• 1893 Citations
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Research Output 2003 2014

2014
3 Citations (Scopus)
410 Downloads (Pure)

Dielectric material options for integrated capacitors

Ruhl, G., Lehnert, W., Lukosius, M., Wenger, C., Baristiran Kaynak, C., Blomberg, T., Haukka, S., Baumann, P. K., Besling, W. F. A., Roest, A. L., Riou, B., Lhostis, S., Halimaou, A., Roozeboom, F., Langereis, E., Kessels, W. M. M., Zauner, A. & Rushworth, S. A., 2014, In : ECS Journal of Solid State Science and Technology. 3, 8, p. N120-N125 6 p.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
Capacitors
Leakage currents
Capacitance
Current density
Vapor deposition
2012
12 Citations (Scopus)
97 Downloads (Pure)
Open Access
File
Atomic layer deposition
atomic layer epitaxy
Plasmas
Reaction products
reaction products
2011
40 Citations (Scopus)
87 Downloads (Pure)

Atomic layer deposition of Ru from CpRu(CO2)Et using O2 gas and O2 plasma

Leick, N., Verkuijlen, R. O. F., Lamagna, L., Langereis, E., Rushworth, S. A., Roozeboom, F., Sanden, van de, M. C. M. & Kessels, W. M. M., 2011, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films. 29, 2, p. 021016-1/7 7 p., 021016.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
Atomic layer deposition
atomic layer epitaxy
Ruthenium
Gases
Plasmas
30 Citations (Scopus)
72 Downloads (Pure)

Remote plasma ALD of SrTiO3 using cyclopentadienlyl-based Ti and Sr precursors

Langereis, E., Roijmans, R. F. H., Roozeboom, F., Sanden, van de, M. C. M. & Kessels, W. M. M., 2011, In : Journal of the Electrochemical Society. 158, 2, p. G34-G38

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
Plasma deposition
Atomic layer deposition
Strontium
Spectroscopic ellipsometry
Amorphous films
2010
1 Downloads (Pure)

3D-integrated all-solid-state capacitors

Roozeboom, F., Langereis, E., Leick, N., Sanden, van de, M. C. M., Kessels, W. M. M., Klootwijk, J. H., Dekkers, W., Tois, E., Tuominen, M., Lamy, Y., Jinesh, K. B., Besling, W. F. A., Roest, A. & Bunel, C., 2010, Invited presentation at Symposium FD on ‘Electrochemical Energy Storage Systems: the Next Evolution’ of the Forum on New Materials, Montcatini Terme, June 13-18, 2010. p. FD-2:IL05-

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

114 Citations (Scopus)
331 Downloads (Pure)

Conformality of plasma-assisted ALD: physical processes and modeling

Knoops, H. C. M., Langereis, E., Sanden, van de, M. C. M. & Kessels, W. M. M., 2010, In : Journal of the Electrochemical Society. 157, 12, p. G241-G249

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
Atomic layer deposition
Aspect ratio
Plasmas
Metals
Oxides

Growth and material properties of nanometer ruthenium films deposited by atomic layer deposition

Leick, N., Verkuijlen, R. O. F., Langereis, E., Roozeboom, F. & Sanden, van de, M. C. M., 2010, Physics@FOM Veldhoven, 19-20 January 2010, Veldhoven, The Netherlands. Graef, de, M., Zegers, G., Min, E. & Pavert, van de, F. (eds.). Utrecht: Stichting FOM, p. P05.67-204

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

504 Downloads (Pure)

In situ spectroscopic ellipsometry for atomic layer deposition

Langereis, E., Heil, S. B. S., Knoops, H. C. M., Keuning, W., Sanden, van de, M. C. M. & Kessels, W. M. M., 2010, In : Society of Vacuum Coaters Bulletin. 2010, spring, p. 36-41

Research output: Contribution to journalArticleProfessional

Open Access
File
atomic layer epitaxy
ellipsometry
cycles
film thickness
nucleation
106 Citations (Scopus)
348 Downloads (Pure)

Low temperature plasma-enhanced atomic layer deposition of metal oxide thin films

Potts, S. E., Keuning, W., Langereis, E., Dingemans, G., Sanden, van de, M. C. M. & Kessels, W. M. M., 2010, In : Journal of the Electrochemical Society. 157, 7, p. P66-P74 9 p.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
Atomic layer deposition
Oxide films
Metals
Plasmas
Thin films
40 Citations (Scopus)
841 Downloads (Pure)
Open Access
File
Optical emission spectroscopy
Atomic layer deposition
optical emission spectroscopy
atomic layer epitaxy
Plasmas

