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Personal profile

Research profile

My academic interest can be summarized as follows: studying the growth of ultra-thin films by atomic-layer deposition and their characterization using advanced (nonlinear) optical diagnostics with an emphasis on their defects and non-idealities.

Academic background

My most recent work was a postdoc focussing on the growth and characterization of 2D transition metal dichalcogenides (TMDs). In this project, I co-developed new ALD processes for the growth of these TMDs. Furthermore, I developed a new framework for texture characterization using Raman spectroscopy based upon new fundamental insight I obtained into the Raman response of nanocrystalline TMDs.

My PhD research encompassed mechanistic studies of the prototypical ALD processes for metal-oxide (thermal ALD of Al2O3) and for noble metal ALD (thermal ALD of Pt) using a new diagnostics: broadband sum-frequency generation (BB-SFG) spectroscopy. The surface chemistry during these processes was studied for the first time with this state-of-the-art technique which relies on the mixing of mid-IR and visible fs laser pulses. As such, SFG in a second-order nonlinear optical process making BB-SFG spectroscopy inherently surface sensitive. This property, combined with the all optical nature of BB-SFG, makes it ideally suited for in-situ studies of the surface chemistry. A purpose built setup was realized in the project and these BB-SFG studies revealed several key non-idealities in the growth mechanism of these well-studied prototypical ALD processes.

I also studyied the surface chemistry of plasma-enhanced ALD of Al2O3 using ATR-FTIR spectroscopy at the Colorado School of Mines (CSM) and I worked on the characterization of the SiO2/Si and Al2O3/Si interface relevant for nano-electronic and photovoltaic devices with phase-sensitive second-harmonic generation (SHG) spectroscopy. In conjunctino to probing the electronic structure of the interface, SHG can also reveal and quantify the presence of built-in charges near these interfaces which is a key property for device fabrication.

Apart from my passion for physics, I am also interested in computer science which resulted in e.g.  a project at the department of Mathematics and Computer Science performing real-time visualization of the execution of computer code.

Fingerprint Dive into the research topics where Vincent Vandalon is active. These topic labels come from the works of this person. Together they form a unique fingerprint.

  • 6 Similar Profiles
Atomic layer deposition Chemical Compounds
atomic layer epitaxy Physics & Astronomy
Plasmas Chemical Compounds
Aluminum Oxide Chemical Compounds
Ozone Chemical Compounds
oxygen plasma Physics & Astronomy
harmonic generations Physics & Astronomy
Thickness control Chemical Compounds

Network Recent external collaboration on country level. Dive into details by clicking on the dots.

Research Output 2010 2019

  • 186 Citations
  • 15 Article
  • 1 Conference contribution
  • 1 Phd Thesis 1 (Research TU/e / Graduation TU/e)
3 Citations (Scopus)

Chemical analysis of the interface between hybrid organic−inorganic perovskite and atomic layer deposited Al2O3

Koushik, D., Hazendonk, L., Zardetto, V., Vandalon, V., Verheijen, M. A., Kessels, W. M. M. & Creatore, M., 9 Jan 2019, In : ACS Applied Materials & Interfaces. 11, p. 5526-5535 10 p.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
Perovskite
Atomic layer deposition
Chemical analysis
Infrared radiation
Stretching
Open Access
File
Atomic layer deposition
Hydrogen
Plasmas
Electrocatalysts
Temperature

Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3

Mione, M., Engeln, R., Vandalon, V., Kessels, E. & Roozeboom, F., 21 Aug 2019, In : Applied Physics Letters. 115, 8, 5 p., 083101

Research output: Contribution to journalArticleAcademicpeer-review

optical emission spectroscopy
atmospheric pressure
atomic layer epitaxy
chemistry
reaction products

Initial growth study of atomic-layer deposition of Al2O3 by vibrational sum-frequency generation

Vandalon, V. & Kessels, E., 16 Jul 2019, In : Langmuir. 35, 32, p. 10374-10382 9 p.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
Atomic layer deposition
Vibrational spectra
atomic layer epitaxy
cycles
Spectroscopy
1 Citation (Scopus)

Sticking probabilities of H2O and Al(CH3)3 during atomic layer deposition of Al2O3 extracted from their impact on film conformality

Arts, K., Vandalon, V., Puurunen, R. L., Utriainen, M., Gao, F., Kessels, E. & Knoops, H., 24 Apr 2019, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films. 37, 3, 5 p., 030908

Research output: Contribution to journalArticleAcademicpeer-review

Atomic layer deposition
atomic layer epitaxy
profiles
high aspect ratio
Temperature

Prizes

Student Award best oral presentation

Vincent Vandalon (Recipient), 30 Jun 2015

Recognition: OtherCareer, activity or publication related prizes (lifetime, best paper, poster etc.)Scientific

Student theses

Characterization of self-assembled monolayers with FTIR and SE

Author: Riberi, F., 2013

Supervisor: Vandalon, V. (Supervisor 1) & Kessels, W. (Supervisor 2)

Student thesis: Bachelor

File

Second-Harmonic Generation: spectroscopic phase and intensity study of the Si(100) interface with SiO2 and Al2O3 thin films

Author: Vandalon, V., 31 Aug 2011

Supervisor: Terlinden, N. (Supervisor 1) & Kessels, W. (Supervisor 2)

Student thesis: Master

File

Study of the Si(100) Al2O3 interface by second-harmonic general and electrically detected magnetic resonance

Author: Bosch, R., 31 Mar 2012

Supervisor: Vandalon, V. (Supervisor 1), Terlinden, N. (Supervisor 2) & Kessels, W. (Supervisor 2)

Student thesis: Master

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