2D dopant profiling of advanced CMOS technologies by preferential etching, comparison with 2D process simulations

C.J..J. Dachs, M. A. Verheijen, M. Kaiser, P. A. Stolk, Y. V. Ponomarev

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

1 Citation (Scopus)

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Engineering & Materials Science