Projects per year
Organisation profile
Introduction / mission
Our scientific objective is to obtain atomic-level understanding of the interaction of plasmas and reactive gases with materials in the field of atomic scale processing.
Highlighted phrase
We are unique in our approach to studying plasma and surface processes in situ and in real time with a large set of current and new diagnostics
Organisation profile
We focus on advancing the science and technology of plasma and materials processing, a multidisciplinary research area that encompasses the research fields of plasma physics, surface science and materials science. Our aim is to be an internationally leading group in the field of atomic scale processing, for present-day and future applications in energy technologies, nanoelectronics and nanotechnology.
The group studies the physics of the plasma medium, how reactive species interact with surfaces and how atomic scale processes can be used to fabricate, prepare or modify materials and their surfaces. We do so through our advanced processing facilities, our large set of plasma and surface diagnostics and state-of-the-art material analysis techniques.
The interaction of plasmas and reactive gases with materials plays a key role in many fields in science and technology. Consequently, our research ranges from fundamental plasma studies for CO2 recycling to nanoscale deposition and etch processes for nanoelectronics and technologies for energy conversion and storage technologies. Our application-oriented research is directly relevant for many current developments within society and industry. This is illustrated by our many close industrial collaborations and a significant number of valorization successes in the recent years.
The PMP group has established an internationally leading position in the area of atomic scale processing, particularly in the preparation of nanolayers and nanostructures by means of methods such as (plasma-based) atomic layer deposition (ALD). Building on this, we explore societally and technologically relevant new fields such as plasma-based approaches for CO2 recycling in renewable fuels, carrier-selective passivating contacts in silicon solar cells, area-selective ALD for semiconductor nanopatterning, nanolayer films to enable novel organo-lead halide perovskite solar cells and plasma-assisted ALD of 2D transition metal dichalcogenides (2D-TMDs). The common denominators between these research lines are the studies of the interaction of plasmas and reactive gases with materials by advanced diagnostics.
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Collaborations and top research areas from the last five years
Profiles
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Willem-Jan H. Berghuis, MSc
- Applied Physics and Science Education, Plasma & Materials Processing - University Researcher
- Applied Physics and Science Education, Atomic scale processing
- Mechanical Engineering, Group Den Toonder - University Researcher
Person: Prom. : doctoral candidate (PhD), OWP : University Teacher / Researcher
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Thomas van den Biggelaar
- Applied Physics and Science Education, Plasma & Materials Processing - Doctoral Candidate
Person: Prom. : doctoral candidate (PhD)
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Olaf Bolkenbaas
- Applied Physics and Science Education, Plasma & Materials Processing - Doctoral Candidate
Person: Prom. : doctoral candidate (PhD)
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Sample Runs
Kessels, W. M. M. (Project Manager) & Kessels, W. M. M. (Project Manager)
1/03/22 → 30/06/25
Project: Third tier
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DAC Maturation
Creatore, M. (Project Manager), van Bommel, C. (Project member), van der Hagen, D. (Project communication officer), Sonar, S. (Project member) & Zeebregts, J. (Project member)
15/04/22 → 29/02/24
Project: Research direct
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Metal Oxides: Maturing of an Efficient Novel Technology Upgrade for PV-Manufacturing
Kessels, W. M. M. (Project Manager), Koushik, D. (Project member) & Theeuwes, R. J. (Project member)
1/02/20 → 30/06/22
Project: Research direct
Research output
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3D electrode surface engineering via atomic layer deposition of nickel oxide for improved water oxidation performance
Haghverdi Khamene, S. (Corresponding author), Creatore, M. & Tsampas, M. (Corresponding author-nrf), May 2025, In: Chemical Engineering Journal Advances. 22, 14 p., 100723.Research output: Contribution to journal › Article › Academic › peer-review
Open AccessFile12 Downloads (Pure) -
Contact Resistance Optimization in MoS2 Field-Effect Transistors through Reverse Sputtering-Induced Structural Modifications
Fa, Y., Piacentini, A., Macco, B., Kalisch, H., Heuken, M., Vescan, A., Wang, Z. (Corresponding author) & Lemme, M. C. (Corresponding author), 23 Apr 2025, In: ACS Applied Materials & Interfaces. 17, 16, p. 24526-24534 9 p.Research output: Contribution to journal › Article › Academic › peer-review
Open AccessFile1 Downloads (Pure) -
Dimension Control of Hexagonal SiGe Single Branched Nanowires
Lamon, D., van der Donk, H. A. J., Verheijen, M. A., Jansen, M. M. & Bakkers, E. P. A. M. (Corresponding author), 9 Apr 2025, In: Nano Letters. 25, 14, p. 5741-5746 6 p., 5c00267.Research output: Contribution to journal › Article › Academic › peer-review
Open AccessFile1 Downloads (Pure)
Equipment
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Ceramic Cascade Arch
van de Sanden , M. C. M. (Manager)
Plasma & Materials ProcessingFacility/equipment: Equipment
Datasets
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Universal Platform for Scalable Semiconductor-Superconductor Nanowire Networks
Jung, J. (Contributor), Op het Veld, R. L. M. (Contributor), Benoist, R. (Contributor), Verheijen, M. A. (Contributor), Manders, C. (Contributor) & Bakkers, E. P. A. M. (Contributor), Zenodo, 13 May 2021
DOI: 10.5281/zenodo.4758551, https://zenodo.org/record/4758551
Dataset
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OES toolbox
Held, J. (Creator), Zenodo, 20 Dec 2024
DOI: 10.5281/zenodo.13986864, https://oes-toolbox.com/ and one more link, https://github.com/Julian-Held/OES-toolbox (show fewer)
Dataset: Software
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Data underlying the publication: Packing of inhibitor molecules during area-selective atomic layer deposition studied using random sequential adsorption simulations
Li, J. (Creator), Tezsevin, I. (Creator), Merkx, M. J. M. (Creator), Maas, J. F. W. (Creator), Kessels, W. M. M. (Creator), Sandoval, T. E. (Creator) & Mackus, A. J. M. (Creator), 4TU.Centre for Research Data, 7 Aug 2023
DOI: 10.4121/33df3424-ed9b-49cb-910e-64a6d37aa6b0, https://data.4tu.nl/datasets/33df3424-ed9b-49cb-910e-64a6d37aa6b0 and one more link, https://data.4tu.nl/datasets/33df3424-ed9b-49cb-910e-64a6d37aa6b0/1 (show fewer)
Dataset
Prizes
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1st place ALD Poster Award
de Jong, A. A. (Recipient), 6 Aug 2024
Prize: Other › Career, activity or publication related prizes (lifetime, best paper, poster etc.) › Scientific
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2nd prize student award competition
Macco, B. (Recipient), 26 Jul 2016
Prize: Other › Career, activity or publication related prizes (lifetime, best paper, poster etc.) › Scientific
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ALD Best Student Paper Award
Schulpen, J. J. P. M. (Recipient), 29 Jun 2020
Prize: Other › Career, activity or publication related prizes (lifetime, best paper, poster etc.) › Scientific
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POx/Al2O3 stacks for surface passivation of Si and InP
Theeuwes, R. J. (Speaker)
10 May 2022Activity: Talk or presentation types › Contributed talk › Scientific
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Excellent Surface Passivation of n+-doped Silicon by POx/Al2O3 Stacks with High Positive Fixed Charge Density
Theeuwes, R. J. (Speaker)
9 May 2022Activity: Talk or presentation types › Contributed talk › Scientific
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2022 MRS Spring Meeting & Exhibit, May 8-13, 2022, Honolulu, Hawai'i, May 23-25, 2022, Virtual
Theeuwes, R. J. (Participant)
8 May 2022 → 13 May 2022Activity: Participating in or organising an event types › Conference › Scientific
Press/Media
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Bedrijf van Matthijs (29) haalt 20 miljoen binnen voor maken van supercomputer: 'Gaat wereld veranderen'
6/03/25
1 Media contribution
Press/Media: Expert Comment
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Hoe zorgt nano-technologie voor steeds kleinere en betere computerchips?
20/02/25
1 Media contribution
Press/Media: Public Engagement Activities
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Technische Universiteit Eindhoven gaat ‘twee keer zoveel studenten opleiden’ voor de chipsector
27/07/24
1 Media contribution
Press/Media: Expert Comment
Research areas
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Advanced ALD technologies
Creatore, M. (Researcher), Kessels, W. M. M. (Researcher) & Mackus, A. J. M. (Researcher)
Impact: Research Topic/Theme (at group level)
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CO2 neutral fuels
Engeln, R. A. H. (Researcher) & Kessels, W. M. M. (Researcher)
Impact: Research Topic/Theme (at group level)
Student theses
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µ-Plasma assisted deposition of titanium dioxide thin films
Verheyen, J. (Author), Creatore, M. (Supervisor 1), Aghaee, M. (Supervisor 2) & Stevens, A. A. E. (External coach), 2017Student thesis: Master
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Ab-initio insights into the tunability of the electronic structure in transition metal dichalcogenide alloys grown by atomic layer deposition
Schulpen, J. J. P. M. (Author), Vandalon, V. (Supervisor 1) & Bol, A. A. (Supervisor 2), 2018Student thesis: Master
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Absolute Atomic Hydrogen Densities in Low Pressure Electron Cyclotron Resonance Plasmas measured using Optical Emission Spectroscopy
van Deudekom, S. F. (Author), Nijdam, S. (Supervisor 1), Engeln, R. A. H. (Supervisor 2) & van der Horst, R. M. (External coach), Mar 2024Student thesis: Master
File