• 1942 Citations
20032014

Research output per year

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Research Output

2014

Dielectric material options for integrated capacitors

Ruhl, G., Lehnert, W., Lukosius, M., Wenger, C., Baristiran Kaynak, C., Blomberg, T., Haukka, S., Baumann, P. K., Besling, W. F. A., Roest, A. L., Riou, B., Lhostis, S., Halimaou, A., Roozeboom, F., Langereis, E., Kessels, W. M. M., Zauner, A. & Rushworth, S. A., 2014, In : ECS Journal of Solid State Science and Technology. 3, 8, p. N120-N125 6 p.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
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3 Citations (Scopus)
473 Downloads (Pure)
2012
Open Access
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14 Citations (Scopus)
108 Downloads (Pure)
2011

Atomic layer deposition of Ru from CpRu(CO2)Et using O2 gas and O2 plasma

Leick, N., Verkuijlen, R. O. F., Lamagna, L., Langereis, E., Rushworth, S. A., Roozeboom, F., Sanden, van de, M. C. M. & Kessels, W. M. M., 2011, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films. 29, 2, p. 021016-1/7 7 p., 021016.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
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40 Citations (Scopus)
104 Downloads (Pure)

Remote plasma ALD of SrTiO3 using cyclopentadienlyl-based Ti and Sr precursors

Langereis, E., Roijmans, R. F. H., Roozeboom, F., Sanden, van de, M. C. M. & Kessels, W. M. M., 2011, In : Journal of the Electrochemical Society. 158, 2, p. G34-G38

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
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30 Citations (Scopus)
81 Downloads (Pure)
2010

3D-integrated all-solid-state capacitors

Roozeboom, F., Langereis, E., Leick, N., Sanden, van de, M. C. M., Kessels, W. M. M., Klootwijk, J. H., Dekkers, W., Tois, E., Tuominen, M., Lamy, Y., Jinesh, K. B., Besling, W. F. A., Roest, A. & Bunel, C., 2010, Invited presentation at Symposium FD on ‘Electrochemical Energy Storage Systems: the Next Evolution’ of the Forum on New Materials, Montcatini Terme, June 13-18, 2010. p. FD-2:IL05-

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

1 Downloads (Pure)

Conformality of plasma-assisted ALD: physical processes and modeling

Knoops, H. C. M., Langereis, E., Sanden, van de, M. C. M. & Kessels, W. M. M., 2010, In : Journal of the Electrochemical Society. 157, 12, p. G241-G249

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
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117 Citations (Scopus)
381 Downloads (Pure)

Growth and material properties of nanometer ruthenium films deposited by atomic layer deposition

Leick, N., Verkuijlen, R. O. F., Langereis, E., Roozeboom, F. & Sanden, van de, M. C. M., 2010, Physics@FOM Veldhoven, 19-20 January 2010, Veldhoven, The Netherlands. Graef, de, M., Zegers, G., Min, E. & Pavert, van de, F. (eds.). Utrecht: Stichting FOM, p. P05.67-204

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

In situ spectroscopic ellipsometry for atomic layer deposition

Langereis, E., Heil, S. B. S., Knoops, H. C. M., Keuning, W., Sanden, van de, M. C. M. & Kessels, W. M. M., 2010, In : Society of Vacuum Coaters Bulletin. 2010, spring, p. 36-41

Research output: Contribution to journalArticleProfessional

Open Access
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518 Downloads (Pure)

Low temperature plasma-enhanced atomic layer deposition of metal oxide thin films

Potts, S. E., Keuning, W., Langereis, E., Dingemans, G., Sanden, van de, M. C. M. & Kessels, W. M. M., 2010, In : Journal of the Electrochemical Society. 157, 7, p. P66-P74 9 p.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
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110 Citations (Scopus)
368 Downloads (Pure)
Open Access
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42 Citations (Scopus)
930 Downloads (Pure)

Real time optical probes of ALD and CVD thin films for c-Si photovoltaics

Kessels, W. M. M., Terlinden, N. M., Gielis, J. J. H., Langereis, E. & Sanden, van de, M. C. M., 2010, Proceedings of the 5th International Conference on Spectroscopic Ellipsometry (ICSE-V), 23-28 May 2010, Albany, NY, USA. Albany, NY, USA

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

2009

In situ infrared characterization during atomic layer deposition of lanthanum oxide

Kwon, J., Dai, M., Halls, M. D., Langereis, E., Chabal, Y. J. & Gordon, R. G., 2009, In : Journal of Physical Chemistry C. 113, 2, p. 654-660

Research output: Contribution to journalArticleAcademicpeer-review

76 Citations (Scopus)
2 Downloads (Pure)

In situ spectroscopic ellipsometry as a versatile tool for studying atomic layer deposition

Langereis, E., Heil, S. B. S., Knoops, H. C. M., Keuning, W., Sanden, van de, M. C. M. & Kessels, W. M. M., 2009, In : Journal of Physics D: Applied Physics. 42, 7, p. 073001-1/19

Research output: Contribution to journalArticleAcademicpeer-review

200 Citations (Scopus)
4 Downloads (Pure)

In situ spectroscopic ellipsometry for atomic layer deposition

Langereis, E., Heil, S. B. S., Knoops, H. C. M., Keuning, W., Sanden, van de, M. C. M. & Kessels, W. M. M., 2009, SVC 52nd Annual Technical Conference, Santa Clara Convention Center, Santa Clara, CA, May 9-14, 2009. Santa Clara, CA, USA, p. 61-66 (Society of Vacuum Coaters. Annual Technical Conference Proceedings ; vol. 505).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

1 Downloads (Pure)

In-situ spectroscopic ellipsometry for atomic layer deposition

Langereis, E., Heil, S. B. S., Knoops, H. C. M., Keuning, W., Sanden, van de, M. C. M. & Kessels, W. M. M., 2009. 8 p.

Research output: Contribution to conferenceOtherAcademic

Low temperature plasma-enhanced atomic layer deposition of metal oxide thin films

Potts, S. E., van den Elzen, L. R. J. G., Dingemans, G., Langereis, E., Keuning, W., Sanden, van de, M. C. M. & Kessels, W. M. M., 2009, Atomic layer deposition applications 5 : Proceedings of the 5th Symposium on Atomic Layer Deposition as part of the 216th Meeting of the Electrochemical Society 5 -7 October 2009, Vienna. Pennington, NJ: Electrochemical Socity, p. 233-242 (ECS Transactions; vol. 25).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

3 Citations (Scopus)
1 Downloads (Pure)

OLED Encapsulation by Room Temperature Plasma-Assisted ALD Al2O3 Films

Keuning, W., Creatore, M., Langereis, E., Lifka, H., Weijer, van de, P. & Sanden, van de, M. C. M., 2009, Proceedings of the 56th international American Vacuum Society Symposium & Exhibition (AVS 56) 8-13 November 2009, San Jose, California. New York, NY: AVS, p. TF2-TuM11-64

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

Open Access
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117 Downloads (Pure)

Plasma-assisted ALD : from basic understanding to successful commercialization

Kessels, W. M. M., Hodson, C. J., Fang, Q., Singh, N., Anderson, F., Keuning, W., Heil, S., Hemmen, van, H., Langereis, E. & Sanden, van de, M. C. M., 2009. 11 p.

Research output: Contribution to conferenceOtherAcademic

2 Downloads (Pure)

Thermal and Remote Plasma ALD of Ru from CpRu(CO)2Et and O2

Leick, N., Verkuijlen, R. O. F., Langereis, E., Rushworth, S. A., Roozeboom, F., Sanden, van de, M. C. M. & Kessels, W. M. M., 2009, Proceedings of the 56th international American Vacuum Society Symposium & Exhibition (AVS 56) 8-13 November 2009, San Jose, California. New York, NY: AVS, p. TF2-MoM1-20

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

Open Access
File
53 Downloads (Pure)
2008

Deposition of TiN and TaN by remote plasma ALD for Cu and Li diffusion barrier applications

Knoops, H. C. M., Baggetto, L., Langereis, E., Sanden, van de, M. C. M., Klootwijk, J. H., Roozeboom, F., Niessen, R. A. H., Notten, P. H. L. & Kessels, W. M. M., 2008, In : Journal of the Electrochemical Society. 155, 12, p. G287-G294 8 p.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
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67 Citations (Scopus)
422 Downloads (Pure)

Optical emission spectroscopy as a tool for studying, optimizing, and monitoring layer deposition processes

Mackus, A. J. M., Heil, S. B. S., Langereis, E., Knoops, H. C. M., Sanden, van de, M. C. M. & Kessels, W. M. M., 2008, Proceedings of the 8th International Conference on Atomic Layer Deposition (ALD 2008), June 29 - July 2008, Bruges, Belgium (Book of Abstracts). Kessels, W. M. M. & Delabie, A. (eds.). S.n.: s.n., p. P-76-

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

1 Downloads (Pure)

Plasma-assisted ALD of Al2O3 at low temperatures : reaction mechanism and material properties

Langereis, E., Bouman, M., Keijmel, J., Heil, S. B. S., Sanden, van de, M. C. M. & Kessels, W. M. M., 2008, Atomic Layer Deposition Applications 4 - 214th ECS Meeting; Honolulu, HI; 13 October 2008 through 15 October 2008. p. 247-255 (ECS Transactions; vol. 16).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

14 Citations (Scopus)

Plasma-assisted atomic layer deposition : an in situ diagnostic study

Langereis, E., 2008, Eindhoven: Technische Universiteit Eindhoven. 176 p.

Research output: ThesisPhd Thesis 1 (Research TU/e / Graduation TU/e)

Open Access
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835 Downloads (Pure)

Polymer-Led encapsulation by means of plasma-assisted ALD AI2O3 films

Creatore, M., Keuning, W., Langereis, E., Lifka, H., Weijer, van de, P., Sanden, van de, M. C. M. & Kessels, W. M. M., 2008, Proceedings of the 8th International Conference on Atomic Layer Deposition (ALD 2008), June 29 - July 2008, Bruges, Belgium (Book of Abstracts). Kessels, W. M. M. & Delabie, A. (eds.). S.n.: s.n., p. WedA2b-2-

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Remote plasma ALD of amorphous and anatase TiO2 studied by in-situ spectroscopic ellipsometry

Keuning, W., Langereis, E., Hemmen, van, J. L., Muraza, O., Rebrov, E., Sanden, van de, M. C. M. & Kessels, W. M. M., 2008, Proceedings of the 8th International Conference on Atomic Layer Deposition (ALD 2008), June 29 - July 2008, Bruges, Belgium (Book of Abstracts). Kessels, W. M. M. & Delabie, A. (eds.). S.n.: s.n., p. P-87-

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

4 Downloads (Pure)

Surface chemistry of plasma assisted ALD of AI2O3 at low deposition temperatures

Langereis, E., Keijmel, J., Bouman, M., Sanden, van de, M. C. M. & Kessels, W. M. M., 2008, Proceedings of the 8th International Conference on Atomic Layer Deposition (ALD 2008), June 29 - July 2008, Bruges, Belgium (Book of Abstracts). Kessels, W. M. M. & Delabie, A. (eds.). S.n.: s.n., p. MonM2-3-

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy

Langereis, E., Keijmel, J., Sanden, van de, M. C. M. & Kessels, W. M. M., 2008, In : Applied Physics Letters. 92, 23, p. 231904-1/3 3 p., 231904.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
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99 Citations (Scopus)
202 Downloads (Pure)

Transmission infrared spectroscopy to measure surface groups and reaction by-products during ALD

Bouman, M., Langereis, E., Keijmel, J., Kessels, W. M. M., Lee, I. & Zaera, F., 2008, Proceedings of the 8th International Conference on Atomic Layer Deposition (ALD 2008), June 29 - July 2008, Bruges, Belgium (Book of Abstracts). Kessels, W. M. M. & Delabie, A. (eds.). S.n.: s.n., p. P-104-

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

2007

Deposition of TiN and TaN by remote plasma ALD for diffusion barrier applications

Knoops, H. C. M., Baggetto, L., Langereis, E., Sanden, van de, M. C. M., Klootwijk, J. H., Roozeboom, F., Niessen, R. A. H., Notten, P. H. L. & Kessels, W. M. M., 2007, Proceedings of the 3th symposium on Atomic Layer Deposition Applications as part of the 212th ECS Meeting, 8-9 October 2007, Washington D.C., USA. Londergan, A., Straten, van der, O., Bent, S. F., Elam, J. W., Gendt, de, S. & Kang, S. B. (eds.). Pennington, New Jersey, USA: Electrochemical Society, p. 45-54 (ECS Transactions; vol. 11).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

4 Citations (Scopus)

On the film microstructure control by means of PE-CVD and PA-ALD

Creatore, M., Langereis, E., Terlinden, N. M., Hemmen, van, J. L., Kessels, W. M. M. & Sanden, van de, M. C. M., 2007, Proceedings of the 18th international symposium on plasma chemistry (ISPC 18) 26-31 August 2007, Kyoto, Japan. Tachibana, K., Takai, O., Ono, K. & Shirafuji, T. (eds.). Kyoto, Japan: Kyoto University, p. 27A-P3-1/4

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

Open Access
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63 Downloads (Pure)

On the film microstructure control by means of PE-CVD and PA-ALD

Creatore, M., Langereis, E., Terlinden, N. M., Hemmen, van, J. L., Kessels, W. M. M. & Sanden, van de, M. C. M., 2007, Proceedings of the 50th Society of Vacuum Coaters Conference (SVC) and 50th Annual Technical Conference, 28 April - 3 May 2007, Louisville, Kentucky, USA. Albuquerque, NM, U.S.A.: Society of Vacuum Coaters

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

Opportunities for plasma-assisted atomic layer deposition

Kessels, W. M. M., Heil, S. B. S., Langereis, E., Hemmen, van, J. L., Knoops, H. C. M., Keuning, W. & Sanden, van de, M. C. M., 2007, In : ECS Transactions. 3, 15, p. 183-190

Research output: Contribution to journalArticleAcademicpeer-review

19 Citations (Scopus)
1 Downloads (Pure)
Open Access
File
61 Citations (Scopus)
148 Downloads (Pure)
2006

In situ reaction mechanism studies of plasma-assisted atomic layer deposition of Al2O3

Heil, S. B. S., Kudlacek, P., Langereis, E., Engeln, R. A. H., Sanden, van de, M. C. M. & Kessels, W. M. M., 2006, In : Applied Physics Letters. 89, 13, p. 131505-1/3 3 p., 131505.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
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82 Citations (Scopus)
191 Downloads (Pure)

In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition

Langereis, E., Heil, S. B. S., Sanden, van de, M. C. M. & Kessels, W. M. M., 2006, In : Journal of Applied Physics. 100, 2, p. 023534-1/10 023534.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
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58 Citations (Scopus)
259 Downloads (Pure)

Low-temperature deposition of TiN by plasma-assisted atomic layer deposition

Heil, S. B. S., Langereis, E., Roozeboom, F., Sanden, van de, M. C. M. & Kessels, W. M. M., 2006, In : Journal of the Electrochemical Society. 153, 11, p. G956-G965

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
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78 Citations (Scopus)
106 Downloads (Pure)

Plasma-assisted atomic layer deposition of AI2O3 films

Heil, S. B. S., Langereis, E., Sanden, van de, M. C. M. & Kessels, W. M. M., 2006, p. A 18-.

Research output: Contribution to conferencePosterAcademic

Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers

Langereis, E., Creatore, M., Heil, S. B. S., Sanden, van de, M. C. M. & Kessels, W. M. M., 2006, In : Applied Physics Letters. 89, 8, p. 081915-1/3 3 p., 081915.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
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222 Citations (Scopus)
446 Downloads (Pure)

Plasma-assisted atomic layer deposition of Al-2O3 on polymers

Langereis, E., Heil, S. B. S., Creatore, M., Sanden, van de, M. C. M. & Kessels, W. M. M., 2006, Proceedings 49th Annual Technical Conference of Vacuum Coaters, Washington DC, USA. p. 151-

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

3 Downloads (Pure)

Plasma-assisted growth of moisture diffusion barrier films on polymers : from chemical vapour deposition to atomic layer deposition

Creatore, M., Langereis, E., Heil, S. B. S., Sanden, van de, M. C. M. & Kessels, W. M. M., 2006, Proceedings of the 10th International Conference on Plasma Surface Engineering : Conference and Exhibition (PSE 2006), September 10-15, 2006, Garmisch-Partenkirchen, Germany (Abstracts). S.l.: s.n., p. 37-37

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

17 Citations (Scopus)

Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3

Hoex, B., Heil, S. B. S., Langereis, E., Sanden, van de, M. C. M. & Kessels, W. M. M., 2006, In : Applied Physics Letters. 89, 4, p. 042112-1/3 042112.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
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531 Citations (Scopus)
473 Downloads (Pure)
2005

Initial growth and properties of atomic layer deposited TiN films studied by in situ spectroscopic ellipsometry

Langereis, E., Heil, S. B. S., Sanden, van de, M. C. M. & Kessels, W. M. M., 2005, In : Physica Status Solidi C: Conferences. 2, 12, p. 3958-3962

Research output: Contribution to journalArticleAcademicpeer-review

11 Citations (Scopus)
2 Downloads (Pure)

Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications

Heil, S. B. S., Langereis, E., Roozeboom, F., Kemmeren, A., Pham, N. P., Sarro, P. M., Sanden, van de, M. C. M. & Kessels, W. M. M., 2005, Materials, technology and reliability for advanced interconnects - 2005 : symposium held March 28 - April 1 2005, San Francisco, California, U.S.A.. Besser, R. (ed.). Warrendale, Pa: Materials Research Society, p. 215-220 (Materials Research Society Symposium Proceedings; vol. 863).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Open Access
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33 Citations (Scopus)
131 Downloads (Pure)
8 Citations (Scopus)
2004

New ultrahigh vacuum setup and advanced diagnostic techniques for studying a-Si:H film growth by radical beams

Hoefnagels, J. P. M., Langereis, E., van de Sanden, M. C. M. & Kessels, W. M. M., 1 Dec 2004, Amorphous and nanocrystalline silicon science and technology, 2004, symposium held April 13-16, 2004, San Francisco. Ganguly, G., Kondo, M. & Schiff, E. A. (eds.). Warrendale, Pa: Materials Research Society, p. 257-262 6 p. A9.24. (Materials Research Society Symposium Proceedings; vol. 808).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Open Access
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3 Citations (Scopus)
59 Downloads (Pure)

Substrate temperature dependence of the roughness evolution of HWCVD a-Si:H studied by real-time spectroscopic ellipsometry

Hoefnagels, J. P. M., Langereis, E., Sanden, van de, M. C. M. & Kessels, W. M. M., 2004, 3rd international conference on hot-wire CVD (Cat-CVD) process : August 23-27, 2004, Utrecht, The Netherlands : extended abstracts. S.n.: s.n., p. 41-44

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

1 Downloads (Pure)
2003

New surface diagnostics for in situ detection of hydrogen and dangling bonds on plasma deposited silicon films

Kessels, W. M. M., Aarts, I. M. P., Hoefnagels, J. P. M., Oever, van den, P. J., Hoex, B., Gielis, J. J. H., Langereis, E., Engeln, R. A. H. & Sanden, van de, M. C. M., 2003, Frontiers in low temperature plasma diagnostics V : Villaggio Cardigliano Specchia (LE) - Italy, April 3-7, 2003 : papers. p. 40-49

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic