193 nm ArF lithography for high topology InP wafer processing

Aleksandr Zozulia; Jeroen Bolk; Samir Rihani; Graham Berry; Michael Robertson; John Rawsthorne; Kevin A. Williams; Yuqing Jiao

193 nm ArF lithography for high topology InP wafer processing

Aleksandr Zozulia, Jeroen Bolk, Samir Rihani, Graham Berry, Michael Robertson, John Rawsthorne, Kevin A. Williams, Yuqing Jiao

Research output: Contribution to conference › Abstract › Academic

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Original language	English
Pages	1-2
Number of pages	2
Publication status	Published - Sept 2023
Event	49th International conference on Micro and Nano Engineering, MNE 49 - Berlin, Germany Duration: 25 Sept 2023 → 28 Sept 2023 Conference number: 49 https://mne-2023.org/

Conference

Conference	49th International conference on Micro and Nano Engineering, MNE 49
Abbreviated title	MNE
Country/Territory	Germany
City	Berlin
Period	25/09/23 → 28/09/23
Internet address	https://mne-2023.org/

Cite this

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title = "193 nm ArF lithography for high topology InP wafer processing",

author = "Aleksandr Zozulia and Jeroen Bolk and Samir Rihani and Graham Berry and Michael Robertson and John Rawsthorne and Williams, {Kevin A.} and Yuqing Jiao",

year = "2023",

month = sep,

language = "English",

pages = "1--2",

note = "49th International conference on Micro and Nano Engineering, MNE 49 ; Conference date: 25-09-2023 Through 28-09-2023",

url = "https://mne-2023.org/",

}

TY - CONF

T1 - 193 nm ArF lithography for high topology InP wafer processing

AU - Zozulia, Aleksandr

AU - Bolk, Jeroen

AU - Rihani, Samir

AU - Berry, Graham

AU - Robertson, Michael

AU - Rawsthorne, John

AU - Williams, Kevin A.

AU - Jiao, Yuqing

N1 - Conference code: 49

PY - 2023/9

Y1 - 2023/9

M3 - Abstract

SP - 1

EP - 2

T2 - 49th International conference on Micro and Nano Engineering, MNE 49

Y2 - 25 September 2023 through 28 September 2023

ER -