A model for the deposition of a-C: H using an expanding thermal arc

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Abstract

Amorphous hydrogenated carbon films have been deposited at high growth rates (10-70 nm/s) by seeding acetylene in an expanding thermal argon plasma. The influence of the substrate temperature in the range of -50-300°C on the film properties, e.g. refractive index, hydrogen content and the growth rate, has been investigated. From this, in combination with earlier results, a first attempt at a qualitative deposition model is given.

Original languageEnglish
Pages (from-to)1584-1589
Number of pages6
JournalSurface and Coatings Technology
Volume98
Issue number1-3
DOIs
Publication statusPublished - 1998

Funding

This research was financially supported by the Dutch Foundation for Fundamental Research (FOM) and the European community. The authors wish to thank W. Arnold Bik from Utrecht University for the nuclear analysis of the material. The work of M.C.M. van de Sanden was made possible by the Royal Netherlands Academy of Arts and Sciences. The authors wish to thank M.l.F. van de Sande, A.B.M. HUsken and H. de long for their skillful technical assistance.

Keywords

  • a-C:H
  • Deposition
  • Growth model
  • Substrate temperature

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