Research output per year
Research output per year
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Dive into the research topics where J.H. (Sanne) Deijkers is active. These topic labels come from the works of this person. Together they form a unique fingerprint.
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Research output
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Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2
Arts, K., Deijkers, J. H., Puurunen, R. L., Kessels, W. M. M. & Knoops, H. C. M., 8 Apr 2021, (Accepted/In press) In: Journal of Physical Chemistry C. 9 p.Research output: Contribution to journal › Article › Academic › peer-review
Open Access -
Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate
Arts, K., Deijkers, J. H., Faraz, T., Puurunen, R. L., Kessels, W. M. M. & Knoops, H. C. M., 20 Jul 2020, In: Applied Physics Letters. 117, 3, 5 p., 031602.Research output: Contribution to journal › Article › Academic › peer-review
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Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2 as measured with Impedans' Quantum System: Application note [QC03]
Arts, K., Deijkers, J. H., Faraz, T., Puurunen, R. L., Kessels, W. M. M. & Knoops, H. C. M., Aug 2020, Impedans Plasma Measurement. 2 p.Research output: Book/Report › Report › Academic
Open AccessFile19 Downloads (Pure) -
Effective passivation of silicon surfaces by ultrathin atomic-layer deposited niobium oxide
Macco, B., Bivour, M., Deijkers, J. H., Basuvalingam, S. B., Black, L. E., Melskens, J., van de Loo, B. W. H., Berghuis, W. J. H., Hermle, M. & Kessels, W. M. M., 11 Jun 2018, In: Applied Physics Letters. 112, 24, 242105.Research output: Contribution to journal › Article › Academic › peer-review
Open AccessFile7 Citations (Scopus)69 Downloads (Pure)
Student theses
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De invloed van vaardigheden en herkenbaarheid van bètavakken op de beleving van leerlingen in projectonderwijs
Author: Deijkers, J. & Klaassen, G., 6 Sep 2019Supervisor: Schellings, G. L. (Supervisor 1)
Student thesis: Master
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On the conformality of silicon oxide prepared by plasma atomic layer deposition: effect of process conditions on the recombination of oxygen radicals
Author: Deijkers, J., 2020Supervisor: Knoops, H. C. (Supervisor 1) & Arts, K. (Supervisor 2)
Student thesis: Master
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