Real time optical probes of ALD and CVD thin films for c-Si photovoltaics

Kessels, W. M. M., Terlinden, N. M., Gielis, J. J. H., Langereis, E. & Sanden, van de, M. C. M., 2010, Proceedings of the 5th International Conference on Spectroscopic Ellipsometry (ICSE-V), 23-28 May 2010, Albany, NY, USA. Albany, NY, USA

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

vapor deposition
probes
thin films
2009
74 Citations (Scopus)
2 Downloads (Pure)

In situ infrared characterization during atomic layer deposition of lanthanum oxide

Kwon, J., Dai, M., Halls, M. D., Langereis, E., Chabal, Y. J. & Gordon, R. G., 2009, In : Journal of Physical Chemistry C. 113, 2, p. 654-660

Research output: Contribution to journalArticleAcademicpeer-review

Lanthanum oxides
lanthanum oxides
Atomic layer deposition
atomic layer epitaxy
Infrared radiation
192 Citations (Scopus)
4 Downloads (Pure)

In situ spectroscopic ellipsometry as a versatile tool for studying atomic layer deposition

Langereis, E., Heil, S. B. S., Knoops, H. C. M., Keuning, W., Sanden, van de, M. C. M. & Kessels, W. M. M., 2009, In : Journal of Physics D: Applied Physics. 42, 7, p. 073001-1/19

Research output: Contribution to journalArticleAcademicpeer-review

Spectroscopic ellipsometry
Atomic layer deposition
atomic layer epitaxy
ellipsometry
Film thickness
1 Downloads (Pure)

In situ spectroscopic ellipsometry for atomic layer deposition

Langereis, E., Heil, S. B. S., Knoops, H. C. M., Keuning, W., Sanden, van de, M. C. M. & Kessels, W. M. M., 2009, SVC 52nd Annual Technical Conference, Santa Clara Convention Center, Santa Clara, CA, May 9-14, 2009. Santa Clara, CA, USA, p. 61-66 (Society of Vacuum Coaters. Annual Technical Conference Proceedings ; vol. 505).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

atomic layer epitaxy
ellipsometry
cycles
film thickness
nucleation

In-situ spectroscopic ellipsometry for atomic layer deposition

Langereis, E., Heil, S. B. S., Knoops, H. C. M., Keuning, W., Sanden, van de, M. C. M. & Kessels, W. M. M., 2009. 8 p.

Research output: Contribution to conferenceOther

atomic layer epitaxy
ellipsometry
cycles
film thickness
nucleation
3 Citations (Scopus)
1 Downloads (Pure)

Low temperature plasma-enhanced atomic layer deposition of metal oxide thin films

Potts, S. E., van den Elzen, L. R. J. G., Dingemans, G., Langereis, E., Keuning, W., Sanden, van de, M. C. M. & Kessels, W. M. M., 2009, Atomic layer deposition applications 5 : Proceedings of the 5th Symposium on Atomic Layer Deposition as part of the 216th Meeting of the Electrochemical Society 5 -7 October 2009, Vienna. Pennington, NJ: Electrochemical Socity, p. 233-242 (ECS Transactions; vol. 25).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

cold plasmas
atomic layer epitaxy
metal oxides
thin films
routes
115 Downloads (Pure)

OLED Encapsulation by Room Temperature Plasma-Assisted ALD Al2O3 Films

Keuning, W., Creatore, M., Langereis, E., Lifka, H., Weijer, van de, P. & Sanden, van de, M. C. M., 2009, Proceedings of the 56th international American Vacuum Society Symposium & Exhibition (AVS 56) 8-13 November 2009, San Jose, California. New York, NY: AVS, p. TF2-TuM11-64

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

Open Access
File
atomic layer epitaxy
room temperature
barrier layers
defects
light emitting diodes
2 Downloads (Pure)

Plasma-assisted ALD : from basic understanding to successful commercialization

Kessels, W. M. M., Hodson, C. J., Fang, Q., Singh, N., Anderson, F., Keuning, W., Heil, S., Hemmen, van, H., Langereis, E. & Sanden, van de, M. C. M., 2009. 11 p.

