Kuiper, S., Fritz, E., Crowcombe, W., Liebig, T., Kramer, G.,
Witvoet, G., Duivenvoorde, T., Overtoom, T., Rijnbeek, R., van Zwet, E.,
Van Dijsseldonk, A., den Boef, A., Beems, M. & Levasier, L.,
1 Jan 2016,
Metrology, Inspection, and Process Control for Microlithography XXX. Warrendale:
SPIE,
10 p. 97781B. (Proceedings of SPIE; vol. 9778).
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review