Research Output per year
Organization profile
Introduction / mission
Our scientific objective is to obtain atomic-level understanding of the interaction of plasmas and reactive gases with materials in the field of atomic scale processing.
Highlighted phrase
We are unique in our approach to studying plasma and surface processes in situ and in real time with a large set of current and new diagnostics
Organisational profile
We focus on advancing the science and technology of plasma and materials processing, a multidisciplinary research area that encompasses the research fields of plasma physics, surface science and materials science. Our aim is to be an internationally leading group in the field of atomic scale processing, for present-day and future applications in energy technologies, nanoelectronics and nanotechnology.
The group studies the physics of the plasma medium, how reactive species interact with surfaces and how atomic scale processes can be used to fabricate, prepare or modify materials and their surfaces. We do so through our advanced processing facilities, our large set of plasma and surface diagnostics and state-of-the-art material analysis techniques.
The interaction of plasmas and reactive gases with materials plays a key role in many fields in science and technology. Consequently, our research ranges from fundamental plasma studies for CO2 recycling to nanoscale deposition and etch processes for nanoelectronics and technologies for energy conversion and storage technologies. Our application-oriented research is directly relevant for many current developments within society and industry. This is illustrated by our many close industrial collaborations and a significant number of valorization successes in the recent years.
The PMP group has established an internationally leading position in the area of atomic scale processing, particularly in the preparation of nanolayers and nanostructures by means of methods such as (plasma-based) atomic layer deposition (ALD). Building on this, we explore societally and technologically relevant new fields such as plasma-based approaches for CO2 recycling in renewable fuels, carrier-selective passivating contacts in silicon solar cells, area-selective ALD for semiconductor nanopatterning, nanolayer films to enable novel organo-lead halide perovskite solar cells and plasma-assisted ALD of 2D transition metal dichalcogenides (2D-TMDs). The common denominators between these research lines are the studies of the interaction of plasmas and reactive gases with materials by advanced diagnostics.
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Network
Recent external collaboration on country level. Dive into details by clicking on the dots.
Profiles
Karsten Arts, MSc
- Department of Applied Physics, Plasma & Materials Processing - Doctoral Candidate
Person: Prom. : doctoral candidate (PhD)
Saravana Balaji Basuvalingam
- Department of Applied Physics, Plasma & Materials Processing - Doctoral Candidate
Person: Prom. : doctoral candidate (PhD)
Research Output
ALD – a truly enabling nanotechnology: And how the Netherlands contributed to its wide spread application
Kessels, W. M. M., 2 Jun 2020, In : Nevac Blad. 58, special, p. 6-9 2.Research output: Contribution to journal › Article › Popular
Anisotropic infrared light emission from quasi-1D layered TiS3
Khatibi, A., Godiksen, R., Basuvalingam, S., Pellegrino, D., Bol, A., Shokri, B. & Curto, A. G., 1 Jan 2020, In : 2D Materials. 7, 1, 8 p., 015022.Research output: Contribution to journal › Article › Academic › peer-review
Open Access
File
1
Citation
(Scopus)
18
Downloads
(Pure)
Area-selective atomic layer deposition for bottom-up fabrication of nanoelectronics
Mackus, A. J. M., Merkx, M. J. M. & Li, J., 2 Jun 2020, In : Nevac Blad. 58, special on ALD, p. 32-34 2.Research output: Contribution to journal › Article › Popular
Equipment
Ceramic Cascade Arch
M.C.M. (Richard) van de Sanden (Manager)
Plasma & Materials ProcessingFacility/equipment: Equipment
Chemical Vapor Deposition
J.J.M. Sanders (Manager)
Plasma & Materials ProcessingFacility/equipment: Equipment
Prizes
2nd prize student award competition
Bart Macco (Recipient), 26 Jul 2016
Prize: Other › Career, activity or publication related prizes (lifetime, best paper, poster etc.) › Scientific
ALD Best Student Paper Award
Martijn Vos (Recipient), 23 Jul 2019
Prize: Other › Career, activity or publication related prizes (lifetime, best paper, poster etc.) › Scientific
ALD Best Student Paper Award
Jeff J.P.M. Schulpen (Recipient), 29 Jun 2020
Prize: Other › Career, activity or publication related prizes (lifetime, best paper, poster etc.) › Scientific
Activities
New Process Concepts Towards Area-Selective Atomic Layer Deposition and Atomic Layer Etching of Zinc Oxide
A. Mameli (Member), M.A. Verheijen (Member), B. Karasulu (Member), A.J.M. Mackus (Member), W.M.M. Kessels (Member), F. Roozeboom (Speaker)30 Sep 2018 → 4 Oct 2018
Activity: Talk or presentation types › Contributed talk › Scientific
Atomic Layer Etching of ZnO on 2D and 3D substrates, using acetylacetone and O2 plasma
A. Mameli (Member), M.A. Verheijen (Member), B. Karasulu (Member), A.J.M. Mackus (Member), W.M.M. Kessels (Member), F. Roozeboom (Invited speaker)24 Jul 2018 → 28 Jul 2018
Activity: Talk or presentation types › Invited talk › Scientific
Overview of approaches for achieving area-selective ALD
A.J.M. Mackus (Invited speaker)29 Apr 2018 → 1 May 2018
Activity: Talk or presentation types › Invited talk › Scientific
Press / Media
Research areas
Advanced ALD technologies
M. (Adriana) Creatore (Researcher), W.M.M. (Erwin) Kessels (Researcher), Adrie J.M. Mackus (Researcher)
Impact: Research Topic/Theme (at group level)
CO2 neutral fuels
Richard A.H. Engeln (Researcher), W.M.M. (Erwin) Kessels (Researcher)
Impact: Research Topic/Theme (at group level)
Student theses
µ-Plasma assisted deposition of titanium dioxide thin films
Author: Verheyen, J., 2017Supervisor: Creatore, M. (. (Supervisor 1), Aghaee, M. (Supervisor 2) & Stevens, A. A. (External coach)
Student thesis: Master
File
Ab-initio insights into the tunability of the electronic structure in transition metal dichalcogenide alloys grown by atomic layer deposition
Author: Schulpen, J. J., 2018Supervisor: Vandalon, V. (Supervisor 1) & Bol, A. A. (Supervisor 2)
Student thesis: Master
File
ALD metal oxides for passivating contacts: in c-Si solar cells
Author: Scheerder, R., 2017Supervisor: Melskens, J. (Supervisor 1), van de Loo, B. W. (Supervisor 2) & Kessels, W. (. (Supervisor 2)
Student thesis: Master
File