Dmitry Shefer

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2021
Morphology change and release of tin and lead micro-particles from substrates in hydrogen plasma
Shefer, D., Nikipelov, A., van de Kerkhof, M., Banine, V. & Beckers, J., 2021, Extreme Ultraviolet (EUV) Lithography XII. Felix, N. M. & Lio, A. (eds.). SPIE, 8 p. 116091F. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 11609).
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review
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