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Research Output 1999 2020

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Review article
2004
11 Citations (Scopus)

Characterization of thermal and electrical stability of MOCVD HfO 2-HfSiO4 dielectric layers with polysilicon electrodes for advanced CMOS technologies

Rittersma, Z. M., Loo, J. J. G. P., Ponomarev, Y. V., Verheijen, M. A., Kaiser, M., Roozeboom, F., van Elshocht, S. & Caymax, M., 1 Dec 2004, In : Journal of the Electrochemical Society. 151, 12, p. G870-G877

Research output: Contribution to journalReview articleAcademicpeer-review

Metallorganic chemical vapor deposition
Polysilicon
CMOS
thermal stability
Metals