• P.O. Box 513, Flux

    5600 MB Eindhoven

    Netherlands

  • Groene Loper 19, Flux

    5612 AP Eindhoven

    Netherlands

Organization profile

Introduction / mission

Our scientific objective is to obtain atomic-level understanding of the interaction of plasmas and reactive gases with materials in the field of atomic scale processing.

Highlighted phrase

We are unique in our approach to studying plasma and surface processes in situ and in real time with a large set of current and new diagnostics

Organisational profile

We focus on advancing the science and technology of plasma and materials processing, a multidisciplinary research area that encompasses the research fields of plasma physics, surface science and materials science. Our aim is to be an internationally leading group in the field of atomic scale processing, for present-day and future applications in energy technologies, nanoelectronics and nanotechnology.

The group studies the physics of the plasma medium, how reactive species interact with surfaces and how atomic scale processes can be used to fabricate, prepare or modify materials and their surfaces. We do so through our advanced processing facilities, our large set of plasma and surface diagnostics and state-of-the-art material analysis techniques.

The interaction of plasmas and reactive gases with materials plays a key role in many fields in science and technology. Consequently, our research ranges from fundamental plasma studies for CO2 recycling to nanoscale deposition and etch processes for nanoelectronics and technologies for energy conversion and storage technologies. Our application-oriented research is directly relevant for many current developments within society and industry. This is illustrated by our many close industrial collaborations and a significant number of valorization successes in the recent years.

The PMP group has established an internationally leading position in the area of atomic scale processing, particularly in the preparation of nanolayers and nanostructures by means of methods such as  (plasma-based) atomic layer deposition (ALD). Building on this, we explore societally and technologically relevant new fields such as plasma-based approaches for CO2 recycling in renewable fuels, carrier-selective passivating contacts in silicon solar cells, area-selective ALD for semiconductor nanopatterning, nanolayer films to enable novel organo-lead halide perovskite solar cells and plasma-assisted ALD of 2D transition metal dichalcogenides (2D-TMDs). The common denominators between these research lines are the studies of the interaction of plasmas and reactive gases with materials by advanced diagnostics.

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Profiles

No photo of Sumit Agarwal

Sumit Agarwal

Person: OWP : University Teacher / Researcher

20012017
Photo of Morteza Aghaee

Morteza Aghaee

Person: Prom. : doctoral candidate (PhD)

20152018
Photo of Karsten Arts

Karsten Arts, MSc

Person: Prom. : doctoral candidate (PhD)

20172018

Research Output 1965 2019

Enhancement of the photocurrent and efficiency of CdTe solar cells suppressing the front contact reflection using a highly-resistive ZnO buffer layer

Kartopu, G., Williams, B. L., Zardetto, V., Gürlek, A. K., Clayton, A. J., Jones, S., Kessels, W. M. M., Creatore, M. & Irvine, S. J. C., 14 Nov 2019, In : Solar Energy Materials and Solar Cells. 191, p. 78-82

Research output: Contribution to journalArticleAcademicpeer-review

Buffer layers
Photocurrents
Solar cells
Conversion efficiency
Reflectometers

A combinational approach to enhance barrier properties of thin films of polymers: Seeding and capping of PECVD thin films by PEALD

Gebhard, M., Mitschker, F., Hoppe, C., Aghaee, M., Rogalla, D., Creatore, M., Grundmeier, G., Awakowicz, P. & Devi, A. P. K., 8 Mar 2018, In : Plasma Processes and Polymers. 15, 5, 11 p., 1700209

Research output: Contribution to journalArticleAcademicpeer-review

Atomic layer deposition
Plasma enhanced chemical vapor deposition
inoculation
atomic layer epitaxy
Polymers

Alternative target concepts for power and particle exhaust in fusion application

Kvon, V., 19 Dec 2018, (Accepted/In press) Eindhoven: Technische Universiteit Eindhoven. 155 p.

Research output: ThesisPhd Thesis 1 (Research TU/e / Graduation TU/e)Academic

Open Access
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Equipment

ALD

J.J.M. Sanders (Manager)

Plasma & Materials Processing

Facility/equipment: Equipment

Atomic layer deposition
Chemical vapor deposition
Monolayers
Molecules
Surface reactions

Chemical Vapor Deposition

J.J.M. Sanders (Manager)

Plasma & Materials Processing

Facility/equipment: Equipment

Chemical vapor deposition
Substrates
Plasma enhanced chemical vapor deposition
Byproducts
Flow of gases

Prizes

2nd prize student award competition

Bart Macco (Recipient), 26 Jul 2016

Recognition: OtherCareer, activity or publication related prizes (lifetime, best paper, poster etc.)Scientific

Atomic layer deposition of two-dimensional transition metal dichalcogenide nanolayers

Ageeth Bol (Recipient), 2014

Recognition: ERCConsolidatorScientific

atomic layer epitaxy
transition metals
synthesis
plasma chemistry
flakes

AVS James Harper Award

Alberto Perrotta (Recipient), 16 Nov 2016

Recognition: OtherCareer, activity or publication related prizes (lifetime, best paper, poster etc.)Scientific

Activities 1995 2018

Atomic Layer Etching of ZnO on 2D and 3D substrates, using acetylacetone and O2 plasma

Mameli, A. (Member), Verheijen, M. (Member), Karasulu, B. (Member), Mackus, A. (Member), Kessels, E. (Member), Roozeboom, F. (Invited speaker)
24 Jul 201828 Jul 2018

Activity: Talk or presentationInvited talkScientific

Overview of approaches for achieving area-selective ALD

Mackus, A. (Invited speaker)
29 Apr 20181 May 2018

Activity: Talk or presentationInvited talkScientific

New Process Concepts Towards Area-Selective Atomic Layer Deposition and Atomic Layer Etching of Zinc Oxide

Mameli, A. (Member), Verheijen, M. (Member), Karasulu, B. (Member), Mackus, A. (Member), Kessels, E. (Member), Roozeboom, F. (Speaker)
30 Sep 20184 Oct 2018

Activity: Talk or presentationContributed talkScientific

Research areas

Advanced ALD technologies

Adriana Creatore (Researcher), W.M.M. (Erwin) Kessels (Researcher), Adrie J.M. Mackus (Researcher)

Impact: Research Topic/Theme (at group level)

ALD for energy

Adriana Creatore (Researcher)

Impact: Research Topic/Theme (at group level)

CO2 neutral fuels

Richard Engeln (Researcher), W.M.M. (Erwin) Kessels (Researcher)

Impact: Research Topic/Theme (at group level)

Student theses

Magneetveldgeneratie in plasma's : spectroscopische metingen aan een expanderend cascadeboogplasma

Author: Bollen, G., 31 Dec 1988

Supervisor: Gielen, H. (Supervisor 1) & Schram, D. (Supervisor 2)

Student thesis: Master

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