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Best ALD paper Award

Prize: Other › Career, activity or publication related prizes (lifetime, best paper, poster etc.) › Scientific

Description

Innovative remote plasma source for atomic layer deposition for GaN devices featured by H.C.M. Knoops, K. Arts, J.-W. Buiter, L. Matteo Martini, R. Engeln, D.T. Hemakumara, M. Powell1, W.M.M. Kessels, C.J. Hodson, and A. O’Mahony, JVST A 39 062403 (2021)
Awarded date7 Jul 2022

Awarded at event

Event title21st International Conference on Atomic Layer Deposition
LocationVirtual MeetingShow on map
Period23 Jun 2021 → 30 Jun 2021

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