth rates (10-70 nm/s) by seeding acetylene in an expanding thermal argon plasma. The influence of the substrate temperature in the range of -50-300°C on the film properties, e.g. refractive index, hydrogen content and the growth rate, has been investigated. From this, in combination with earlier results, a first attempt at a qualitative deposition model is given.

Original languageEnglish
Pages (from-to)1584-1589
Number of pages6
JournalSurface and Coatings Technology
Volume98
Issue number1-3
DOIs
Publication statusPublished - 1998

Keywords

  • a-C:H
  • Deposition
  • Growth model
  • Substrate temperature

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