A capacitive probe with shaped probe bias for ion flux measurements in depositing plasmas

M.C. Petcu, A.C. Bronneberg, A. Sarkar, M.A. Blauw, M. Creatore, M.C.M. Sanden, van de

Research output: Contribution to journalArticleAcademicpeer-review

10 Citations (Scopus)
196 Downloads (Pure)

Abstract

The application of a pulse shaped biasing method implemented to a capacitive probe is described. This approach delivers an accurate and simple way to determine ion fluxes in diverse plasma mixtures. To prove the reliability of the method, the ion probe was used in a different configuration, namely, a planar Langmuir probe. In this configuration, the ion current was directly determined from the I-V characteristic and compared with the ion current measured with the pulse shaped ion probe. The results from both measurements are in excellent agreement. It is demonstrated that the capacitive probe is able to perform spatially resolved ion flux measurements under high deposition rate conditions (2-20 nm/s) in a remote expanding thermal plasma in Ar/ NH3 / SiH4 mixture.
Original languageEnglish
Pages (from-to)115104-1/4
JournalReview of Scientific Instruments
Volume79
Issue number11
DOIs
Publication statusPublished - 2008

Fingerprint

Dive into the research topics of 'A capacitive probe with shaped probe bias for ion flux measurements in depositing plasmas'. Together they form a unique fingerprint.

Cite this