Projects per year
Organisation profile
Introduction / mission
Driven by Moore’s scaling law and the transition to a sustainable society there is an enormous push to develop nanomaterials for novel device architectures and for device concepts with new functionalities. In order to study new nanomaterials systematically and later implement them into devices, new synthesis processes and techniques need to be investigated and developed, that are reliable, reproducible and scalable with ultimate control at the nanoscale.
Highlighted phrase
Synthesis and integration of 2-D nanomaterials
Organisation profile
In our group we pioneer atomic layer deposition (ALD) for 2D nanomaterials synthesis. ALD is a scalable, low temperature preparation method for thin films which offers precise thickness control down to the sub-monolayer and can therefore be instrumental for the large area synthesis of 2D materials. The current focus of the group is on ALD of 2D transition metal dichalcogenides (2D-TMDs) for (opto)electronics and catalysis. We use plasma chemistry (plasma-enhanced ALD, PEALD) to control functionalities of the 2D-TMDs, such as morphology, materials phase and stoichiometry. Furthermore, by doping, alloying and by the formation of heterostructures we tune the electrical properties of the 2D TMDs, such as the charge carrier concentration and band gap.
Our process development goes hand-in-hand with obtaining understanding of the ALD reaction mechanisms at play using for example high-resolution transmission electron microscopy and DFT simulations.
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Collaborations and top research areas from the last five years
Profiles
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W.M.M. (Erwin) Kessels
- Applied Physics and Science Education, Atomic scale processing
- Applied Physics and Science Education, Processing of low-dimensional nanomaterials
- Applied Physics and Science Education, Center for Quantum Materials and Technology Eindhoven
- EIRES Research - Full Professor
- Applied Physics and Science Education, Plasma & Materials Processing - Full Professor
Person: HGL : Professor
Projects
- 1 Finished
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3DAM
Kessels, W. M. M. (Project Manager), Vandalon, V. (Project member), van Bommel, C. (Project member), Shirazi, M. (Project member), Faraz, T. (Project member) & Schulpen, J. J. P. M. (Project member)
1/04/16 → 1/04/19
Project: Research direct
Research output
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Investigation of the atomic layer etching mechanism for Al2O3 using hexafluoroacetylacetone and H2 plasma
Chittock, N., Maas, J. F. W., Tezsevin, I., Merkx, M. J. M., Knoops, H. C. M., Kessels, W. M. M. & Mackus, A. J. M. (Corresponding author), 21 Jan 2025, In: Journal of Materials Chemistry C. 13, 3, p. 1345-1358 14 p.Research output: Contribution to journal › Article › Academic › peer-review
Open AccessFile1 Citation (Scopus)28 Downloads (Pure) -
Leaders of the LTP Community: Career Profiles: Richard van de Sanden
van de Sanden, M. C. M. (Contributor), Creatore, M., Kessels, W. M. M. & Tsampas, M., 21 Mar 2025, In: ILTPC Newsletter. 48, p. 4-5 2 p.Research output: Contribution to journal › Article › Professional
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New cleanroom to be given prominent place on campus
Kessels, W. M. M. (Contributor), 25 Mar 2025, In: Cursor. 2025, week 4Research output: Contribution to journal › Article › Popular
Open Access
Datasets
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Data underlying the publication: Packing of inhibitor molecules during area-selective atomic layer deposition studied using random sequential adsorption simulations
Li, J. (Creator), Tezsevin, I. (Creator), Merkx, M. J. M. (Creator), Maas, J. F. W. (Creator), Kessels, W. M. M. (Creator), Sandoval, T. E. (Creator) & Mackus, A. J. M. (Creator), 4TU.Centre for Research Data, 7 Aug 2023
