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Dive into the research topics where Judith C.A. van Huijstee is active. These topic labels come from the works of this person. Together they form a unique fingerprint.
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ACCES TKI EPG
Beckers, J., van Huijstee, J. C. A. & Garcia Rochin, R.
15/04/19 → 30/11/23
Project: Research direct
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Spatio-Temporal Plasma Afterglow Induces Additional Neutral Drag Force on Microparticles
van Huijstee, J. C. A., Peijnenburg, A. T. A., Blom, P. P. M. & Beckers, J., 20 Jun 2022, In: Frontiers in Physics. 10, 8 p., 926160.Research output: Contribution to journal › Article › Academic › peer-review
Open AccessFile2 Downloads (Pure) -
Charge neutralisation of microparticles by pulsing a low-pressure shielded spatial plasma afterglow
van Minderhout, B., van Huijstee, J. C. A., Peijnenburg, A. T. A., Blom, P., Kroesen, G. M. W. & Beckers, J., Apr 2021, In: Plasma Sources Science and Technology. 30, 4, 10 p., 045016.Research output: Contribution to journal › Article › Academic › peer-review
Open Access4 Citations (Scopus) -
Charge of clustered microparticles measured in spatial plasma afterglows follows the smallest enclosing sphere model
van Minderhout, B., van Huijstee, J. C. A., Rompelberg, R. M. H., Post, A., Peijnenburg, A. T. A., Blom, P. & Beckers, J., 3 Aug 2021, In: Nature Communications. 12, 1, 7 p., 4692.Research output: Contribution to journal › Article › Academic › peer-review
Open AccessFile1 Citation (Scopus)3 Downloads (Pure) -
Plasma assisted particle contamination control: Plasma charging dependence on particle morphology
van Huijstee, J. C. A., van Minderhout, B., Rompelberg, R. M. H., Blom, P., Peijnenburg, T. & Beckers, J., 2021, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV. Adan, O. & Robinson, J. C. (eds.). SPIE, 6 p. 116113A. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 11611).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review
1 Citation (Scopus) -
Charge control of micro-particles in a shielded plasma afterglow
van Minderhout, B., van Huijstee, J. C. A., Platier, B., Peijnenburg, T., Blom, P. P. M., Kroesen, G. M. W. & Beckers, J., 9 Jun 2020, In: Plasma Sources Science and Technology. 29, 6, 11 p., 065005.Research output: Contribution to journal › Article › Academic › peer-review
Open AccessFile10 Citations (Scopus)28 Downloads (Pure)
Thesis
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Influence of cleanliness of the vessel on particle growth in a low pressure Ar/C2H2 plasma
Author: van Huijstee, J. C. A., 2017Supervisor: Platier, B. (Supervisor 1) & Beckers, J. (Supervisor 2)
Student thesis: Bachelor
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Microparticle charge control in a shielded plasma afterglow
Author: van Huijstee, J. C. A., 2019Supervisor: Beckers, J. (Supervisor 1), van Minderhout, B. (Supervisor 2) & Blom, P. P. M. (Supervisor 2)
Student thesis: Master
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