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Fingerprint Dive into the research topics where Martijn F.J. Vos is active. These topic labels come from the works of this person. Together they form a unique fingerprint.

  • 21 Similar Profiles
atomic layer epitaxy Physics & Astronomy
Atomic layer deposition Chemical Compounds
Molybdenum oxide Chemical Compounds
molybdenum oxides Physics & Astronomy
Plasmas Engineering & Materials Science
Silicon Chemical Compounds
Solar cells Chemical Compounds
aluminum fluorides Physics & Astronomy

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Research Output 2015 2019

  • 105 Citations
  • 7 Article
  • 1 Conference contribution
  • 1 Phd Thesis 1 (Research TU/e / Graduation TU/e)
38 Downloads (Pure)

Area-selective deposition of Ruthenium by combining atomic layer deposition and selective etching

Vos, M. F. J., Chopra, S. N., Verheijen, M. A., Ekerdt, J. G., Agarwal, S., Kessels, W. M. M. & Mackus, A. J. M., 22 May 2019, In : Chemistry of Materials. 31, 11, p. 3878-3882 5 p.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File

Development and understanding of advanced atomic layer deposition processes: AlF3, Co, and Ru

Vos, M. F. J., 21 Nov 2019, Eindhoven: Technische Universiteit Eindhoven. 207 p.

Research output: ThesisPhd Thesis 1 (Research TU/e / Graduation TU/e)

8 Citations (Scopus)
104 Downloads (Pure)

Atomic layer deposition of cobalt using H2-, N2-, and NH3-based plasmas: on the role of the Co-reactant

Vos, M. F. J., van Straaten, G., Kessels, W. M. M. & Mackus, A. J. M., 5 Sep 2018, In : Journal of Physical Chemistry C. 122, 39, p. 22519-22529 11 p.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
Atomic layer deposition
atomic layer epitaxy
Cobalt
cobalt
Plasmas
5 Citations (Scopus)
86 Downloads (Pure)

Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma

Vos, M. F. J., Knoops, H. C. M., Synowicki, R. A., Kessels, W. M. M. & Mackus, A. J. M., 11 Sep 2017, In : Applied Physics Letters. 111, 11, 5 p., 113105.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
aluminum fluorides
atomic layer epitaxy
metal fluorides
refractivity
cycles
4 Citations (Scopus)

Influence of magnetic configuration on edge turbulence and transport in the H-1 Heliac

Michael, C. A., Zhao, F., Blackwell, B., Vos, M. F. J., Brotankova, J., Haskey, S. R., Seiwald, B. & Howard, J., 1 Feb 2017, In : Plasma Physics and Controlled Fusion. 59, 2, 11 p., 024001.

Research output: Contribution to journalArticleAcademicpeer-review

Turbulence
turbulence
Plasmas
configurations
Langmuir probes

Prizes

ALD Best Student Paper Award

Martijn Vos (Recipient), 23 Jul 2019

Prize: OtherCareer, activity or publication related prizes (lifetime, best paper, poster etc.)Scientific

NEVAC-prijs 2016

Martijn Vos (Recipient), 27 May 2016

Prize: OtherCareer, activity or publication related prizes (lifetime, best paper, poster etc.)Scientific

File

Student theses

Atomic layer deposition of molybdenum oxide: for silicon heterojunction solar cells

Author: Vos, M., 31 Aug 2015

Supervisor: Macco, B. (Supervisor 1) & Kessels, W. (Supervisor 2)

Student thesis: Master

File

Nucleation behavior of atomic layer deposition of platinum on zinc oxide

Author: Vos, M., 2012

Supervisor: Erkens, I. (Supervisor 1), Fernández Landaluce, T. (Supervisor 2) & Kessels, W. (Supervisor 2)

Student thesis: Bachelor

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