DOI: 10.4121/33df3424-ed9b-49cb-910e-64a6d37aa6b0, https://data.4tu.nl/datasets/33df3424-ed9b-49cb-910e-64a6d37aa6b0 and one more link, https://data.4tu.nl/datasets/33df3424-ed9b-49cb-910e-64a6d37aa6b0/1 (show fewer)
Dataset
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Supporting information
Merkx, M. J. M. (Creator), Tezsevin, I. (Creator), Yu, P. (Creator), Janssen, T. (Creator), Heinemans, R. H. G. M. (Creator), Lengers, R. J. (Creator), Chen, J.-R. (Creator), Jezewski, C. J. (Creator), Clendenning, S. B. (Creator), Kessels, W. M. M. (Creator), Sandoval, T. E. (Creator) & Mackus, A. J. M. (Creator), AIP Publishing, 22 May 2024
DOI: 10.60893/figshare.jcp.25743183, https://aip.figshare.com/articles/dataset/Supporting_information/25743183 and one more link, https://aip.figshare.com/articles/dataset/Supporting_information/25743183/1 (show fewer)
Dataset
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Data underlying the publication: Computational Investigation of Precursor Blocking during Area-Selective Atomic Layer Deposition Using Aniline as a Small-Molecule Inhibitor
Tezsevin, I. (Creator), Maas, J. F. W. (Contributor), Merkx, M. J. M. (Creator), Lengers, R. J. (Creator), Kessels, W. M. M. (Creator), Sandoval, T. E. (Creator) & Mackus, A. J. M. (Creator), 4TU.Centre for Research Data, 7 Aug 2023
DOI: 10.4121/0bb03d8b-d1ac-49bc-8010-a498a981cf3e.v1, https://data.4tu.nl/datasets/0bb03d8b-d1ac-49bc-8010-a498a981cf3e/1 and one more link, https://data.4tu.nl/datasets/0bb03d8b-d1ac-49bc-8010-a498a981cf3e (show fewer)
Dataset
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Plasma-assisted atomic layer deposition: from basics to applications
Kessels, W. M. M. (Speaker)
10 Feb 2021Activity: Talk or presentation types › Keynote talk › Scientific
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SALD (External organisation)
Kessels, W. M. M. (Chair)
17 Sept 2020 → 31 Dec 2023Activity: Membership types › Membership of board › Professional
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New Process Concepts Towards Area-Selective Atomic Layer Deposition and Atomic Layer Etching of Zinc Oxide
Mameli, A. (Member), Verheijen, M. A. (Member), Karasulu, B. (Member), Mackus, A. J. M. (Member), Kessels, W. M. M. (Member) & Roozeboom, F. (Speaker)
30 Sept 2018 → 4 Oct 2018Activity: Talk or presentation types › Contributed talk › Scientific
Press/Media
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Bedrijf van Matthijs (29) haalt 20 miljoen binnen voor maken van supercomputer: 'Gaat wereld veranderen'
6/03/25
1 Media contribution
Press/Media: Expert Comment
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Technische Universiteit Eindhoven gaat ‘twee keer zoveel studenten opleiden’ voor de chipsector
27/07/24
1 Media contribution
Press/Media: Expert Comment
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Nearfield eist vanuit Rotterdam zijn plaats in de wereldwijde chipmarkt op
30/06/24
1 Media contribution
Press/Media: Expert Comment
Student theses
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Characterization of Intrinsic and Aluminum-doped ZnO Deposited by Spatial ALD
Broekema, T. M. P. (Author), Macco, B. (Supervisor 1), van de Loo, B. W. H. (External coach) & Kessels, W. M. M. (Supervisor 2), 22 Sept 2021Student thesis: Master
File -
Development and implementation of advanced plasma diagnostics to study plasma–surface interactions in H2 plasmas
van Gurp, M. C. (Author), Kessels, W. M. M. (Supervisor 1), Morgan, T. W. (Supervisor 2), Salden, T. P. W. (Supervisor 2) & van den Biggelaar, T. (Supervisor 2), 16 Jul 2024Student thesis: Master
File -
Enhancing the Electrical Properties of Atomic Layer Deposited WS2 by Ar or H2 Plasma Exposure
van Ommeren, M. (Author), Balasubramanyam, S. (Supervisor 1) & Bol, A. A. (Supervisor 2), Sept 2018Student thesis: Master
File