J.H. (Sanne) Deijkers

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8 Article
1 Report
1 Phd Thesis 1 (Research TU/e / Graduation TU/e)

Growth behavior during metalorganic chemical vapor deposition of MoS2 using di-tert-butyl sulfide as organic sulfur precursor
Deijkers, J. H. (Corresponding author), Medina Silva, H., Manasi, A., Pasko, S., Kessels, W. M. M., Mackus, A. J. M., Groven, B. L. D. & Delabie, A. (Corresponding author), 23 Jan 2026, In: Nanotechnology. 37, 3, 12 p., 035601.
Research output: Contribution to journal › Article › Academic › peer-review

Open Access
File
7 Downloads (Pure)
Experimenten uitleggen met stripfiguur Amber: Vakoverstijgend science-project voor de brugklas
de Putter, L. & Deijkers, J. H., Mar 2025, In: NVOX : Tijdschrift voor Natuurwetenschap op School. 50, 3, p. 8-9 2 p., 2.
Research output: Contribution to journal › Article › Professional
Processing of transition metal chalcogenides for nanoelectronic applications
Deijkers, J. H., 12 Nov 2025, Eindhoven: Eindhoven University of Technology. 148 p.
Research output: Thesis › Phd Thesis 1 (Research TU/e / Graduation TU/e)
11 Downloads (Pure)
Atomic layer deposition of transition metal chalcogenide TaSx using Ta[N(CH3)2]3[NC(CH3)3] precursor and H2S plasma
Deijkers, J. H., Thepass, H., Verheijen, M. A., Sprey, H., Maes, J. W., Kessels, W. M. M. & Mackus, A. J. M. (Corresponding author), Dec 2024, In: Journal of Vacuum Science and Technology A. 42, 6, 7 p., 062404.
Research output: Contribution to journal › Article › Academic › peer-review

Open Access
File
46 Downloads (Pure)
The Consequences of Random Sequential Adsorption for the Precursor Packing and Growth-Per-Cycle of Atomic Layer Deposition Processes
Tezsevin, I., Deijkers, J. H., Merkx, M. J. M., Kessels, W. M. M., Sandoval, T. E. (Corresponding author) & Mackus, A. J. M. (Corresponding author), 25 Jul 2024, In: Journal of Physical Chemistry Letters. 15, 29, p. 7496-7501 6 p.
Research output: Contribution to journal › Article › Academic › peer-review

Open Access
File
8 Link opens in a new tab Citations (Scopus)

85 Downloads (Pure)

Supplementary Material
Deijkers, J. H. (Creator), Thepass, H. (Creator), Verheijen, M. A. (Creator), Sprey, H. (Creator), Maes, J. W. (Creator), Kessels, W. M. M. (Creator) & Mackus, A. J. M. (Creator), AIP Publishing, 2024
DOI: 10.60893/figshare.jva.27111202.v1, https://aip.figshare.com/articles/dataset/Supplementary_Material/27111202/1 and one more link, https://aip.figshare.com/articles/dataset/Supplementary_Material/27111199/1 (show fewer)
Dataset

Thin Film Division Harper Award Winner
Deijkers, J. H. (Recipient), 4 Nov 2024
Prize: Other › Career, activity or publication related prizes (lifetime, best paper, poster etc.) › Scientific

Plasma processing science and technology
Deijkers, J. H., Kessels, W. M. M., Knoops, H. C. M. & Mackus, A. J. M.
1/09/17 → 31/08/26
Course

Hoe zorgt nano-technologie voor steeds kleinere en betere computerchips?
Deijkers, J. H.
20/02/25
1 Media contribution
Press/Media: Public Engagement Activities

De invloed van vaardigheden en herkenbaarheid van bètavakken op de beleving van leerlingen in projectonderwijs
Deijkers, J. H. (Author) & Klaassen, G. B. (Author), Schellings, G. L. M. (Supervisor 1), 6 Sept 2019
Student thesis: Master

File
Niobium oxide as a passivating contact for silicon solar cells
Deijkers, J. H. (Author), Macco, B. (Supervisor 1) & Kessels, W. M. M. (Supervisor 2), 2017
Student thesis: Bachelor

File
On the conformality of silicon oxide prepared by plasma atomic layer deposition: effect of process conditions on the recombination of oxygen radicals
Deijkers, J. H. (Author), Knoops, H. C. M. (Supervisor 1) & Arts, K. (Supervisor 2), 2020
Student thesis: Master

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J.H. (Sanne) Deijkers

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Collaborations and top research areas from the last five years

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Growth behavior during metalorganic chemical vapor deposition of MoS2 using di-tert-butyl sulfide as organic sulfur precursor

Experimenten uitleggen met stripfiguur Amber: Vakoverstijgend science-project voor de brugklas

Processing of transition metal chalcogenides for nanoelectronic applications

Atomic layer deposition of transition metal chalcogenide TaSx using Ta[N(CH3)2]3[NC(CH3)3] precursor and H2S plasma

The Consequences of Random Sequential Adsorption for the Precursor Packing and Growth-Per-Cycle of Atomic Layer Deposition Processes

Supplementary Material

Thin Film Division Harper Award Winner

Plasma processing science and technology

Hoe zorgt nano-technologie voor steeds kleinere en betere computerchips?

De invloed van vaardigheden en herkenbaarheid van bètavakken op de beleving van leerlingen in projectonderwijs

Niobium oxide as a passivating contact for silicon solar cells

On the conformality of silicon oxide prepared by plasma atomic layer deposition: effect of process conditions on the recombination of oxygen radicals

J.H. (Sanne) Deijkers

Fingerprint

Collaborations and top research areas from the last five years

Research output

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Prizes

Courses

Press/Media

Thesis