Research output: Contribution to conferenceOther

45 Downloads (Pure)

Thermal and Remote Plasma ALD of Ru from CpRu(CO)2Et and O2

Leick, N., Verkuijlen, R. O. F., Langereis, E., Rushworth, S. A., Roozeboom, F., Sanden, van de, M. C. M. & Kessels, W. M. M., 2009, Proceedings of the 56th international American Vacuum Society Symposium & Exhibition (AVS 56) 8-13 November 2009, San Jose, California. New York, NY: AVS, p. TF2-MoM1-20

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

Open Access
File
thermal plasmas
atomic layer epitaxy
ruthenium
nucleation
roughness
2008
65 Citations (Scopus)
376 Downloads (Pure)

Deposition of TiN and TaN by remote plasma ALD for Cu and Li diffusion barrier applications

Knoops, H. C. M., Baggetto, L., Langereis, E., Sanden, van de, M. C. M., Klootwijk, J. H., Roozeboom, F., Niessen, R. A. H., Notten, P. H. L. & Kessels, W. M. M., 2008, In : Journal of the Electrochemical Society. 155, 12, p. G287-G294 8 p.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
Plasma deposition
Diffusion barriers
Atomic layer deposition
Silicon
Plasmas
1 Downloads (Pure)

Optical emission spectroscopy as a tool for studying, optimizing, and monitoring layer deposition processes

Mackus, A. J. M., Heil, S. B. S., Langereis, E., Knoops, H. C. M., Sanden, van de, M. C. M. & Kessels, W. M. M., 2008, Proceedings of the 8th International Conference on Atomic Layer Deposition (ALD 2008), June 29 - July 2008, Bruges, Belgium (Book of Abstracts). Kessels, W. M. M. & Delabie, A. (eds.). S.n.: s.n., p. P-76-

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

13 Citations (Scopus)

Plasma-assisted ALD of Al2O3 at low temperatures : reaction mechanism and material properties

Langereis, E., Bouman, M., Keijmel, J., Heil, S. B. S., Sanden, van de, M. C. M. & Kessels, W. M. M., 2008, Atomic Layer Deposition Applications 4 - 214th ECS Meeting; Honolulu, HI; 13 October 2008 through 15 October 2008. p. 247-255 (ECS Transactions; vol. 16).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Materials properties
Plasmas
Substrates
Byproducts
Temperature
782 Downloads (Pure)

Plasma-assisted atomic layer deposition : an in situ diagnostic study

Langereis, E., 2008, Eindhoven: Technische Universiteit Eindhoven. 176 p.

Research output: ThesisPhd Thesis 1 (Research TU/e / Graduation TU/e)

Open Access
File
Atomic layer deposition
Plasmas
Infrared spectroscopy
Spectroscopic ellipsometry
Metals

Polymer-Led encapsulation by means of plasma-assisted ALD AI2O3 films

Creatore, M., Keuning, W., Langereis, E., Lifka, H., Weijer, van de, P., Sanden, van de, M. C. M. & Kessels, W. M. M., 2008, Proceedings of the 8th International Conference on Atomic Layer Deposition (ALD 2008), June 29 - July 2008, Bruges, Belgium (Book of Abstracts). Kessels, W. M. M. & Delabie, A. (eds.). S.n.: s.n., p. WedA2b-2-

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

2 Downloads (Pure)

Remote plasma ALD of amorphous and anatase TiO2 studied by in-situ spectroscopic ellipsometry

Keuning, W., Langereis, E., Hemmen, van, J. L., Muraza, O., Rebrov, E., Sanden, van de, M. C. M. & Kessels, W. M. M., 2008, Proceedings of the 8th International Conference on Atomic Layer Deposition (ALD 2008), June 29 - July 2008, Bruges, Belgium (Book of Abstracts). Kessels, W. M. M. & Delabie, A. (eds.). S.n.: s.n., p. P-87-

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Surface chemistry of plasma assisted ALD of AI2O3 at low deposition temperatures

Langereis, E., Keijmel, J., Bouman, M., Sanden, van de, M. C. M. & Kessels, W. M. M., 2008, Proceedings of the 8th International Conference on Atomic Layer Deposition (ALD 2008), June 29 - July 2008, Bruges, Belgium (Book of Abstracts). Kessels, W. M. M. & Delabie, A. (eds.). S.n.: s.n., p. MonM2-3-

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

97 Citations (Scopus)
188 Downloads (Pure)

Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy

Langereis, E., Keijmel, J., Sanden, van de, M. C. M. & Kessels, W. M. M., 2008, In : Applied Physics Letters. 92, 23, p. 231904-1/3 3 p., 231904.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
atomic layer epitaxy
infrared spectroscopy
chemistry
impurities
metal oxides

Transmission infrared spectroscopy to measure surface groups and reaction by-products during ALD

Bouman, M., Langereis, E., Keijmel, J., Kessels, W. M. M., Lee, I. & Zaera, F., 2008, Proceedings of the 8th International Conference on Atomic Layer Deposition (ALD 2008), June 29 - July 2008, Bruges, Belgium (Book of Abstracts). Kessels, W. M. M. & Delabie, A. (eds.). S.n.: s.n., p. P-104-

