• 375 Citations
19942019
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Personal profile

Quote

"Small projects take about the same time to manage as the large ones, so it is important to find partners able solve a substantial part of the problem on their own."

Research profile

Vadim Banine is Professor of Physics and Technology of EUV Lithography in the Elementary Processes in Gas Discharges group at Eindhoven University of Technology. This is a part-time position, which he combines with his work as Director of ASML.  

Banine's research interests include EUV lithography, plasma physics, surface physics and chemistry as well as accelerator technology. EUV lithography is a promising technology to make electronic chips smaller and more powerful - a promise that ASML is working on bringing to reality, in collaboration with universities such as TU/e, Twente University and the Russian ISAN.  

At ASML, Banine is responsible for general research program definition and roadmapping, managing and coaching research project leaders, external laboratories and projects worldwide and the development of the EUV research process, its knowledge base, working group capacity and external network.

His strong career in industry make Banine an expert on organization and development of research programs and groups, project leadership, combining enterprise and science and bringing results to development.

Banine is a member of the Scientific Advisory Commitee (SAC) at FOM. He has more than 60 patents, is the winner of the ASML patent award and has over 40 publications to his name.

Academic background

Vadim Banine holds a cum laude MSc degree from the Moscow Institute of Physics and Technology (Russia). He obtained his PhD from Eindhoven University of Technology (TU/e) in 1994, on the metrology of combustion plasma and shock tubes. He did a postdoc at TU/e in the Laboratory of Heat and Mass Transfer in 1995 and 1996. In 1996, he started working for ASML - first as lead engineer, then as external project coordinator, as head of the ASML laboratory and even later as senior manager of general research. In 2010, Banine became Research Director at ASML and in 2017 he became its Director. He was appointed part-time Professor at TU/e in 2013.

Fingerprint Dive into the research topics where Vadim Y. Banine is active. These topic labels come from the works of this person. Together they form a unique fingerprint.

  • 8 Similar Profiles
Plasmas Chemical Compounds
argon Physics & Astronomy
ions Physics & Astronomy
energy distribution Physics & Astronomy
cavities Physics & Astronomy
distribution functions Physics & Astronomy
lithography Physics & Astronomy
gas pressure Physics & Astronomy

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Research Output 1994 2019

3 Citations (Scopus)

Energy distribution functions for ions from pulsed EUV-induced plasmas in low pressure N2-diluted H2 gas

Beckers, J., van de Ven, T., de Meijere, C. A., van der Horst, R., van Kampen, M. & Banine, V., 2 Apr 2019, In : Applied Physics Letters. 114, 13, 5 p., 133502.

Research output: Contribution to journalArticleAcademicpeer-review

energy distribution
low pressure
distribution functions
gases
ions
2 Citations (Scopus)
30 Downloads (Pure)

EUV-induced plasma: a peculiar phenomenon of a modern lithographic technology

Beckers, J., van de Ven, T., van der Horst, R., Astakhov, D. . I. & Banine, V., 2 Jul 2019, In : Applied Sciences. 9, 14, 23 p., 2827.

Research output: Contribution to journalReview articleAcademicpeer-review

Open Access
File
Plasmas
Lithography
lithography
boom
Extreme ultraviolet lithography
6 Citations (Scopus)
5 Downloads (Pure)

Mapping electron dynamics in highly transient EUV photon-induced plasmas: a novel diagnostic approach using multi-mode microwave cavity resonance spectroscopy

Beckers, J., van de Wetering, F. M. J. H., Platier, B., van Ninhuijs, M. A. W., Brussaard, G. J. H., Banine, V. Y. & Luiten, O. J., 16 Jan 2019, In : Journal of Physics D: Applied Physics. 52, 3, 17 p., 034004.

Research output: Contribution to journalArticleAcademicpeer-review

Photons
Microwaves
Spectroscopy
Plasmas
microwaves
11 Downloads (Pure)

Time-resolved ion energy distribution functions in the afterglow of an EUV-induced plasma

Beckers, J., van de Ven, T. & Banine, V., 28 Oct 2019, In : Applied Physics Letters. 115, 18, 4 p., 183502.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
afterglows
energy distribution
distribution functions
ions
lithography
5 Citations (Scopus)
18 Downloads (Pure)

Analysis of retarding field energy analyzer transmission by simulation of ion trajectories

van de Ven, T. H. M., de Meijere, C. A., van der Horst, R. M., van Kampen, M., Banine, V. Y. & Beckers, J., 1 Apr 2018, In : Review of Scientific Instruments. 89, 4, 11 p., 043501.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
analyzers
Trajectories
retarding
trajectories
Ions

Press / Media

February 11, 2019: ZEISS International: Quarterly Report

Vadim Y. Banine

11/02/19

1 item of Media coverage

Press/Media: Expert Comment

February 04, 2019: ZEISS Develops First Multifunctional Smart Glass

Vadim Y. Banine

4/02/19

1 item of Media coverage

Press/Media: Expert Comment

January 23, 2019: ZEISS Xradia 610&620 Versa

Vadim Y. Banine

24/01/19

1 item of Media coverage

Press/Media: Expert Comment

December 20, 2018: ZEISS Venture with Bridger Photonics

Vadim Y. Banine

20/12/18

1 item of Media coverage

Press/Media: Expert Comment

December 18, 2018: Events Calendar: Carl Zeis Optical Inc: Annual Press Conference 2018

Vadim Y. Banine

18/12/1819/12/18

2 items of Media coverage

Press/Media: Expert Comment

Student theses

Characterization and mitigation of debris from a Sn-based EUV source

Author: Gielissen, K., 30 Jun 2005

Supervisor: van der Mullen, J. (Supervisor 1), Banine, V. (External coach) & Kieft, E. (Supervisor 2)

Student thesis: Master

File