Abstract
Amorphous Gallium-lndium-Zinc-Oxide (GIZO or IGZO) has been recently pro- posed [1] as an interesting semiconductor for manufacturing TFTs because of its mobility (µ~20cm7Vs), superior to other common materials for large-area elec- tronics like organic semiconductors and a-Si (µ~1cm7Vs). The amorphous nature of GIZO grants also a good uniformity, contrary to Low Temperature Polycrystalline Silicon (LTPS), which still offers the best mobility among large- area TFT technologies (µ~100cm2¿/s). The optical transparency and the relative- ly low fabrication temperature (
| Original language | English |
|---|---|
| Title of host publication | Proceedings of the IEEE International Solid-State Circuits Conference 2012 (ISSCC 2012), 19-23 February 2012, San Francisco, California |
| Place of Publication | Piscataway |
| Publisher | Institute of Electrical and Electronics Engineers |
| Pages | 314-316 |
| DOIs | |
| Publication status | Published - 2012 |
| Event | 59th IEEE International Solid-State Circuits Conference, ISSCC 2012 - San Francisco, United States Duration: 19 Feb 2012 → 23 Feb 2012 Conference number: 59 |
Conference
| Conference | 59th IEEE International Solid-State Circuits Conference, ISSCC 2012 |
|---|---|
| Abbreviated title | ISSCC 2012 |
| Country/Territory | United States |
| City | San Francisco |
| Period | 19/02/12 → 23/02/12 |
| Other | “Silicon Systems for Sustainability” |