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Personal profile

Research profile

“Today’s computer chip components have dimensions of the order of nanometers, and existing chip fabrication technology is limited. New technologies are needed for component production at an increasingly smaller scale.”

Research profile

Adrie Mackus is Assistant Professor in the Plasma and Materials Processing group within the Applied Physics department at Eindhoven University of Technology (TU/e). 

Academic background

Adrie Mackus earned his M.Sc. and Ph.D. degrees (both cum laude) in Applied Physics at Eindhoven University of Technology TU/e in 2009 and 2013, respectively. His doctoral thesis work “Atomic Layer Deposition of Platinum: From Surface Reactions to Nanopatterning” was carried out in close collaboration with the company FEI Electron Optics, and included a visit to Purdue University, USA in 2012.  Mackus worked as a postdoctoral researcher at the department of Chemical Engineering at Stanford University from 2014 to 2016, for which he received a personal NWO Rubicon grant in 2014. At Stanford, he focused on the study of the atomic layer deposition (ALD) of ternary materials using in-situ techniques. After his postdoc, Mackus returned to TU/e in 2016 as Assistant Professor. 

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Research Output 2007 2019

1 Citation (Scopus)

Area-selective atomic layer deposition of ZnO by area activation using electron beam-induced deposition

Mameli, A., Karasulu, B., Verheijen, M., Barcones Campo, B., Macco, B., Mackus, A., Kessels, E. & Roozeboom, F., 31 Jan 2019, In : Chemistry of Materials. 31, 4, p. 1250-1257

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
Atomic layer deposition
Electron beams
Chemical activation
Density functional theory
Temperature

Area-selective deposition of Ruthenium by combining atomic layer deposition and selective etching

Vos, M. F. J., Chopra, S. N., Verheijen, M. A., Ekerdt, J. G., Agarwal, S., Kessels, W. M. M. & Mackus, A. J. M., 22 May 2019, In : Chemistry of Materials. 31, 11, p. 3878-3882

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
10 Citations (Scopus)

From the bottom-up: toward area-selective atomic layer deposition with high selectivity

Mackus, A. J. M., Merkx, M. J. M. & Kessels, W. M. M., 8 Jan 2019, In : Chemistry of Materials. 31, 1, p. 2-12 11 p.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
Atomic layer deposition
Level control
Processing
Nanotechnology
Etching
6 Citations (Scopus)

Synthesis of doped, ternary, and quaternary materials by atomic layer deposition: a review

Mackus, A., Schneider, J. R., MacIsaac, C., Baker, J. G. & Bent, S. F., 2019, In : Chemistry of Materials. 31, 4, p. 1142-1183

Research output: Contribution to journalArticleAcademicpeer-review

Atomic layer deposition
Nucleation
Thin films
Nanoelectronics
Oxides
1 Citation (Scopus)

Approaches and opportunities for area-selective atomic layer deposition

Mackus, A. J. M., 3 Jul 2018, 2018 International Symposium on VLSI Technology, Systems and Application, VLSI-TSA 2018. Piscataway: Institute of Electrical and Electronics Engineers, 2 p. 8403864

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Atomic layer deposition
atomic layer epitaxy
Fabrication
fabrication
Processing

Activities 2018 2018

  • 2 Invited talk
  • 1 Contributed talk

New Process Concepts Towards Area-Selective Atomic Layer Deposition and Atomic Layer Etching of Zinc Oxide

A. Mameli (Member), M.A. Verheijen (Member), B. Karasulu (Member), A.J.M. Mackus (Member), W.M.M. Kessels (Member), F. Roozeboom (Speaker)
30 Sep 20184 Oct 2018

Activity: Talk or presentation typesContributed talkScientific

Atomic Layer Etching of ZnO on 2D and 3D substrates, using acetylacetone and O2 plasma

A. Mameli (Member), M.A. Verheijen (Member), B. Karasulu (Member), A.J.M. Mackus (Member), W.M.M. Kessels (Member), F. Roozeboom (Invited speaker)
24 Jul 201828 Jul 2018

Activity: Talk or presentation typesInvited talkScientific

Overview of approaches for achieving area-selective ALD

A.J.M. Mackus (Invited speaker)
29 Apr 20181 May 2018

Activity: Talk or presentation typesInvited talkScientific

Courses

Impacts

Advanced ALD technologies

M. (Adriana) Creatore (Researcher), W.M.M. (Erwin) Kessels (Researcher), Adrie J.M. Mackus (Researcher)

Impact: Research Topic/Theme (at group level)

Future nanoelectronics and nanopatterning

Ageeth Bol (Researcher), W.M.M. (Erwin) Kessels (Researcher), Adrie J.M. Mackus (Content manager)

Impact: Research Topic/Theme (at group level)

Student theses

Atomic layer deposition and electron beam induced deposition as nanomanufacturing tools for the fabrication of carbon nanotube contacts

Author: Dielissen, S., 31 Aug 2011

Supervisor: Mackus, A. (Supervisor 1), Fernández Landaluce, T. (External coach) & Kessels, W. (Supervisor 2)

Student thesis: Master

File

Atomic layer deposition of Pt and its combination with electron beam induced deposition for the fabrication of nanostructures

Author: Mackus, A., 30 Apr 2009

Supervisor: Knoops, H. (Supervisor 1), Mulders, J. (External coach) & Kessels, W. (Supervisor 2)

Student thesis: Master

File

Direct-write atomic layer deposition for the fabrication of carbon nanotube field-effect transistors

Author: Thissen, N., 31 Oct 2012

Supervisor: Mackus, A. (Supervisor 1), Bol, A. (Supervisor 2) & Kessels, W. (Supervisor 2)

Student thesis: Master

File

Optimization of platinum atomic layer deposition on the FlexAL setup

Author: van Stiphout, T., 2013

Supervisor: Mackus, A. (Supervisor 1) & Bol, A. (Supervisor 2)

Student thesis: Bachelor

File