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Cavity ringdown study of the densities and kinetics of SiHx radicals in a remote SiH4 plasma

Author: Hoefnagels, J., 31 Aug 2000

Supervisor: Kessels, W. (Supervisor 1), Boogaarts, M. G. (External person) (Supervisor 2), van de Sanden, M. (Supervisor 2) & Schram, D. (Supervisor 2)

Student thesis: Master