Remote plasmas are widely used in industry, for example for dry etching applications in semiconductor industry. Radio Frequency (RF) bias voltage generators are used to generate the required voltage to generate a plasma. Future applications require generators with significantly improved output performance, with respect to output power, bandwidth and efficiency. In this project switched mode technology is developed to replace the existing linear RF amplifiers. This requires innovation in pulse width modulation, gate drivers, very fast control algorithms and high frequency measurement technology in order to realize the necessary operational accuracy. In close cooperation with Prodrive Technologies this research will be realized.
|Effective start/end date||1/11/18 → 31/10/22|
Funded in part by
Explore the research topics touched on by this project. These labels are generated based on the underlying awards/grants. Together they form a unique fingerprint.