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David van den Hurk was born on November 8th 1988 in Oss, The Netherlands. He received his B.Eng degree in Mechatronics, from Fontys University of Applied Sciences in June 2013. Here his thesis was on the application of self-sensing piezo actuators in lithography equipment. In June 2016 he received his MSc. Degree in Systems and Control (with great appreciation), from Eindhoven University of Technology, where his graduation thesis was titled: “Calibration and Validation of a Multiphysics Mirror Heating Model in EUV Lithography”.  Currently, he is a PhD candidate at the Control Systems group on the subject “Active Wafer Table Curvature Control for EUV Lithography” under the supervision of prof. dr. S. Weiland. The research is carried out in cooperation with ASML.  


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