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

2007
4 Citations (Scopus)

Deposition of TiN and TaN by remote plasma ALD for diffusion barrier applications

Knoops, H. C. M., Baggetto, L., Langereis, E., Sanden, van de, M. C. M., Klootwijk, J. H., Roozeboom, F., Niessen, R. A. H., Notten, P. H. L. & Kessels, W. M. M., 2007, Proceedings of the 3th symposium on Atomic Layer Deposition Applications as part of the 212th ECS Meeting, 8-9 October 2007, Washington D.C., USA. Londergan, A., Straten, van der, O., Bent, S. F., Elam, J. W., Gendt, de, S. & Kang, S. B. (eds.). Pennington, New Jersey, USA: Electrochemical Society, p. 45-54 (ECS Transactions; vol. 11).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

lithium
copper
electrical resistivity
59 Downloads (Pure)

On the film microstructure control by means of PE-CVD and PA-ALD

Creatore, M., Langereis, E., Terlinden, N. M., Hemmen, van, J. L., Kessels, W. M. M. & Sanden, van de, M. C. M., 2007, Proceedings of the 18th international symposium on plasma chemistry (ISPC 18) 26-31 August 2007, Kyoto, Japan. Tachibana, K., Takai, O., Ono, K. & Shirafuji, T. (eds.). Kyoto, Japan: Kyoto University, p. 27A-P3-1/4

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

Open Access
File
atomic layer epitaxy
vapor deposition
microstructure
desorption
bombardment

On the film microstructure control by means of PE-CVD and PA-ALD

Creatore, M., Langereis, E., Terlinden, N. M., Hemmen, van, J. L., Kessels, W. M. M. & Sanden, van de, M. C. M., 2007, Proceedings of the 50th Society of Vacuum Coaters Conference (SVC) and 50th Annual Technical Conference, 28 April - 3 May 2007, Louisville, Kentucky, USA. Albuquerque, NM, U.S.A.: Society of Vacuum Coaters

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

atomic layer epitaxy
vapor deposition
microstructure
desorption
bombardment
19 Citations (Scopus)
1 Downloads (Pure)

Opportunities for plasma-assisted atomic layer deposition

Kessels, W. M. M., Heil, S. B. S., Langereis, E., Hemmen, van, J. L., Knoops, H. C. M., Keuning, W. & Sanden, van de, M. C. M., 2007, In : ECS Transactions. 3, 15, p. 183-190

Research output: Contribution to journalArticleAcademicpeer-review

Atomic layer deposition
Plasmas
Semiconductor devices
Processing
61 Citations (Scopus)
133 Downloads (Pure)
Open Access
File
atomic layer epitaxy
electrical resistivity
synthesis
ellipsometry
optical emission spectroscopy
2006
81 Citations (Scopus)
173 Downloads (Pure)

In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3

Heil, S. B. S., Kudlacek, P., Langereis, E., Engeln, R. A. H., Sanden, van de, M. C. M. & Kessels, W. M. M., 2006, In : Applied Physics Letters. 89, 13, p. 131505-1/3 3 p., 131505.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
atomic layer epitaxy
oxides
optical emission spectroscopy
quartz crystals
microbalances
56 Citations (Scopus)
241 Downloads (Pure)

In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition

Langereis, E., Heil, S. B. S., Sanden, van de, M. C. M. & Kessels, W. M. M., 2006, In : Journal of Applied Physics. 100, 2, p. 023534-1/10 023534.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
atomic layer epitaxy
ellipsometry
mean free path
film thickness
nucleation
76 Citations (Scopus)
90 Downloads (Pure)

Low-temperature deposition of TiN by plasma-assisted atomic layer deposition

Heil, S. B. S., Langereis, E., Roozeboom, F., Sanden, van de, M. C. M. & Kessels, W. M. M., 2006, In : Journal of the Electrochemical Society. 153, 11, p. G956-G965

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
Titanium nitride
Atomic layer deposition
Plasmas
Ions
Temperature

Plasma-assisted atomic layer deposition of AI2O3 films

Heil, S. B. S., Langereis, E., Sanden, van de, M. C. M. & Kessels, W. M. M., 2006, p. A 18-.

