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Dive into the research topics where Marc J.M. Merkx is active. These topic labels come from the works of this person. Together they form a unique fingerprint.
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Collaborations and top research areas from the last five years
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Research output
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Investigation of the atomic layer etching mechanism for Al2O3 using hexafluoroacetylacetone and H2 plasma
Chittock, N., Maas, J. F. W., Tezsevin, I., Merkx, M. J. M., Knoops, H. C. M., Kessels, W. M. M. & Mackus, A. J. M. (Corresponding author), 21 Jan 2025, In: Journal of Materials Chemistry C. 13, 3, p. 1345-1358 14 p.Research output: Contribution to journal › Article › Academic › peer-review
Open AccessFile1 Citation (Scopus)31 Downloads (Pure) -
Blocking mechanisms in area-selective ALD by small molecule inhibitors of different sizes: Steric shielding versus chemical passivation
Yu, P., Merkx, M. J. M., Tezsevin, I., Lemaire, P., Hausmann, D. M., Sandoval, T. E. (Corresponding author), Kessels, W. M. M. & Mackus, A. J. M. (Corresponding author), 30 Aug 2024, In: Applied Surface Science. 665, 9 p., 160141.Research output: Contribution to journal › Article › Academic › peer-review
Open AccessFile14 Citations (Scopus)131 Downloads (Pure) -
In situ formation of inhibitor species through catalytic surface reactions during area-selective atomic layer deposition of TaN
Merkx, M. J. M., Tezsevin, I., Yu, P., Janssen, T., Heinemans, R. H. G. M., Lengers, R. J., Chen, J. R., Jezewski, C. J., Clendenning, S. B., Kessels, W. M. M., Sandoval, T. E. (Corresponding author) & Mackus, A. J. M. (Corresponding author), 28 May 2024, In: Journal of Chemical Physics. 160, 20, 9 p., 204701.Research output: Contribution to journal › Article › Academic › peer-review
Open AccessFile6 Citations (Scopus)39 Downloads (Pure) -
The Consequences of Random Sequential Adsorption for the Precursor Packing and Growth-Per-Cycle of Atomic Layer Deposition Processes
Tezsevin, I., Deijkers, J. H., Merkx, M. J. M., Kessels, W. M. M., Sandoval, T. E. (Corresponding author) & Mackus, A. J. M. (Corresponding author), 25 Jul 2024, In: Journal of Physical Chemistry Letters. 15, 29, p. 7496-7501 6 p.Research output: Contribution to journal › Article › Academic › peer-review
Open AccessFile1 Citation (Scopus)45 Downloads (Pure) -
Computational investigation of precursor blocking during area-selective atomic layer deposition using aniline as a small molecule inhibitor
Tezsevin, I., Maas, J. F. W., Merkx, M. J. M., Lengers, R., Kessels, W. M. M., Sandoval, T. E. & Mackus, A. J. M. (Corresponding author), 28 Mar 2023, In: Langmuir. 39, 12, p. 4265-4273 9 p.Research output: Contribution to journal › Article › Academic › peer-review
Open AccessFile16 Citations (Scopus)179 Downloads (Pure)
Datasets
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Supporting information
Merkx, M. J. M. (Creator), Tezsevin, I. (Creator), Yu, P. (Creator), Janssen, T. (Creator), Heinemans, R. H. G. M. (Creator), Lengers, R. J. (Creator), Chen, J.-R. (Creator), Jezewski, C. J. (Creator), Clendenning, S. B. (Creator), Kessels, W. M. M. (Creator), Sandoval, T. E. (Creator) & Mackus, A. J. M. (Creator), AIP Publishing, 22 May 2024
DOI: 10.60893/figshare.jcp.25743183, https://aip.figshare.com/articles/dataset/Supporting_information/25743183 and one more link, https://aip.figshare.com/articles/dataset/Supporting_information/25743183/1 (show fewer)
Dataset
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Data underlying the publication: Blocking mechanisms in area-selective ALD by small molecule inhibitors of different sizes: Steric shielding versus chemical passivation
Yu, P. (Creator), Merkx, M. J. M. (Creator), Tezsevin, I. (Creator), Lemaire, P. C. (Creator), Hausmann, D. M. (Creator), Sandoval, T. E. (Creator), Kessels, W. M. M. (Creator) & Mackus, A. J. M. (Creator), 4TU.Centre for Research Data, 2 May 2024
DOI: 10.4121/c357264b-f395-4409-bedc-328f45f6e6ac, https://data.4tu.nl/datasets/c357264b-f395-4409-bedc-328f45f6e6ac and 2 more links, https://data.4tu.nl/datasets/c357264b-f395-4409-bedc-328f45f6e6ac/1, https://data.4tu.nl/datasets/c357264b-f395-4409-bedc-328f45f6e6ac/2 (show fewer)
Dataset
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Data underlying the publication: Computational Investigation of Precursor Blocking during Area-Selective Atomic Layer Deposition Using Aniline as a Small-Molecule Inhibitor
Tezsevin, I. (Creator), Maas, J. F. W. (Contributor), Merkx, M. J. M. (Creator), Lengers, R. J. (Creator), Kessels, W. M. M. (Creator), Sandoval, T. E. (Creator) & Mackus, A. J. M. (Creator), 4TU.Centre for Research Data, 7 Aug 2023
DOI: 10.4121/0bb03d8b-d1ac-49bc-8010-a498a981cf3e.v1, https://data.4tu.nl/datasets/0bb03d8b-d1ac-49bc-8010-a498a981cf3e/1 and one more link, https://data.4tu.nl/datasets/0bb03d8b-d1ac-49bc-8010-a498a981cf3e (show fewer)
Dataset
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Data underlying the publication: Packing of inhibitor molecules during area-selective atomic layer deposition studied using random sequential adsorption simulations
Li, J. (Creator), Tezsevin, I. (Creator), Merkx, M. J. M. (Creator), Maas, J. F. W. (Creator), Kessels, W. M. M. (Creator), Sandoval, T. E. (Creator) & Mackus, A. J. M. (Creator), 4TU.Centre for Research Data, 7 Aug 2023
DOI: 10.4121/33df3424-ed9b-49cb-910e-64a6d37aa6b0, https://data.4tu.nl/datasets/33df3424-ed9b-49cb-910e-64a6d37aa6b0 and one more link, https://data.4tu.nl/datasets/33df3424-ed9b-49cb-910e-64a6d37aa6b0/1 (show fewer)
Dataset
Press/Media
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2D TMD Materials Enabling Future Electronics
Balasubramanyam, S., Merkx, M. J. M., Verheijen, M. A., Kessels, W. M. M., Mackus, A. J. M. & Bol, A. A.
27/06/21
1 Media contribution
Press/Media: Expert Comment
Thesis
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Area-selective atomic layer deposition of SiO2: studied by in situ Fourier transform infrared spectroscopy and spectroscopic ellipsometry
Merkx, M. J. M. (Author), Mackus, A. (Supervisor 1), 2017Student thesis: Master
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Creeping sparks: influences of a dielectric on the propagation of steamer channels
Merkx, M. J. M. (Author), Trienekens, D. J. M. (Supervisor 1) & Nijdam, S. (Supervisor 2), 2015Student thesis: Bachelor
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