A generic InP-based photonic integration technology

H.P.M.M. Ambrosius, X.J.M. Leijtens, T. Vries, de, J. Bolk, E. Smalbrugge, M.K. Smit

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

3 Citations (Scopus)

Abstract

This paper describes a Generic InP-based Photonic Integration Technology that enables fabrication of a large variety of active- as well as passive circuits. In the COBRA clean room in Eindhoven a robust modular process flow is developed which consists of more than 10 depositions (including epitaxial growth), about 10 lithography steps (depending on the design) and more than 20 dry and wet etching steps. This process can be used to fabricate different circuits on one wafer in so-called multi-project wafer runs which allows a drastic reduction of the fabrication costs making even small-volume production economically feasible.
Original languageEnglish
Title of host publicationCompound Semiconductor Week (CSW/IPRM), 2011 and 23rd International Conference on Indium Phosphide and Related Materials, 22-26 May, 2011, Berlin, Germany
Place of PublicationBerlin
PublisherVDE Verlag
Pages1-4
ISBN (Print)978-3-8007-3356-9
Publication statusPublished - 2011
Eventconference; IPM 2011 -
Duration: 1 Jan 2011 → …

Conference

Conferenceconference; IPM 2011
Period1/01/11 → …
OtherIPM 2011

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