• 1906 Citations
20032014

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Article
2014

Dielectric material options for integrated capacitors

Ruhl, G., Lehnert, W., Lukosius, M., Wenger, C., Baristiran Kaynak, C., Blomberg, T., Haukka, S., Baumann, P. K., Besling, W. F. A., Roest, A. L., Riou, B., Lhostis, S., Halimaou, A., Roozeboom, F., Langereis, E., Kessels, W. M. M., Zauner, A. & Rushworth, S. A., 2014, In : ECS Journal of Solid State Science and Technology. 3, 8, p. N120-N125 6 p.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
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3 Citations (Scopus)
431 Downloads (Pure)
2012
Open Access
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12 Citations (Scopus)
100 Downloads (Pure)
2011

Atomic layer deposition of Ru from CpRu(CO2)Et using O2 gas and O2 plasma

Leick, N., Verkuijlen, R. O. F., Lamagna, L., Langereis, E., Rushworth, S. A., Roozeboom, F., Sanden, van de, M. C. M. & Kessels, W. M. M., 2011, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films. 29, 2, p. 021016-1/7 7 p., 021016.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
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40 Citations (Scopus)
91 Downloads (Pure)

Remote plasma ALD of SrTiO3 using cyclopentadienlyl-based Ti and Sr precursors

Langereis, E., Roijmans, R. F. H., Roozeboom, F., Sanden, van de, M. C. M. & Kessels, W. M. M., 2011, In : Journal of the Electrochemical Society. 158, 2, p. G34-G38

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
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30 Citations (Scopus)
76 Downloads (Pure)
2010

Conformality of plasma-assisted ALD: physical processes and modeling

Knoops, H. C. M., Langereis, E., Sanden, van de, M. C. M. & Kessels, W. M. M., 2010, In : Journal of the Electrochemical Society. 157, 12, p. G241-G249

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
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114 Citations (Scopus)
344 Downloads (Pure)

In situ spectroscopic ellipsometry for atomic layer deposition

Langereis, E., Heil, S. B. S., Knoops, H. C. M., Keuning, W., Sanden, van de, M. C. M. & Kessels, W. M. M., 2010, In : Society of Vacuum Coaters Bulletin. 2010, spring, p. 36-41

Research output: Contribution to journalArticleProfessional

Open Access
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507 Downloads (Pure)

Low temperature plasma-enhanced atomic layer deposition of metal oxide thin films

Potts, S. E., Keuning, W., Langereis, E., Dingemans, G., Sanden, van de, M. C. M. & Kessels, W. M. M., 2010, In : Journal of the Electrochemical Society. 157, 7, p. P66-P74 9 p.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
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106 Citations (Scopus)
352 Downloads (Pure)
Open Access
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41 Citations (Scopus)
865 Downloads (Pure)
2009

In situ infrared characterization during atomic layer deposition of lanthanum oxide

Kwon, J., Dai, M., Halls, M. D., Langereis, E., Chabal, Y. J. & Gordon, R. G., 2009, In : Journal of Physical Chemistry C. 113, 2, p. 654-660

Research output: Contribution to journalArticleAcademicpeer-review

74 Citations (Scopus)
2 Downloads (Pure)

In situ spectroscopic ellipsometry as a versatile tool for studying atomic layer deposition

Langereis, E., Heil, S. B. S., Knoops, H. C. M., Keuning, W., Sanden, van de, M. C. M. & Kessels, W. M. M., 2009, In : Journal of Physics D: Applied Physics. 42, 7, p. 073001-1/19

Research output: Contribution to journalArticleAcademicpeer-review

193 Citations (Scopus)
4 Downloads (Pure)
2008

Deposition of TiN and TaN by remote plasma ALD for Cu and Li diffusion barrier applications

Knoops, H. C. M., Baggetto, L., Langereis, E., Sanden, van de, M. C. M., Klootwijk, J. H., Roozeboom, F., Niessen, R. A. H., Notten, P. H. L. & Kessels, W. M. M., 2008, In : Journal of the Electrochemical Society. 155, 12, p. G287-G294 8 p.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
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65 Citations (Scopus)
390 Downloads (Pure)

Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy

Langereis, E., Keijmel, J., Sanden, van de, M. C. M. & Kessels, W. M. M., 2008, In : Applied Physics Letters. 92, 23, p. 231904-1/3 3 p., 231904.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
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97 Citations (Scopus)
192 Downloads (Pure)
2007

Opportunities for plasma-assisted atomic layer deposition

Kessels, W. M. M., Heil, S. B. S., Langereis, E., Hemmen, van, J. L., Knoops, H. C. M., Keuning, W. & Sanden, van de, M. C. M., 2007, In : ECS Transactions. 3, 15, p. 183-190

Research output: Contribution to journalArticleAcademicpeer-review

19 Citations (Scopus)
1 Downloads (Pure)
Open Access
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61 Citations (Scopus)
136 Downloads (Pure)
2006

In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3

Heil, S. B. S., Kudlacek, P., Langereis, E., Engeln, R. A. H., Sanden, van de, M. C. M. & Kessels, W. M. M., 2006, In : Applied Physics Letters. 89, 13, p. 131505-1/3 3 p., 131505.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
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81 Citations (Scopus)
176 Downloads (Pure)

In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition

Langereis, E., Heil, S. B. S., Sanden, van de, M. C. M. & Kessels, W. M. M., 2006, In : Journal of Applied Physics. 100, 2, p. 023534-1/10 023534.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
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56 Citations (Scopus)
248 Downloads (Pure)

Low-temperature deposition of TiN by plasma-assisted atomic layer deposition

Heil, S. B. S., Langereis, E., Roozeboom, F., Sanden, van de, M. C. M. & Kessels, W. M. M., 2006, In : Journal of the Electrochemical Society. 153, 11, p. G956-G965

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
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77 Citations (Scopus)
93 Downloads (Pure)

Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers

Langereis, E., Creatore, M., Heil, S. B. S., Sanden, van de, M. C. M. & Kessels, W. M. M., 2006, In : Applied Physics Letters. 89, 8, p. 081915-1/3 3 p., 081915.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
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220 Citations (Scopus)
430 Downloads (Pure)
17 Citations (Scopus)

Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3

Hoex, B., Heil, S. B. S., Langereis, E., Sanden, van de, M. C. M. & Kessels, W. M. M., 2006, In : Applied Physics Letters. 89, 4, p. 042112-1/3 042112.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
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523 Citations (Scopus)
463 Downloads (Pure)
2005

Initial growth and properties of atomic layer deposited TiN films studied by in situ spectroscopic ellipsometry

Langereis, E., Heil, S. B. S., Sanden, van de, M. C. M. & Kessels, W. M. M., 2005, In : Physica Status Solidi C: Conferences. 2, 12, p. 3958-3962

Research output: Contribution to journalArticleAcademicpeer-review

11 Citations (Scopus)
2 Downloads (Pure)
Open Access
File
33 Citations (Scopus)
121 Downloads (Pure)
8 Citations (Scopus)