Research Output per year
Research Output per year
Personal profile
Research profile
After my graduation on "New experimental setup for surface studies during silicon-based film growth: radical sources and hydrogen-induced etching experiments" in the Equilibrium and Transport in Plasmas (ETP, 2006 ® renamed to Plasma & materials Processing (PMP)) research group at Eindhoven University of Technology, I currently (t ³ Feb. 2004) work as PhD student in the same group on the topic of "Plasma-assisted atomic layer deposition". I mainly focus on the fundamentals of the film growth by studying the process by in situ spectroscopic ellipsometry and other ex situ analysis. More information on this research area can be found on the PMP internet site http://www.phys.tue.nl/pmp
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Research Output
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Dielectric material options for integrated capacitors
Ruhl, G., Lehnert, W., Lukosius, M., Wenger, C., Baristiran Kaynak, C., Blomberg, T., Haukka, S., Baumann, P. K., Besling, W. F. A., Roest, A. L., Riou, B., Lhostis, S., Halimaou, A., Roozeboom, F., Langereis, E., Kessels, W. M. M., Zauner, A. & Rushworth, S. A., 2014, In : ECS Journal of Solid State Science and Technology. 3, 8, p. N120-N125 6 p.Research output: Contribution to journal › Article › Academic › peer-review
Open AccessFile3 Citations (Scopus)534 Downloads (Pure) -
Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
Knoops, H. C. M., Langereis, E., Sanden, van de, M. C. M. & Kessels, W. M. M., 2012, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films. 30, 1, p. 01A101-1/10 10 p., 01A101.Research output: Contribution to journal › Article › Academic › peer-review
Open AccessFile17 Citations (Scopus)128 Downloads (Pure) -
Atomic layer deposition of Ru from CpRu(CO2)Et using O2 gas and O2 plasma
Leick, N., Verkuijlen, R. O. F., Lamagna, L., Langereis, E., Rushworth, S. A., Roozeboom, F., Sanden, van de, M. C. M. & Kessels, W. M. M., 2011, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films. 29, 2, p. 021016-1/7 7 p., 021016.Research output: Contribution to journal › Article › Academic › peer-review
Open AccessFile42 Citations (Scopus)124 Downloads (Pure) -
Remote plasma ALD of SrTiO3 using cyclopentadienlyl-based Ti and Sr precursors
Langereis, E., Roijmans, R. F. H., Roozeboom, F., Sanden, van de, M. C. M. & Kessels, W. M. M., 2011, In : Journal of the Electrochemical Society. 158, 2, p. G34-G38Research output: Contribution to journal › Article › Academic › peer-review
Open AccessFile30 Citations (Scopus)107 Downloads (Pure) -
3D-integrated all-solid-state capacitors
Roozeboom, F., Langereis, E., Leick, N., Sanden, van de, M. C. M., Kessels, W. M. M., Klootwijk, J. H., Dekkers, W., Tois, E., Tuominen, M., Lamy, Y., Jinesh, K. B., Besling, W. F. A., Roest, A. & Bunel, C., 2010, Invited presentation at Symposium FD on ‘Electrochemical Energy Storage Systems: the Next Evolution’ of the Forum on New Materials, Montcatini Terme, June 13-18, 2010. p. FD-2:IL05-Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic
1 Downloads (Pure)
Activities
- 1 Contributed talk
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52nd Society of Vacuum Coaters Annual Technical Conference, Santa Clara, USA
Erik Langereis (Speaker)
1 May 2009Activity: Talk or presentation types › Contributed talk › Scientific
Student theses
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New experimental setup for surface studies during silicon-based film growth: radical sources and hydrogen-induced etching experiments
Author: Langereis, E., 31 Dec 2003Supervisor: Hoefnagels, J. (Supervisor 1), Kessels, W. (Supervisor 2) & van de Sanden, M. (Supervisor 2)
Student thesis: Master
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