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Comment/Letter to the editor
2012

Erratum: Controlling the resistivity gradient in aluminum-doped zinc oxide grown by plasma-enhanced chemical vapor deposition (J. Appl. Phys. (112) 043708 (2012))

Ponomarev, M. V., Verheijen, M. A., Keuning, W., van de Sanden, M. C. M. & Creatore, M., 15 Sep 2012, In : Journal of Applied Physics. 112, 6, 8 p., 069902.

Research output: Contribution to journalComment/Letter to the editorAcademicpeer-review

Open Access
2007