A combinational approach to enhance barrier properties of thin films of polymers: Seeding and capping of PECVD thin films by PEALD

M. Gebhard, F. Mitschker, C. Hoppe, M. Aghaee, D. Rogalla, M. Creatore, G. Grundmeier, P. Awakowicz, A.P.K. Devi

Research output: Contribution to journalArticleAcademicpeer-review

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Abstract

A combinatorial approach to deposit gas barrier layers (GBLs) on polyethylene terephthalate (PET) by means of plasma‐enhanced chemical vapor deposition (PECVD) and plasma‐enhanced atomic layer deposition (PEALD) is presented. Thin films of SiOx and SiOxCyHz obtained from PECVD were grown either subsequently on a PEALD seeding layer (SiO2) or were capped by ultrathin PEALD films of Al2O3 or SiO2. To study the impact of PEALD layers on the overall GBL performance, PECVD coatings with high macro defect densities and low barrier efficiency with regard to the oxygen transmission rate (OTR) were chosen. PEALD seeding layers demonstrated the ability to influence the subsequent PECVD growth in terms of the lower macro defect density (9 macro‐defects mm−2) and improved barrier performance (OTR = 0.8 cm3 m−2 day−1), while the PEALD capping‐route produced GBLs free of macro‐defects.
Original languageEnglish
Article number1700209
Number of pages11
JournalPlasma Processes and Polymers
Volume15
Issue number5
DOIs
Publication statusPublished - 8 Mar 2018

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Atomic layer deposition
inoculation
atomic layer epitaxy
Chemical vapor deposition
Polymers
vapor deposition
Thin films
polymers
barrier layers
thin films
Defect density
Gases
Macros
gases
Oxygen
Polyethylene Terephthalates
polyethylene terephthalate
defects
oxygen
Polyethylene terephthalates

Cite this

Gebhard, M. ; Mitschker, F. ; Hoppe, C. ; Aghaee, M. ; Rogalla, D. ; Creatore, M. ; Grundmeier, G. ; Awakowicz, P. ; Devi, A.P.K. / A combinational approach to enhance barrier properties of thin films of polymers: Seeding and capping of PECVD thin films by PEALD. In: Plasma Processes and Polymers. 2018 ; Vol. 15, No. 5.
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abstract = "A combinatorial approach to deposit gas barrier layers (GBLs) on polyethylene terephthalate (PET) by means of plasma‐enhanced chemical vapor deposition (PECVD) and plasma‐enhanced atomic layer deposition (PEALD) is presented. Thin films of SiOx and SiOxCyHz obtained from PECVD were grown either subsequently on a PEALD seeding layer (SiO2) or were capped by ultrathin PEALD films of Al2O3 or SiO2. To study the impact of PEALD layers on the overall GBL performance, PECVD coatings with high macro defect densities and low barrier efficiency with regard to the oxygen transmission rate (OTR) were chosen. PEALD seeding layers demonstrated the ability to influence the subsequent PECVD growth in terms of the lower macro defect density (9 macro‐defects mm−2) and improved barrier performance (OTR = 0.8 cm3 m−2 day−1), while the PEALD capping‐route produced GBLs free of macro‐defects.",
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A combinational approach to enhance barrier properties of thin films of polymers: Seeding and capping of PECVD thin films by PEALD. / Gebhard, M.; Mitschker, F.; Hoppe, C.; Aghaee, M.; Rogalla, D.; Creatore, M.; Grundmeier, G.; Awakowicz, P.; Devi, A.P.K.

In: Plasma Processes and Polymers, Vol. 15, No. 5, 1700209, 08.03.2018.

Research output: Contribution to journalArticleAcademicpeer-review

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T1 - A combinational approach to enhance barrier properties of thin films of polymers: Seeding and capping of PECVD thin films by PEALD

AU - Gebhard, M.

AU - Mitschker, F.

AU - Hoppe, C.

AU - Aghaee, M.

AU - Rogalla, D.

AU - Creatore, M.

AU - Grundmeier, G.

AU - Awakowicz, P.

AU - Devi, A.P.K.

PY - 2018/3/8

Y1 - 2018/3/8

N2 - A combinatorial approach to deposit gas barrier layers (GBLs) on polyethylene terephthalate (PET) by means of plasma‐enhanced chemical vapor deposition (PECVD) and plasma‐enhanced atomic layer deposition (PEALD) is presented. Thin films of SiOx and SiOxCyHz obtained from PECVD were grown either subsequently on a PEALD seeding layer (SiO2) or were capped by ultrathin PEALD films of Al2O3 or SiO2. To study the impact of PEALD layers on the overall GBL performance, PECVD coatings with high macro defect densities and low barrier efficiency with regard to the oxygen transmission rate (OTR) were chosen. PEALD seeding layers demonstrated the ability to influence the subsequent PECVD growth in terms of the lower macro defect density (9 macro‐defects mm−2) and improved barrier performance (OTR = 0.8 cm3 m−2 day−1), while the PEALD capping‐route produced GBLs free of macro‐defects.

AB - A combinatorial approach to deposit gas barrier layers (GBLs) on polyethylene terephthalate (PET) by means of plasma‐enhanced chemical vapor deposition (PECVD) and plasma‐enhanced atomic layer deposition (PEALD) is presented. Thin films of SiOx and SiOxCyHz obtained from PECVD were grown either subsequently on a PEALD seeding layer (SiO2) or were capped by ultrathin PEALD films of Al2O3 or SiO2. To study the impact of PEALD layers on the overall GBL performance, PECVD coatings with high macro defect densities and low barrier efficiency with regard to the oxygen transmission rate (OTR) were chosen. PEALD seeding layers demonstrated the ability to influence the subsequent PECVD growth in terms of the lower macro defect density (9 macro‐defects mm−2) and improved barrier performance (OTR = 0.8 cm3 m−2 day−1), while the PEALD capping‐route produced GBLs free of macro‐defects.

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