Content available in repository
Content available in repository
Personal profile
Quote
The complexity of a lithographic tool, in our field requiring sub-nanometer positioning accuracy while exerting thousands of Newtons, continues to amaze. Its success requires teamwork of people in all disciplines.
Research profile
Hans Butler is a part-time professor in the Control Systems group of the Department of Electrical Engineering at Eindhoven University of Technology. He specializes in lithographic scanner control, an area of expertise he has built through a long career at ASML, where he is also a Fellow. Butler is a specialist in dynamics and control systems.
As a control engineer, Butler has worked at ASML on multiple components of lithographic tools, such as handlers, illuminators, projection systems and stages. Within ASML's Mechatronic Systems Development Department, he has led groups working on actuators, opto-mechatronics, and vibration isolation and damping. Butler is an ASML fellow with dynamics and control as main focus area, in particular in relation to the imaging process. Improving the positioning accuracy from a perspective of dynamics and control has always been the guiding interest throughout his career.
Academic background
Hans Butler holds an MSc (1986) and PhD (1990) degree from Delft University of Technology. In 1991, he joined ASML, where he has led groups working on actuators, opto-mechatronics, dynamics, vibration isolation and damping. In 2002, he became group leader of the Drives group, moving to the System Dynamics group in 2006. In 2010, Butler became an ASML fellow. In 2012 he was appointed part-time professor in Lithographic Scanner Control at Eindhoven University of Technology.
Fingerprint
Dive into the research topics where Hans Butler is active. These topic labels come from the works of this person. Together they form a unique fingerprint.
- 1 Similar Profiles
Network
Recent external collaboration on country/territory level. Dive into details by clicking on the dots or
-
Physics–Guided Neural Networks for Feedforward Control: From Consistent Identification to Feedforward Controller Design
Bolderman, M., Lazar, M. & Butler, H., 10 Jan 2023, 2022 IEEE 61st Conference on Decision and Control, CDC 2022. Institute of Electrical and Electronics Engineers, p. 1497-1502 6 p. 9992852Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review
4 Downloads (Pure) -
Active deformation control for a magnetically-levitated planar motor mover
Proimadis, I., Custers, C., Toth, R., Jansen, J. W., Butler, H., Lomonova, E. & Van den Hof, P. M. J., 2022, In: IEEE Transactions on Industry Applications. 58, 1, p. 242-249 8 p.Research output: Contribution to journal › Article › Academic › peer-review
Open AccessFile3 Citations (Scopus)35 Downloads (Pure) -
Generalization of ILC for fixed order reference trajectories using interpolation
Bolderman, M., Erens, G., Lazar, M. & Butler, H., 11 Mar 2022, 2022 IEEE 17th International Conference on Advanced Motion Control (AMC). Institute of Electrical and Electronics Engineers, p. 294-299 6 p. 9729275Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review
2 Downloads (Pure) -
Generalized feedforward control using physics-informed neural networks
Bolderman, M., Fan, D., Lazar, M. & Butler, H., 1 Jul 2022, In: IFAC-PapersOnLine. 55, 16, p. 148-153 6 p.Research output: Contribution to journal › Conference article › peer-review
Open AccessFile58 Downloads (Pure) -
LPV sequential loop closing for high-precision motion systems
Broens, Y. L. C., Butler, H. & Tóth, R., 5 Sept 2022, 2022 American Control Conference (ACC). Institute of Electrical and Electronics Engineers, p. 3178-3183 6 p. 9867621Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review
Open AccessFile20 Downloads (Pure)
Prizes
-
Best Student Paper Award IFAC CAO 2022
Bolderman, Max (Recipient), Fan, Daiwei (Recipient), Lazar, Mircea (Recipient) & Butler, Hans (Recipient), 2022
Prize: Other › Career, activity or publication related prizes (lifetime, best paper, poster etc.) › Scientific
Courses
Press/Media
-
US Patent Issued to ASML Netherlands on March 21 for "Lithographic apparatus" (Dutch Inventors)
22/03/23
1 item of Media coverage
Press/Media: Expert Comment
-
US Patent Issued to ASML Netherlands on Jan. 24 for "Electronic system, accelerometer, calibration method, lithographic apparatus and device manufacturing method" (Dutch Inventors)
25/01/23
1 item of Media coverage
Press/Media: Expert Comment
-
US Patent Issued to ASML Netherlands on Jan. 3 for "Lithographic apparatus and method" (Dutch Inventor)
21/01/23
1 item of Media coverage
Press/Media: Expert Comment
-
US Patent Issued to ASML Netherlands on Oct. 11 for "Piezoelectric actuator, actuator system, substrate support, and lithographic apparatus including the actuator" (Dutch Inventors)
12/10/22
1 item of Media coverage
Press/Media: Expert Comment
-
US Patent Issued to ASML Netherlands on Oct. 11 for "Height sensor, lithographic apparatus and method for manufacturing devices" (Dutch Inventors)
12/10/22
1 item of Media coverage
Press/Media: Expert Comment