Research Output per year
Personal profile
Research profile
After my graduation on "New experimental setup for surface studies during silicon-based film growth: radical sources and hydrogen-induced etching experiments" in the Equilibrium and Transport in Plasmas (ETP, 2006 ® renamed to Plasma & materials Processing (PMP)) research group at Eindhoven University of Technology, I currently (t ³ Feb. 2004) work as PhD student in the same group on the topic of "Plasma-assisted atomic layer deposition". I mainly focus on the fundamentals of the film growth by studying the process by in situ spectroscopic ellipsometry and other ex situ analysis. More information on this research area can be found on the PMP internet site http://www.phys.tue.nl/pmp
Fingerprint Dive into the research topics where Erik Langereis is active. These topic labels come from the works of this person. Together they form a unique fingerprint.
- 10 Similar Profiles
atomic layer epitaxy
Physics & Astronomy
Atomic layer deposition
Engineering & Materials Science
ellipsometry
Physics & Astronomy
Plasmas
Engineering & Materials Science
cycles
Physics & Astronomy
Spectroscopic ellipsometry
Engineering & Materials Science
thin films
Physics & Astronomy
ruthenium
Physics & Astronomy
Research Output 2003 2014
Dielectric material options for integrated capacitors
Ruhl, G., Lehnert, W., Lukosius, M., Wenger, C., Baristiran Kaynak, C., Blomberg, T., Haukka, S., Baumann, P. K., Besling, W. F. A., Roest, A. L., Riou, B., Lhostis, S., Halimaou, A., Roozeboom, F., Langereis, E., Kessels, W. M. M., Zauner, A. & Rushworth, S. A., 2014, In : ECS Journal of Solid State Science and Technology. 3, 8, p. N120-N125 6 p.Research output: Contribution to journal › Article › Academic › peer-review
Open Access
File
Capacitors
Leakage currents
Capacitance
Current density
Vapor deposition
Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas
Knoops, H. C. M., Langereis, E., Sanden, van de, M. C. M. & Kessels, W. M. M., 2012, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films. 30, 1, p. 01A101-1/10 10 p., 01A101.Research output: Contribution to journal › Article › Academic › peer-review
Open Access
File
Atomic layer deposition
atomic layer epitaxy
Plasmas
Reaction products
reaction products
Atomic layer deposition of Ru from CpRu(CO2)Et using O2 gas and O2 plasma
Leick, N., Verkuijlen, R. O. F., Lamagna, L., Langereis, E., Rushworth, S. A., Roozeboom, F., Sanden, van de, M. C. M. & Kessels, W. M. M., 2011, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films. 29, 2, p. 021016-1/7 7 p., 021016.Research output: Contribution to journal › Article › Academic › peer-review
Open Access
File
Atomic layer deposition
atomic layer epitaxy
Ruthenium
Gases
Plasmas
Remote plasma ALD of SrTiO3 using cyclopentadienlyl-based Ti and Sr precursors
Langereis, E., Roijmans, R. F. H., Roozeboom, F., Sanden, van de, M. C. M. & Kessels, W. M. M., 2011, In : Journal of the Electrochemical Society. 158, 2, p. G34-G38Research output: Contribution to journal › Article › Academic › peer-review
Open Access
File
Plasma deposition
Atomic layer deposition
Strontium
Spectroscopic ellipsometry
Amorphous films
3D-integrated all-solid-state capacitors
Roozeboom, F., Langereis, E., Leick, N., Sanden, van de, M. C. M., Kessels, W. M. M., Klootwijk, J. H., Dekkers, W., Tois, E., Tuominen, M., Lamy, Y., Jinesh, K. B., Besling, W. F. A., Roest, A. & Bunel, C., 2010, Invited presentation at Symposium FD on ‘Electrochemical Energy Storage Systems: the Next Evolution’ of the Forum on New Materials, Montcatini Terme, June 13-18, 2010. p. FD-2:IL05-Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic
Activities 2009 2009
- 1 Contributed talk
52nd Society of Vacuum Coaters Annual Technical Conference, Santa Clara, USA
Erik Langereis (Speaker)1 May 2009
Activity: Talk or presentation types › Contributed talk › Scientific
Student theses
Atomic layer deposition of metal oxides studied by in situ transmission infrared spectroscopy
Author: Bouman, M., 31 Dec 2008Supervisor: Langereis, E. (Supervisor 1) & Kessels, W. (Supervisor 2)
Student thesis: Master
File
Atomic layer deposition of Ruthenium thin films using oxygen
Author: Verkuijlen, R., 31 Dec 2009Supervisor: Leick-Marius, N. (Supervisor 1), Langereis, E. (Supervisor 2) & Kessels, W. (Supervisor 2)
Student thesis: Master
File
New experimental setup for surface studies during silicon-based film growth: radical sources and hydrogen-induced etching experiments
Author: Langereis, E., 31 Dec 2003Supervisor: Hoefnagels, J. (Supervisor 1), Kessels, W. (Supervisor 2) & van de Sanden, M. (Supervisor 2)
Student thesis: Master
File
Plasma-assisted atomic layer deposition of Al2O3 studied by infrared transmission spectroscopy
Author: Keijmel, J., 29 Feb 2008Supervisor: Langereis, E. (Supervisor 1), Kessels, W. (Supervisor 2) & van de Sanden, M. (Supervisor 2)
Student thesis: Master
File
Remote plasma atomic layer deposition of TaNx films
Author: Knoops, H., 2007Supervisor: van de Sanden, M. (Supervisor 1), Langereis, E. (Supervisor 2) & Kessels, W. (Supervisor 2)
Student thesis: Master
File