Research output: Contribution to conferencePoster

atomic layer epitaxy
atomic layer epitaxy
moisture
polymers
220 Citations (Scopus)
426 Downloads (Pure)

Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers

Langereis, E., Creatore, M., Heil, S. B. S., Sanden, van de, M. C. M. & Kessels, W. M. M., 2006, In : Applied Physics Letters. 89, 8, p. 081915-1/3 3 p., 081915.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
atomic layer epitaxy
moisture
water vapor
polymers
purging
3 Downloads (Pure)

Plasma-assisted atomic layer deposition of Al-2O3 on polymers

Langereis, E., Heil, S. B. S., Creatore, M., Sanden, van de, M. C. M. & Kessels, W. M. M., 2006, Proceedings 49th Annual Technical Conference of Vacuum Coaters, Washington DC, USA. p. 151-

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

atomic layer epitaxy
moisture
polymers
composite materials
temperature

Plasma-assisted growth of moisture diffusion barrier films on polymers : from chemical vapour deposition to atomic layer deposition

Creatore, M., Langereis, E., Heil, S. B. S., Sanden, van de, M. C. M. & Kessels, W. M. M., 2006, Proceedings of the 10th International Conference on Plasma Surface Engineering : Conference and Exhibition (PSE 2006), September 10-15, 2006, Garmisch-Partenkirchen, Germany (Abstracts). S.l.: s.n., p. 37-37

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

17 Citations (Scopus)
Spectroscopic ellipsometry
Microstructural evolution
ellipsometry
roughness
Surface roughness
514 Citations (Scopus)
455 Downloads (Pure)

Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3

Hoex, B., Heil, S. B. S., Langereis, E., Sanden, van de, M. C. M. & Kessels, W. M. M., 2006, In : Applied Physics Letters. 89, 4, p. 042112-1/3 042112.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
passivity
thick films
solar cells
electrical resistivity
oxides
2005
11 Citations (Scopus)
2 Downloads (Pure)

Initial growth and properties of atomic layer deposited TiN films studied by in situ spectroscopic ellipsometry

Langereis, E., Heil, S. B. S., Sanden, van de, M. C. M. & Kessels, W. M. M., 2005, In : Physica Status Solidi C: Conferences. 2, 12, p. 3958-3962

Research output: Contribution to journalArticleAcademicpeer-review

ellipsometry
nucleation
oxides
film thickness
cycles
1 Citation (Scopus)

Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications

Heil, S. B. S., Langereis, E., Roozeboom, F., Kemmeren, A., Pham, N. P., Sarro, P. M., Sanden, van de, M. C. M. & Kessels, W. M. M., 2005, Materials, technology and reliability for advanced interconnects - 2005 : symposium held March 28 - April 1 2005, San Francisco, California, U.S.A.. Besser, R. (ed.). Warrendale, Pa: Materials Research Society, p. 215-220 (Materials Research Society Symposium Proceedings; vol. 863).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

33 Citations (Scopus)
118 Downloads (Pure)
Open Access
File
Titanium nitride
Spectroscopic ellipsometry
Atomic layer deposition
titanium nitrides
atomic layer epitaxy
8 Citations (Scopus)
surface diffusion
surface reactions
silicon
thin films
ultrahigh vacuum
2004
3 Citations (Scopus)
50 Downloads (Pure)

New ultrahigh vacuum setup and advanced diagnostic techniques for studying a-Si:H film growth by radical beams

Hoefnagels, J. P. M., Langereis, E., van de Sanden, M. C. M. & Kessels, W. M. M., 1 Dec 2004, Amorphous and nanocrystalline silicon science and technology, 2004, symposium held April 13-16, 2004, San Francisco. Ganguly, G., Kondo, M. & Schiff, E. A. (eds.). Warrendale, Pa: Materials Research Society, p. 257-262 6 p. A9.24. (Materials Research Society Symposium Proceedings; vol. 808).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Open Access
File
Ultrahigh vacuum
Film growth
ultrahigh vacuum
Hydrogen
Atoms
1 Downloads (Pure)

Substrate temperature dependence of the roughness evolution of HWCVD a-Si:H studied by real-time spectroscopic ellipsometry

Hoefnagels, J. P. M., Langereis, E., Sanden, van de, M. C. M. & Kessels, W. M. M., 2004, 3rd international conference on hot-wire CVD (Cat-CVD) process : August 23-27, 2004, Utrecht, The Netherlands : extended abstracts. S.n.: s.n., p. 41-44

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

2003

New surface diagnostics for in situ detection of hydrogen and dangling bonds on plasma deposited silicon films

Kessels, W. M. M., Aarts, I. M. P., Hoefnagels, J. P. M., Oever, van den, P. J., Hoex, B., Gielis, J. J. H., Langereis, E., Engeln, R. A. H. & Sanden, van de, M. C. M., 2003, Frontiers in low temperature plasma diagnostics V : Villaggio Cardigliano Specchia (LE) - Italy, April 3-7, 2003 : papers. Bari, p. 40-49

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic