• 1870 Citations
20032014
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Personal profile

Research profile

After my graduation on "New experimental setup for surface studies during silicon-based film growth: radical sources and hydrogen-induced etching experiments" in the Equilibrium and Transport in Plasmas (ETP, 2006 ® renamed to Plasma & materials Processing (PMP)) research group at Eindhoven University of Technology, I currently (t ³ Feb. 2004) work as PhD student in the same group on the topic of "Plasma-assisted atomic layer deposition". I mainly focus on the fundamentals of the film growth by studying the process by in situ spectroscopic ellipsometry and other ex situ analysis. More information on this research area can be found on the PMP internet site http://www.phys.tue.nl/pmp

Fingerprint Dive into the research topics where Erik Langereis is active. These topic labels come from the works of this person. Together they form a unique fingerprint.

  • 10 Similar Profiles
atomic layer epitaxy Physics & Astronomy
Atomic layer deposition Engineering & Materials Science
ellipsometry Physics & Astronomy
Plasmas Engineering & Materials Science
cycles Physics & Astronomy
Spectroscopic ellipsometry Engineering & Materials Science
thin films Physics & Astronomy
ruthenium Physics & Astronomy

Research Output 2003 2014

3 Citations (Scopus)
399 Downloads (Pure)

Dielectric material options for integrated capacitors

Ruhl, G., Lehnert, W., Lukosius, M., Wenger, C., Baristiran Kaynak, C., Blomberg, T., Haukka, S., Baumann, P. K., Besling, W. F. A., Roest, A. L., Riou, B., Lhostis, S., Halimaou, A., Roozeboom, F., Langereis, E., Kessels, W. M. M., Zauner, A. & Rushworth, S. A., 2014, In : ECS Journal of Solid State Science and Technology. 3, 8, p. N120-N125 6 p.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
Capacitors
Leakage currents
Capacitance
Current density
Vapor deposition
12 Citations (Scopus)
94 Downloads (Pure)
Open Access
File
Atomic layer deposition
atomic layer epitaxy
Plasmas
Reaction products
reaction products
40 Citations (Scopus)
86 Downloads (Pure)

Atomic layer deposition of Ru from CpRu(CO2)Et using O2 gas and O2 plasma

Leick, N., Verkuijlen, R. O. F., Lamagna, L., Langereis, E., Rushworth, S. A., Roozeboom, F., Sanden, van de, M. C. M. & Kessels, W. M. M., 2011, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films. 29, 2, p. 021016-1/7 7 p., 021016.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
Atomic layer deposition
atomic layer epitaxy
Ruthenium
Gases
Plasmas
30 Citations (Scopus)
71 Downloads (Pure)

Remote plasma ALD of SrTiO3 using cyclopentadienlyl-based Ti and Sr precursors

Langereis, E., Roijmans, R. F. H., Roozeboom, F., Sanden, van de, M. C. M. & Kessels, W. M. M., 2011, In : Journal of the Electrochemical Society. 158, 2, p. G34-G38

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
Plasma deposition
Atomic layer deposition
Strontium
Spectroscopic ellipsometry
Amorphous films

3D-integrated all-solid-state capacitors

Roozeboom, F., Langereis, E., Leick, N., Sanden, van de, M. C. M., Kessels, W. M. M., Klootwijk, J. H., Dekkers, W., Tois, E., Tuominen, M., Lamy, Y., Jinesh, K. B., Besling, W. F. A., Roest, A. & Bunel, C., 2010, Invited presentation at Symposium FD on ‘Electrochemical Energy Storage Systems: the Next Evolution’ of the Forum on New Materials, Montcatini Terme, June 13-18, 2010. p. FD-2:IL05-

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

Activities 2009 2009

  • 1 Contributed talk

52nd Society of Vacuum Coaters Annual Technical Conference, Santa Clara, USA

Erik Langereis (Speaker)
1 May 2009

Activity: Talk or presentation typesContributed talkScientific

Student theses

Atomic layer deposition of metal oxides studied by in situ transmission infrared spectroscopy

Author: Bouman, M., 31 Dec 2008

Supervisor: Langereis, E. (Supervisor 1) & Kessels, W. (Supervisor 2)

Student thesis: Master

File

Atomic layer deposition of Ruthenium thin films using oxygen

Author: Verkuijlen, R., 31 Dec 2009

Supervisor: Leick-Marius, N. (Supervisor 1), Langereis, E. (Supervisor 2) & Kessels, W. (Supervisor 2)

Student thesis: Master

File

Plasma-assisted atomic layer deposition of Al2O3 studied by infrared transmission spectroscopy

Author: Keijmel, J., 29 Feb 2008

Supervisor: Langereis, E. (Supervisor 1), Kessels, W. (Supervisor 2) & van de Sanden, M. (Supervisor 2)

Student thesis: Master

File

Remote plasma atomic layer deposition of TaNx films

Author: Knoops, H., 2007

Supervisor: van de Sanden, M. (Supervisor 1), Langereis, E. (Supervisor 2) & Kessels, W. (Supervisor 2)

Student thesis: Master

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