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Research Output 2003 2014

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Article
2014
3 Citations (Scopus)
412 Downloads (Pure)

Dielectric material options for integrated capacitors

Ruhl, G., Lehnert, W., Lukosius, M., Wenger, C., Baristiran Kaynak, C., Blomberg, T., Haukka, S., Baumann, P. K., Besling, W. F. A., Roest, A. L., Riou, B., Lhostis, S., Halimaou, A., Roozeboom, F., Langereis, E., Kessels, W. M. M., Zauner, A. & Rushworth, S. A., 2014, In : ECS Journal of Solid State Science and Technology. 3, 8, p. N120-N125 6 p.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
Capacitors
Leakage currents
Capacitance
Current density
Vapor deposition
2012
12 Citations (Scopus)
97 Downloads (Pure)
Open Access
File
Atomic layer deposition
atomic layer epitaxy
Plasmas
Reaction products
reaction products
2011
40 Citations (Scopus)
87 Downloads (Pure)

Atomic layer deposition of Ru from CpRu(CO2)Et using O2 gas and O2 plasma

Leick, N., Verkuijlen, R. O. F., Lamagna, L., Langereis, E., Rushworth, S. A., Roozeboom, F., Sanden, van de, M. C. M. & Kessels, W. M. M., 2011, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films. 29, 2, p. 021016-1/7 7 p., 021016.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
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Atomic layer deposition
atomic layer epitaxy
Ruthenium
Gases
Plasmas
30 Citations (Scopus)
72 Downloads (Pure)

Remote plasma ALD of SrTiO3 using cyclopentadienlyl-based Ti and Sr precursors

Langereis, E., Roijmans, R. F. H., Roozeboom, F., Sanden, van de, M. C. M. & Kessels, W. M. M., 2011, In : Journal of the Electrochemical Society. 158, 2, p. G34-G38

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
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Plasma deposition
Atomic layer deposition
Strontium
Spectroscopic ellipsometry
Amorphous films
2010
114 Citations (Scopus)
331 Downloads (Pure)

Conformality of plasma-assisted ALD: physical processes and modeling

Knoops, H. C. M., Langereis, E., Sanden, van de, M. C. M. & Kessels, W. M. M., 2010, In : Journal of the Electrochemical Society. 157, 12, p. G241-G249

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
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Atomic layer deposition
Aspect ratio
Plasmas
Metals
Oxides
504 Downloads (Pure)

In situ spectroscopic ellipsometry for atomic layer deposition

Langereis, E., Heil, S. B. S., Knoops, H. C. M., Keuning, W., Sanden, van de, M. C. M. & Kessels, W. M. M., 2010, In : Society of Vacuum Coaters Bulletin. 2010, spring, p. 36-41

Research output: Contribution to journalArticleProfessional

Open Access
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atomic layer epitaxy
ellipsometry
cycles
film thickness
nucleation
106 Citations (Scopus)
348 Downloads (Pure)

Low temperature plasma-enhanced atomic layer deposition of metal oxide thin films

Potts, S. E., Keuning, W., Langereis, E., Dingemans, G., Sanden, van de, M. C. M. & Kessels, W. M. M., 2010, In : Journal of the Electrochemical Society. 157, 7, p. P66-P74 9 p.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
Atomic layer deposition
Oxide films
Metals
Plasmas
Thin films
40 Citations (Scopus)
841 Downloads (Pure)
Open Access
File
Optical emission spectroscopy
Atomic layer deposition
optical emission spectroscopy
atomic layer epitaxy
Plasmas
2009
74 Citations (Scopus)
2 Downloads (Pure)

In situ infrared characterization during atomic layer deposition of lanthanum oxide

Kwon, J., Dai, M., Halls, M. D., Langereis, E., Chabal, Y. J. & Gordon, R. G., 2009, In : Journal of Physical Chemistry C. 113, 2, p. 654-660

Research output: Contribution to journalArticleAcademicpeer-review

Lanthanum oxides
lanthanum oxides
Atomic layer deposition
atomic layer epitaxy
Infrared radiation
192 Citations (Scopus)
4 Downloads (Pure)

In situ spectroscopic ellipsometry as a versatile tool for studying atomic layer deposition

Langereis, E., Heil, S. B. S., Knoops, H. C. M., Keuning, W., Sanden, van de, M. C. M. & Kessels, W. M. M., 2009, In : Journal of Physics D: Applied Physics. 42, 7, p. 073001-1/19

Research output: Contribution to journalArticleAcademicpeer-review

Spectroscopic ellipsometry
Atomic layer deposition
atomic layer epitaxy
ellipsometry
Film thickness
2008
65 Citations (Scopus)
376 Downloads (Pure)

Deposition of TiN and TaN by remote plasma ALD for Cu and Li diffusion barrier applications

Knoops, H. C. M., Baggetto, L., Langereis, E., Sanden, van de, M. C. M., Klootwijk, J. H., Roozeboom, F., Niessen, R. A. H., Notten, P. H. L. & Kessels, W. M. M., 2008, In : Journal of the Electrochemical Society. 155, 12, p. G287-G294 8 p.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
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Plasma deposition
Diffusion barriers
Atomic layer deposition
Silicon
Plasmas
97 Citations (Scopus)
188 Downloads (Pure)

Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy

Langereis, E., Keijmel, J., Sanden, van de, M. C. M. & Kessels, W. M. M., 2008, In : Applied Physics Letters. 92, 23, p. 231904-1/3 3 p., 231904.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
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atomic layer epitaxy
infrared spectroscopy
chemistry
impurities
metal oxides
2007
19 Citations (Scopus)
1 Downloads (Pure)

Opportunities for plasma-assisted atomic layer deposition

Kessels, W. M. M., Heil, S. B. S., Langereis, E., Hemmen, van, J. L., Knoops, H. C. M., Keuning, W. & Sanden, van de, M. C. M., 2007, In : ECS Transactions. 3, 15, p. 183-190

Research output: Contribution to journalArticleAcademicpeer-review

Atomic layer deposition
Plasmas
Semiconductor devices
Processing
61 Citations (Scopus)
133 Downloads (Pure)
Open Access
File
atomic layer epitaxy
electrical resistivity
synthesis
ellipsometry
optical emission spectroscopy
2006
81 Citations (Scopus)
173 Downloads (Pure)

In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3

Heil, S. B. S., Kudlacek, P., Langereis, E., Engeln, R. A. H., Sanden, van de, M. C. M. & Kessels, W. M. M., 2006, In : Applied Physics Letters. 89, 13, p. 131505-1/3 3 p., 131505.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
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atomic layer epitaxy
oxides
optical emission spectroscopy
quartz crystals
microbalances
56 Citations (Scopus)
241 Downloads (Pure)

In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition

Langereis, E., Heil, S. B. S., Sanden, van de, M. C. M. & Kessels, W. M. M., 2006, In : Journal of Applied Physics. 100, 2, p. 023534-1/10 023534.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
atomic layer epitaxy
ellipsometry
mean free path
film thickness
nucleation
76 Citations (Scopus)
90 Downloads (Pure)

Low-temperature deposition of TiN by plasma-assisted atomic layer deposition

Heil, S. B. S., Langereis, E., Roozeboom, F., Sanden, van de, M. C. M. & Kessels, W. M. M., 2006, In : Journal of the Electrochemical Society. 153, 11, p. G956-G965

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
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Titanium nitride
Atomic layer deposition
Plasmas
Ions
Temperature
220 Citations (Scopus)
426 Downloads (Pure)

Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers

Langereis, E., Creatore, M., Heil, S. B. S., Sanden, van de, M. C. M. & Kessels, W. M. M., 2006, In : Applied Physics Letters. 89, 8, p. 081915-1/3 3 p., 081915.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
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atomic layer epitaxy
moisture
water vapor
polymers
purging
17 Citations (Scopus)
Spectroscopic ellipsometry
Microstructural evolution
ellipsometry
roughness
Surface roughness
514 Citations (Scopus)
455 Downloads (Pure)

Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3

Hoex, B., Heil, S. B. S., Langereis, E., Sanden, van de, M. C. M. & Kessels, W. M. M., 2006, In : Applied Physics Letters. 89, 4, p. 042112-1/3 042112.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
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passivity
thick films
solar cells
electrical resistivity
oxides
2005
11 Citations (Scopus)
2 Downloads (Pure)

Initial growth and properties of atomic layer deposited TiN films studied by in situ spectroscopic ellipsometry

Langereis, E., Heil, S. B. S., Sanden, van de, M. C. M. & Kessels, W. M. M., 2005, In : Physica Status Solidi C: Conferences. 2, 12, p. 3958-3962

Research output: Contribution to journalArticleAcademicpeer-review

ellipsometry
nucleation
oxides
film thickness
cycles
33 Citations (Scopus)
118 Downloads (Pure)
Open Access
File
Titanium nitride
Spectroscopic ellipsometry
Atomic layer deposition
titanium nitrides
atomic layer epitaxy
8 Citations (Scopus)
surface diffusion
surface reactions
silicon
thin films
ultrahigh vacuum