• 333 Citations
19942019
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Personal profile

Quote

"Small projects take about the same time to manage as the large ones, so it is important to find partners able solve a substantial part of the problem on their own."

Research profile

Vadim Banine is Professor of Physics and Technology of EUV Lithography in the Elementary Processes in Gas Discharges group at Eindhoven University of Technology. This is a part-time position, which he combines with his work as Director of ASML.  

Banine's research interests include EUV lithography, plasma physics, surface physics and chemistry as well as accelerator technology. EUV lithography is a promising technology to make electronic chips smaller and more powerful - a promise that ASML is working on bringing to reality, in collaboration with universities such as TU/e, Twente University and the Russian ISAN.  

At ASML, Banine is responsible for general research program definition and roadmapping, managing and coaching research project leaders, external laboratories and projects worldwide and the development of the EUV research process, its knowledge base, working group capacity and external network.

His strong career in industry make Banine an expert on organization and development of research programs and groups, project leadership, combining enterprise and science and bringing results to development.

Banine is a member of the Scientific Advisory Commitee (SAC) at FOM. He has more than 60 patents, is the winner of the ASML patent award and has over 40 publications to his name.

Academic background

Vadim Banine holds a cum laude MSc degree from the Moscow Institute of Physics and Technology (Russia). He obtained his PhD from Eindhoven University of Technology (TU/e) in 1994, on the metrology of combustion plasma and shock tubes. He did a postdoc at TU/e in the Laboratory of Heat and Mass Transfer in 1995 and 1996. In 1996, he started working for ASML - first as lead engineer, then as external project coordinator, as head of the ASML laboratory and even later as senior manager of general research. In 2010, Banine became Research Director at ASML and in 2017 he became its Director. He was appointed part-time Professor at TU/e in 2013.

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Research Output 1994 2019

Energy distribution functions for ions from pulsed EUV-induced plasmas in low pressure N2-diluted H2 gas

Beckers, J., van de Ven, T., de Meijere, C. A., van der Horst, R., van Kampen, M. & Banine, V., 2 Apr 2019, In : Applied Physics Letters. 114, 5 p., 133502

Research output: Contribution to journalArticleAcademicpeer-review

energy distribution
low pressure
distribution functions
gases
ions
2 Citations (Scopus)
Photons
Microwaves
Spectroscopy
Plasmas
microwaves
3 Citations (Scopus)

Analysis of retarding field energy analyzer transmission by simulation of ion trajectories

van de Ven, T. H. M., de Meijere, C. A., van der Horst, R. M., van Kampen, M., Banine, V. Y. & Beckers, J., 1 Apr 2018, In : Review of Scientific Instruments. 89, 4, 11 p., 043501

Research output: Contribution to journalArticleAcademicpeer-review

analyzers
Trajectories
retarding
trajectories
Ions
4 Citations (Scopus)

Ion energy distributions in highly transient EUV induced plasma in hydrogen

van de Ven, T. H. M., Reefman, P., de Meijere, C. A., van der Horst, R. M., van Kampen, M., Banine, V. Y. & Beckers, J., 14 Feb 2018, In : Journal of Applied Physics. 123, 6, p. 1-6 063301

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File

Ion fluxes towards surfaces exposed to EUV-induced plasmas

van de Ven, T. H. M., 4 Jul 2018, Eindhoven: Technische Universiteit Eindhoven. 207 p.

Research output: ThesisPhd Thesis 1 (Research TU/e / Graduation TU/e)Academic

Open Access
File

Student theses

Characterization and mitigation of debris from a Sn-based EUV source

Author: Gielissen, K., 30 Jun 2005

Supervisor: van der Mullen, J. (Supervisor 1), Banine, V. (External coach) & Kieft, E. (Supervisor 2)

Student thesis: Master

File