Marc J.M. Merkx

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18 Article
1 Conference contribution
1 Phd Thesis 1 (Research TU/e / Graduation TU/e)

Area-Selective Atomic Layer Deposition through Selective Passivation of SiO₂with a SF₆/H₂Plasma
Bolkenbaas, O. C. A., Merkx, M. J. M., Chittock, N. J., Tezsevin, I., Kessels, W. M. M., Sandoval, T. E. (Corresponding author) & Mackus, A. J. M. (Corresponding author), 22 Jul 2025, In: Chemistry of Materials. 37, 14, p. 4982-4991 10 p.
Research output: Contribution to journal › Article › Academic › peer-review

Open Access
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2 Link opens in a new tab Citations (Scopus)

173 Downloads (Pure)
Investigation of the atomic layer etching mechanism for Al2O3 using hexafluoroacetylacetone and H2 plasma
Chittock, N., Maas, J. F. W., Tezsevin, I., Merkx, M. J. M., Knoops, H. C. M., Kessels, W. M. M. & Mackus, A. J. M. (Corresponding author), 21 Jan 2025, In: Journal of Materials Chemistry C. 13, 3, p. 1345-1358 14 p.
Research output: Contribution to journal › Article › Academic › peer-review

Open Access
File
14 Link opens in a new tab Citations (Scopus)

110 Downloads (Pure)
Blocking mechanisms in area-selective ALD by small molecule inhibitors of different sizes: Steric shielding versus chemical passivation
Yu, P., Merkx, M. J. M., Tezsevin, I., Lemaire, P., Hausmann, D. M., Sandoval, T. E. (Corresponding author), Kessels, W. M. M. & Mackus, A. J. M. (Corresponding author), 30 Aug 2024, In: Applied Surface Science. 665, 9 p., 160141.
Research output: Contribution to journal › Article › Academic › peer-review

Open Access
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30 Link opens in a new tab Citations (Scopus)

379 Downloads (Pure)
In situ formation of inhibitor species through catalytic surface reactions during area-selective atomic layer deposition of TaN
Merkx, M. J. M., Tezsevin, I., Yu, P., Janssen, T., Heinemans, R. H. G. M., Lengers, R. J., Chen, J. R., Jezewski, C. J., Clendenning, S. B., Kessels, W. M. M., Sandoval, T. E. (Corresponding author) & Mackus, A. J. M. (Corresponding author), 28 May 2024, In: Journal of Chemical Physics. 160, 20, 9 p., 204701.
Research output: Contribution to journal › Article › Academic › peer-review

Open Access
File
9 Link opens in a new tab Citations (Scopus)

141 Downloads (Pure)
The Consequences of Random Sequential Adsorption for the Precursor Packing and Growth-Per-Cycle of Atomic Layer Deposition Processes
Tezsevin, I., Deijkers, J. H., Merkx, M. J. M., Kessels, W. M. M., Sandoval, T. E. (Corresponding author) & Mackus, A. J. M. (Corresponding author), 25 Jul 2024, In: Journal of Physical Chemistry Letters. 15, 29, p. 7496-7501 6 p.
Research output: Contribution to journal › Article › Academic › peer-review

Open Access
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10 Link opens in a new tab Citations (Scopus)

98 Downloads (Pure)

Supporting information
Merkx, M. J. M. (Creator), Tezsevin, I. (Creator), Yu, P. (Creator), Janssen, T. (Creator), Heinemans, R. H. G. M. (Creator), Lengers, R. J. (Creator), Chen, J.-R. (Creator), Jezewski, C. J. (Creator), Clendenning, S. B. (Creator), Kessels, W. M. M. (Creator), Sandoval, T. E. (Creator) & Mackus, A. J. M. (Creator), AIP Publishing, 22 May 2024
DOI: 10.60893/figshare.jcp.25743183, https://aip.figshare.com/articles/dataset/Supporting_information/25743183 and one more link, https://aip.figshare.com/articles/dataset/Supporting_information/25743183/1 (show fewer)
Dataset
Data underlying the publication: Packing of inhibitor molecules during area-selective atomic layer deposition studied using random sequential adsorption simulations
Li, J. (Creator), Tezsevin, I. (Creator), Merkx, M. J. M. (Creator), Maas, J. F. W. (Creator), Kessels, W. M. M. (Creator), Sandoval, T. E. (Creator) & Mackus, A. J. M. (Creator), 4TU.Centre for Research Data, 7 Aug 2023
DOI: 10.4121/33df3424-ed9b-49cb-910e-64a6d37aa6b0, https://data.4tu.nl/datasets/33df3424-ed9b-49cb-910e-64a6d37aa6b0 and one more link, https://data.4tu.nl/datasets/33df3424-ed9b-49cb-910e-64a6d37aa6b0/1 (show fewer)
Dataset
Data underlying the publication: Blocking mechanisms in area-selective ALD by small molecule inhibitors of different sizes: Steric shielding versus chemical passivation
Yu, P. (Creator), Merkx, M. J. M. (Creator), Tezsevin, I. (Creator), Lemaire, P. C. (Creator), Hausmann, D. M. (Creator), Sandoval, T. E. (Creator), Kessels, W. M. M. (Creator) & Mackus, A. J. M. (Creator), 4TU.Centre for Research Data, 2 May 2024
DOI: 10.4121/c357264b-f395-4409-bedc-328f45f6e6ac, https://data.4tu.nl/datasets/c357264b-f395-4409-bedc-328f45f6e6ac and 2 more links, https://data.4tu.nl/datasets/c357264b-f395-4409-bedc-328f45f6e6ac/1, https://data.4tu.nl/datasets/c357264b-f395-4409-bedc-328f45f6e6ac/2 (show fewer)
Dataset
Data underlying the publication: Computational Investigation of Precursor Blocking during Area-Selective Atomic Layer Deposition Using Aniline as a Small-Molecule Inhibitor
Tezsevin, I. (Creator), Maas, J. F. W. (Contributor), Merkx, M. J. M. (Creator), Lengers, R. J. (Creator), Kessels, W. M. M. (Creator), Sandoval, T. E. (Creator) & Mackus, A. J. M. (Creator), 4TU.Centre for Research Data, 7 Aug 2023
DOI: 10.4121/0bb03d8b-d1ac-49bc-8010-a498a981cf3e.v1, https://data.4tu.nl/datasets/0bb03d8b-d1ac-49bc-8010-a498a981cf3e/1 and one more link, https://data.4tu.nl/datasets/0bb03d8b-d1ac-49bc-8010-a498a981cf3e (show fewer)
Dataset

2D TMD Materials Enabling Future Electronics
Balasubramanyam, S., Merkx, M. J. M., Verheijen, M. A., Kessels, W. M. M., Mackus, A. J. M. & Bol, A. A.
27/06/21
1 Media contribution
Press/Media: Expert Comment

Area-selective atomic layer deposition of SiO2: studied by in situ Fourier transform infrared spectroscopy and spectroscopic ellipsometry
Merkx, M. J. M. (Author), Mackus, A. (Supervisor 1), 2017
Student thesis: Master

File
Creeping sparks: influences of a dielectric on the propagation of steamer channels
Merkx, M. J. M. (Author), Trienekens, D. J. M. (Supervisor 1) & Nijdam, S. (Supervisor 2), 2015
Student thesis: Bachelor

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Marc J.M. Merkx, MSc

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Collaborations and top research areas from the last five years

Dive into details

Area-Selective Atomic Layer Deposition through Selective Passivation of SiO₂with a SF₆/H₂Plasma

Investigation of the atomic layer etching mechanism for Al2O3 using hexafluoroacetylacetone and H2 plasma

Blocking mechanisms in area-selective ALD by small molecule inhibitors of different sizes: Steric shielding versus chemical passivation

In situ formation of inhibitor species through catalytic surface reactions during area-selective atomic layer deposition of TaN

The Consequences of Random Sequential Adsorption for the Precursor Packing and Growth-Per-Cycle of Atomic Layer Deposition Processes

Supporting information

Data underlying the publication: Packing of inhibitor molecules during area-selective atomic layer deposition studied using random sequential adsorption simulations

Data underlying the publication: Blocking mechanisms in area-selective ALD by small molecule inhibitors of different sizes: Steric shielding versus chemical passivation

Data underlying the publication: Computational Investigation of Precursor Blocking during Area-Selective Atomic Layer Deposition Using Aniline as a Small-Molecule Inhibitor

2D TMD Materials Enabling Future Electronics

Area-selective atomic layer deposition of SiO2: studied by in situ Fourier transform infrared spectroscopy and spectroscopic ellipsometry

Creeping sparks: influences of a dielectric on the propagation of steamer channels

Marc J.M. Merkx, MSc

Fingerprint

Collaborations and top research areas from the last five years

Research output

Datasets

Press/Media

Thesis