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Dive into the research topics where Marc J.M. Merkx is active. These topic labels come from the works of this person. Together they form a unique fingerprint.
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Research output
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Computational investigation of precursor blocking during area-selective atomic layer deposition using aniline as a small molecule inhibitor
Tezsevin, I., Maas, J. F. W., Merkx, M. J. M., Lengers, R., Kessels, W. M. M., Sandoval, T. E. & Mackus, A. J. M., 28 Mar 2023, In: Langmuir. 39, 12, p. 4265-4273 9 p.Research output: Contribution to journal › Article › Academic › peer-review
Open AccessFile15 Downloads (Pure) -
Area-selective atomic layer deposition using small molecule inhibitors
Merkx, M. J. M., 22 Feb 2022, Eindhoven: Eindhoven University of Technology. 234 p.Research output: Thesis › Phd Thesis 1 (Research TU/e / Graduation TU/e)
Open AccessFile51 Downloads (Pure) -
Packing of inhibitor molecules during area-selective atomic layer deposition studied using random sequential adsorption simulations
Li, J., Tezsevin, I., Merkx, M. J. M., Maas, J. F. W., Kessels, W. M. M., Sandoval, T. E. & Mackus, A. J. M., Dec 2022, In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films. 40, 6, 15 p., 062409.Research output: Contribution to journal › Article › Academic › peer-review
2 Citations (Scopus) -
Relation between Reactive Surface Sites and Precursor Choice for Area-Selective Atomic Layer Deposition Using Small Molecule Inhibitors
Merkx, M. J. M., Angelidis, A., Mameli, A., Li, J., Lemaire, P. C., Sharma, K., Hausmann, D. M., Kessels, W. M. M., Sandoval, T. E. & Mackus, A. J. M., 17 Mar 2022, In: Journal of Physical Chemistry C. 126, 10, p. 4845-4853 9 p.Research output: Contribution to journal › Article › Academic › peer-review
Open AccessFile9 Citations (SciVal)71 Downloads (Pure) -
Dependence of inherent selective atomic layer deposition of FeOxon Pt nanoparticles on the coreactant and temperature
Cai, J., Merkx, M. J. M., Lan, Y., Jing, Y., Cao, K., Wen, Y., Kessels, W. M. M., MacKus, A. J. M. & Chen, R., 1 Jan 2021, In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 39, 1, 7 p., 012404.Research output: Contribution to journal › Article › Academic › peer-review
Open AccessFile2 Citations (SciVal)67 Downloads (Pure)
Press/Media
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2D TMD Materials Enabling Future Electronics
Shashank Balasubramanyam, Marc J.M. Merkx, Marcel A. Verheijen, W.M.M. (Erwin) Kessels, Adrie J.M. Mackus & Ageeth A. Bol
27/06/21
1 Media contribution
Press/Media: Expert Comment
Thesis
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Area-selective atomic layer deposition of SiO2: studied by in situ Fourier transform infrared spectroscopy and spectroscopic ellipsometry
Author: Merkx, M. J. M., 2017Supervisor: Mackus, A. (Supervisor 1)
Student thesis: Master
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Creeping sparks: influences of a dielectric on the propagation of steamer channels
Author: Merkx, M. J. M., 2015Supervisor: Trienekens, D. J. M. (Supervisor 1) & Nijdam, S. (Supervisor 2)
Student thesis: Bachelor
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