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Ruben Merks was born in Eindhoven (The Netherlands) on June 26th, 1990. He received both his bachelor degree (2013) and master degree (2015) in Electrical Engineering at Eindhoven University of Technology (TU/e).

He finished his master thesis on the subject “Thermal control for projection optics in extreme ultraviolet lithography” with a final grade of 10. The project, which was supervised by prof. dr. W.M.J.M. Coene and prof. dr. S. Weiland, was a collaboration between ASML and the Control Systems group in the department of Electrical Engineering.

As of May 2015, he is working as a Ph. D. student at the Control Systems group in the department of Electrical Engineering under supervision of prof. S. Weiland. His research is on the subject “Thermal modeling and estimator design for immersion lithographic systems”, which also is collaboration between ASML and the Control Systems group in the department of Electrical Engineering.

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