Personal profile
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"Small projects take about the same time to manage as the large ones, so it is important to find partners able solve a substantial part of the problem on their own."
Research profile
Vadim Banine is Professor of Physics and Technology of EUV Lithography in the Elementary Processes in Gas Discharges group at Eindhoven University of Technology. This is a part-time position, which he combines with his work as Director of ASML.
Banine's research interests include EUV lithography, plasma physics, surface physics and chemistry as well as accelerator technology. EUV lithography is a promising technology to make electronic chips smaller and more powerful - a promise that ASML is working on bringing to reality, in collaboration with universities such as TU/e, Twente University and the Russian ISAN.
At ASML, Banine is responsible for general research program definition and roadmapping, managing and coaching research project leaders, external laboratories and projects worldwide and the development of the EUV research process, its knowledge base, working group capacity and external network.
His strong career in industry make Banine an expert on organization and development of research programs and groups, project leadership, combining enterprise and science and bringing results to development.
Banine is a member of the Scientific Advisory Commitee (SAC) at FOM. He has more than 60 patents, is the winner of the ASML patent award and has over 40 publications to his name.
Academic background
Vadim Banine holds a cum laude MSc degree from the Moscow Institute of Physics and Technology (Russia). He obtained his PhD from Eindhoven University of Technology (TU/e) in 1994, on the metrology of combustion plasma and shock tubes. He did a postdoc at TU/e in the Laboratory of Heat and Mass Transfer in 1995 and 1996. In 1996, he started working for ASML - first as lead engineer, then as external project coordinator, as head of the ASML laboratory and even later as senior manager of general research. In 2010, Banine became Research Director at ASML and in 2017 he became its Director. He was appointed part-time Professor at TU/e in 2013.
Expertise related to UN Sustainable Development Goals
In 2015, UN member states agreed to 17 global Sustainable Development Goals (SDGs) to end poverty, protect the planet and ensure prosperity for all. This person’s work contributes towards the following SDG(s):
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SDG 3 Good Health and Well-being
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Collaborations and top research areas from the last five years
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Particle mobilization by EUV-induced plasma and fast electrons
van de Kerkhof, M., Shefer, D., Nikipelov, A., Sbrizzai, F., Kvon, V., Bouwmans, S., Beckers, J. & Banine, V., 10 Apr 2024, Optical and EUV Nanolithography XXXVII. Burkhardt, M. & van Lare, C. (eds.). SPIE, 10 p. 129530E. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 12953).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review
Open AccessFile245 Downloads (Pure) -
Laser light scattering (LLS) to observe plasma impact on the adhesion of micrometer-sized particles to a surface
Shefer, D. (Corresponding author), Nikipelov, A., van de Kerkhof, M., Banine, V. & Beckers, J., 9 Nov 2023, In: Journal of Physics D: Applied Physics. 56, 45, 10 p., 455201.Research output: Contribution to journal › Article › Academic › peer-review
Open AccessFile4 Link opens in a new tab Citations (Scopus)60 Downloads (Pure) -
The impact of hydrogen plasma on the structure and morphology of tin and lead micrometer sized particles
Shefer, D. (Corresponding author), Nikipelov, A., van de Kerkhof, M., Marvi, Z., Banine, V. & Beckers, J., 23 Feb 2023, In: Journal of Physics D: Applied Physics. 56, 8, 9 p., 085204.Research output: Contribution to journal › Article › Academic › peer-review
Open AccessFile14 Link opens in a new tab Citations (Scopus)461 Downloads (Pure) -
EUV-induced hydrogen plasma and particle release
van de Kerkhof, M. (Corresponding author), Yakunin, A. M., Kvon, V., Nikipelov, A., Astakhov, D., Krainov, P. & Banine, V., 2022, In: Radiation Effects and Defects in Solids. 177, 5-6, p. 486-512 27 p.Research output: Contribution to journal › Article › Academic › peer-review
Open AccessFile33 Link opens in a new tab Citations (Scopus)438 Downloads (Pure) -
An atomic hydrogen etching sensor for H2 plasma diagnostics
van Leuken, D. P. J. (Corresponding author), de Meijere, C. A., van der Horst, R., Banine, V. Y., Osorio, E. A. & Beckers, J., 1 Jun 2021, In: Review of Scientific Instruments. 92, 6, 10 p., 063518.Research output: Contribution to journal › Article › Academic › peer-review
Open AccessFile5 Link opens in a new tab Citations (Scopus)573 Downloads (Pure)