• 3278
    Citations - based on content available in repository [source: Scopus]
20072024

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Personal profile

Research profile

Adriaan J.M. Mackus is Associate Professor in the Plasma and Materials Processing group within the Applied Physics department at Eindhoven University of Technology (TU/e). His research encompasses thin film deposition and etching for applications in nanoelectronics, with a focus on selective processing for bottom-up fabrication.  

Academic background

Adrie Mackus earned his M.Sc. and Ph.D. degrees (both with highest honors) in Applied Physics from TU/e in 2009 and 2013, respectively. Adrie worked as a postdoc at the department of Chemical Engineering at Stanford University in 2014-2016. He returned to TU/e in 2016, where he received tenure in 2019. His current research encompasses atomic layer deposition (ALD) and etching (ALE) for applications in nanoelectronics, with a focus on selective processing for bottom-up fabrication. This involves application-oriented projects funded by industrial partners, as well as fundamental studies of the underlying mechanisms using in-situ techniques. Adrie chaired the 2nd Area Selective Deposition workshop (ASD2017) in Eindhoven in 2017. In 2020 he was awarded a VIDI grant from the Netherlands Organization of Scientific Research (NWO) and a Starting Grant from the European Research Council (ERC).

Expertise related to UN Sustainable Development Goals

In 2015, UN member states agreed to 17 global Sustainable Development Goals (SDGs) to end poverty, protect the planet and ensure prosperity for all. This person’s work contributes towards the following SDG(s):

  • SDG 7 - Affordable and Clean Energy

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