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Dive into the research topics where Alfredo Mameli is active. These topic labels come from the works of this person. Together they form a unique fingerprint.
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Research output
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Beyond mobile phone displays: Flat panel display technology for biomedical applications
Mameli, A., Akkerman, H. B., González-Lana, S., Castro-Abril, H., Le Cann, K., Lampert, A., Gelinck, G. H., Kronemeijer, A. J. & van Breemen, A. J. J. M. (Corresponding author), 15 May 2023, In: Microelectronic Engineering. 277, 112016.Research output: Contribution to journal › Article › Academic › peer-review
Open Access1 Citation (Scopus) -
High-Throughput Atomic Layer Deposition of P-Type SnO Thin Film Transistors Using Tin(II)bis(tert-amyloxide)
Mameli, A. (Corresponding author), Parish, J. D., Dogan, T., Gelinck, G., Snook, M. W., Straiton, A. J., Johnson, A. L. (Corresponding author) & Kronemeijer, A. J., 22 Mar 2022, In: Advanced Materials Interfaces. 9, 9, 8 p., 2101278.Research output: Contribution to journal › Article › Academic › peer-review
Open AccessFile12 Citations (Scopus)203 Downloads (Pure) -
Relation between Reactive Surface Sites and Precursor Choice for Area-Selective Atomic Layer Deposition Using Small Molecule Inhibitors
Merkx, M. J. M., Angelidis, A., Mameli, A., Li, J., Lemaire, P. C., Sharma, K., Hausmann, D. M., Kessels, W. M. M., Sandoval, T. E. & Mackus, A. J. M. (Corresponding author), 17 Mar 2022, In: Journal of Physical Chemistry C. 126, 10, p. 4845-4853 9 p.Research output: Contribution to journal › Article › Academic › peer-review
Open AccessFile38 Citations (Scopus)230 Downloads (Pure) -
Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy
Mione, M. A., Vandalon, V., Mameli, A., Kessels, W. M. M. (Corresponding author) & Roozeboom, F., 18 Nov 2021, In: Journal of Physical Chemistry C. 125, 45, p. 24945-24957 13 p.Research output: Contribution to journal › Article › Academic › peer-review
Open AccessFile9 Citations (Scopus)330 Downloads (Pure) -
Insight into the removal and reapplication of small inhibitor molecules during area-selective atomic layer deposition of SiO2
Merkx, M. J. M., Jongen, R. G. J., Mameli, A., Lemaire, P. C., Sharma, K., Hausmann, D. M., Kessels, W. M. M. & Mackus, A. J. M., Jan 2021, In: Journal of Vacuum Science and Technology A. 39, 1, 8 p., 012402.Research output: Contribution to journal › Article › Academic › peer-review
Open AccessFile20 Citations (Scopus)402 Downloads (Pure)
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New Process Concepts Towards Area-Selective Atomic Layer Deposition and Atomic Layer Etching of Zinc Oxide
Mameli, A. (Member), Verheijen, M. A. (Member), Karasulu, B. (Member), Mackus, A. J. M. (Member), Kessels, W. M. M. (Member) & Roozeboom, F. (Speaker)
30 Sept 2018 → 4 Oct 2018Activity: Talk or presentation types › Contributed talk › Scientific
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Atomic Layer Etching of ZnO on 2D and 3D substrates, using acetylacetone and O2 plasma
Mameli, A. (Member), Verheijen, M. A. (Member), Karasulu, B. (Member), Mackus, A. J. M. (Member), Kessels, W. M. M. (Member) & Roozeboom, F. (Invited speaker)
24 Jul 2018 → 28 Jul 2018Activity: Talk or presentation types › Invited talk › Scientific