Projects per year
Personal profile
Quote
The complexity of a lithographic tool, in our field requiring sub-nanometer positioning accuracy while exerting thousands of Newtons, continues to amaze. Its success requires teamwork of people in all disciplines.
Research profile
Hans Butler is a part-time professor in the Control Systems group of the Department of Electrical Engineering at Eindhoven University of Technology. He specializes in lithographic scanner control, an area of expertise he has built through a long career at ASML, where he is also a Fellow. Butler is a specialist in dynamics and control systems.
As a control engineer, Butler has worked at ASML on multiple components of lithographic tools, such as handlers, illuminators, projection systems and stages. Within ASML's Mechatronic Systems Development Department, he has led groups working on actuators, opto-mechatronics, and vibration isolation and damping. Butler is an ASML fellow with dynamics and control as main focus area, in particular in relation to the imaging process. Improving the positioning accuracy from a perspective of dynamics and control has always been the guiding interest throughout his career.
Academic background
Hans Butler holds an MSc (1986) and PhD (1990) degree from Delft University of Technology. In 1991, he joined ASML, where he has led groups working on actuators, opto-mechatronics, dynamics, vibration isolation and damping. In 2002, he became group leader of the Drives group, moving to the System Dynamics group in 2006. In 2010, Butler became an ASML fellow. In 2012 he was appointed part-time professor in Lithographic Scanner Control at Eindhoven University of Technology.
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Collaborations and top research areas from the last five years
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Projects
- 1 Finished
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Advanced piezo-electric water stage
Nawijn, H. (Project communication officer), van der Hagen, D. (Project communication officer), Tóth, R. (Project Manager), Van den Hof, P. M. J. (Project member), Bosman Barros, C. (Project member) & Butler, H. (Project member)
1/01/18 → 30/11/25
Project: Third tier
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A Learning Semi-Active Tuned Mass Damper Design
Romberg, T. L., Verbaan, C. A. M., Butler, H. & Heertjes, M. F., 24 Mar 2026, 45th Benelux Meeting on Systems and Control: Book of Abstracts. p. 206 1 p.Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review
Open AccessFile83 Downloads (Pure) -
Active compensation of position dependent flexible dynamics in high-precision mechatronics
Broens, Y. (Corresponding author-nrf), Butler, H., Kamidi, R., Verkerk, K. & Weiland, S., Oct 2025, In: Mechatronics. 110, 6 p., 103377.Research output: Contribution to journal › Article › Academic › peer-review
Open AccessFile67 Downloads (Pure) -
Structured physics-guided neural networks for electromagnetic commutation applied to industrial linear motors
Bolderman, M. (Corresponding author-nrf), Lazar, M. & Butler, H., Apr 2025, In: Mechatronics. 106, 10 p., 103291.Research output: Contribution to journal › Article › Academic › peer-review
Open AccessFile6 Link opens in a new tab Citations (SciVal)50 Downloads (Pure) -
Data-driven feedforward control design for nonlinear systems: A control-oriented system identification approach
Bolderman, M., Lazar, M. & Butler, H., 19 Jan 2024, 2023 IEEE 62nd Conference on Decision and Control, CDC 2023. Institute of Electrical and Electronics Engineers, p. 4530-4535 6 p. 10383648Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review
Open AccessFile8 Link opens in a new tab Citations (Scopus)178 Downloads (Pure) -
Physics-guided neural networks for feedforward control with input-to-state-stability guarantees
Bolderman, M. (Corresponding author), Butler, H., Koekebakker, S. H., van Horssen, E. P., Kamidi, R. I., Spaan-Burke, T., Strijbosch, N. W. A. & Lazar, M., Apr 2024, In: Control Engineering Practice. 145, 14 p., 105851.Research output: Contribution to journal › Article › Academic › peer-review
Open AccessFile32 Link opens in a new tab Citations (Scopus)438 Downloads (Pure)
Prizes
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Best Student Paper Award IFAC CAO 2022
Bolderman, M. (Recipient), Fan, D. (Recipient), Lazar, M. (Recipient) & Butler, H. (Recipient), 2022
Prize: Other › Career, activity or publication related prizes (lifetime, best paper, poster etc.) › Scientific
Courses
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Selected topics in systems and control
Breschi, V., van den Hof, D. & Butler, H. 1/09/15 → 31/08/27
Course
Press/Media
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US Patent Issued to ASML Netherlands on Oct. 17 for "Object positioning system diagnostic and calibration methods positioning control method lithographic apparatus and device manufacturing method" (Dutch, Belgian Inventors)
18/10/23
1 item of Media coverage
Press/Media: Expert Comment
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ASML Netherlands Seeks Patent for Lithographic Apparatus and Device Manufacturing Method
17/10/23
1 item of Media coverage
Press/Media: Expert Comment
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US Patent Issued to ASML Netherlands on March 21 for "Lithographic apparatus" (Dutch Inventors)
22/03/23
1 item of Media coverage
Press/Media: Expert Comment
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US Patent Issued to ASML Netherlands on Jan. 24 for "Electronic system, accelerometer, calibration method, lithographic apparatus and device manufacturing method" (Dutch Inventors)
25/01/23
1 item of Media coverage
Press/Media: Expert Comment
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US Patent Issued to ASML Netherlands on Jan. 3 for "Lithographic apparatus and method" (Dutch Inventor)
21/01/23
1 item of Media coverage
Press/Media: Expert Comment