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Dive into the research topics where Nicholas Chittock is active. These topic labels come from the works of this person. Together they form a unique fingerprint.
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Collaborations and top research areas from the last five years
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Plasma processes for atomic layer etching
Chittock, N. J., 24 Jun 2024, Eindhoven: Eindhoven University of Technology. 277 p.Research output: Thesis › Phd Thesis 1 (Research TU/e / Graduation TU/e)
5 Downloads (Pure) -
Isotropic atomic layer etching of GaN using SF6 plasma and Al(CH3)3
Chittock, N. J. (Corresponding author), Shu, Y., Elliott, S. D., Knoops, H. C. M., Kessels, W. M. M. & Mackus, A. J. M. (Corresponding author), 21 Aug 2023, In: Journal of Applied Physics. 134, 7, 13 p., 075302.Research output: Contribution to journal › Article › Academic › peer-review
Open AccessFile1 Citation (Scopus)177 Downloads (Pure) -
Surface Smoothing by Atomic Layer Deposition and Etching for the Fabrication of Nanodevices
Gerritsen, S. H., Chittock, N. J. (Corresponding author), Vandalon, V., Verheijen, M. A., Knoops, H. C. M., Kessels, W. M. M. & Mackus, A. J. M. (Corresponding author), 23 Dec 2022, In: ACS Applied Nano Materials. 5, 12, p. 18116-18126 11 p.Research output: Contribution to journal › Article › Academic › peer-review
Open AccessFile13 Citations (Scopus)143 Downloads (Pure) -
Etching with atomic-level precision: The emerging field of atomic layer etching
Mackus, A. J. M., Faraz, T. & Chittock, N., 2 Jun 2020, In: Nevac Blad. 58, 2, p. 40-42Research output: Contribution to journal › Article › Popular
Open AccessFile209 Downloads (Pure) -
Isotropic plasma atomic layer etching of Al2O3 using a fluorine containing plasma and Al(CH3)3
Chittock, N., Vos, M. F. J., Faraz, T., Kessels, W. M. M., Knoops, H. C. M. & Mackus, A. J. M. (Corresponding author), 20 Oct 2020, In: Applied Physics Letters. 117, 16, p. 162107 5 p., 162107.Research output: Contribution to journal › Article › Academic › peer-review
Open AccessFile18 Citations (Scopus)919 Downloads (Pure)
Datasets
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Isotropic plasma atomic layer etching of Al2O3
Chittock, N. J. (Creator), 4TU.Centre for Research Data, 21 Oct 2020
DOI: 10.4121/13011239, https://data.4tu.nl/articles/_/13011239
Dataset
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Data underlying the publication: Isotropic atomic layer etching of GaN using SF6 plasma and Al(CH3)3
Chittock, N. J. (Creator), Mackus, A. J. M. (Creator), Shu, Y. (Creator), Elliott, S. D. (Creator), Knoops, H. C. M. (Creator) & Kessels, W. M. M. (Creator), 4TU.Centre for Research Data, 21 Aug 2023
DOI: 10.4121/b7383943-2ae0-4339-8cbf-657765023fd6, https://data.4tu.nl/datasets/b7383943-2ae0-4339-8cbf-657765023fd6 and one more link, https://data.4tu.nl/datasets/b7383943-2ae0-4339-8cbf-657765023fd6/1 (show fewer)
Dataset
Prizes
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ALE Best Student Paper Award
Chittock, N. (Recipient), 30 Jun 2020
Prize: Other › Career, activity or publication related prizes (lifetime, best paper, poster etc.) › Scientific