2D InP photonic crystal fabrication process development

Bifeng Rong, Emile van der Drift, Rob W. van der Heijden, Huub W.M. Salemink

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

6 Citations (Scopus)

Abstract

We have developed a reliable process to fabricate high quality 2D air-hole and dielectric column InP photonic crystals with a high aspect ratio on a STS production tool using ICP N2+Cl2 plasma. The photonic crystals have a triangular lattice with lattice constant of 400 nm and air-hole and dielectric column radius of 120 nm. Large efforts have been devoted on developing a proper mask. We obtained a perfect, clean and vertical profiled SiNx mask. The next main effort is InP pattern transfer in Cl 2+N2 plasma. Etching selectivity, smooth sidewall and etch profile are directly related to plasma process condition, besides the quality of SiNx mask. We have optimized the N2+Cl2 plasma condition to obtain high aspect ratio, vertical profile and smooth sidewall InP structures. Cylindrical holes (2 micron depth) and rodlike pillars (2.4 micron height) are uniformly fabricated. An aspect ratio of 18 for 100nm trench lines has been obtained. AFM measurement evidences that etched surfaces are smooth. The root mean square roughness of pillar and hole is 0.7 nm and 0.8 nm, respectively. The optical transmission characterization of ridge waveguides has been carried out. Transmission spectrum of 1 micron wide waveguide has been obtained.

Original languageEnglish
Title of host publicationNanoengineering
Subtitle of host publicationFabrication, Properties, Optics, and Devices III
EditorsElizabeth A. Dobisz, Louay A. Eldada
PublisherSPIE
Number of pages11
ISBN (Print)9780819464064
DOIs
Publication statusPublished - 2006
EventNanoengineering: Fabrication, Properties, Optics, and Devices III - San Diego, CA, United States
Duration: 13 Aug 200617 Aug 2006

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume6327
ISSN (Print)0277-786X

Conference

ConferenceNanoengineering: Fabrication, Properties, Optics, and Devices III
CountryUnited States
CitySan Diego, CA
Period13/08/0617/08/06

Keywords

  • 2D photonic crystal
  • Cl +N plasma
  • Gratings
  • High aspect ratio
  • Hole and pillar
  • III-V photonic crystal
  • InP nanophotonic crystal
  • Nanofabrication
  • Nanophotonic crystal
  • Nanophotonics
  • Nanotechnology

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