Research Output per year
Organization profile
Introduction / mission
Our scientific objective is to obtain atomic-level understanding of the interaction of plasmas and reactive gases with materials in the field of atomic scale processing.
Highlighted phrase
We are unique in our approach to studying plasma and surface processes in situ and in real time with a large set of current and new diagnostics
Organisational profile
We focus on advancing the science and technology of plasma and materials processing, a multidisciplinary research area that encompasses the research fields of plasma physics, surface science and materials science. Our aim is to be an internationally leading group in the field of atomic scale processing, for present-day and future applications in energy technologies, nanoelectronics and nanotechnology.
The group studies the physics of the plasma medium, how reactive species interact with surfaces and how atomic scale processes can be used to fabricate, prepare or modify materials and their surfaces. We do so through our advanced processing facilities, our large set of plasma and surface diagnostics and state-of-the-art material analysis techniques.
The interaction of plasmas and reactive gases with materials plays a key role in many fields in science and technology. Consequently, our research ranges from fundamental plasma studies for CO2 recycling to nanoscale deposition and etch processes for nanoelectronics and technologies for energy conversion and storage technologies. Our application-oriented research is directly relevant for many current developments within society and industry. This is illustrated by our many close industrial collaborations and a significant number of valorization successes in the recent years.
The PMP group has established an internationally leading position in the area of atomic scale processing, particularly in the preparation of nanolayers and nanostructures by means of methods such as (plasma-based) atomic layer deposition (ALD). Building on this, we explore societally and technologically relevant new fields such as plasma-based approaches for CO2 recycling in renewable fuels, carrier-selective passivating contacts in silicon solar cells, area-selective ALD for semiconductor nanopatterning, nanolayer films to enable novel organo-lead halide perovskite solar cells and plasma-assisted ALD of 2D transition metal dichalcogenides (2D-TMDs). The common denominators between these research lines are the studies of the interaction of plasmas and reactive gases with materials by advanced diagnostics.
Network
Recent external collaboration on country level. Dive into details by clicking on the dots.
Profiles
Morteza Aghaee
- Department of Applied Physics, Plasma & Materials Processing - Doctoral Candidate
Person: Prom. : doctoral candidate (PhD)
Karsten Arts, MSc
- Department of Applied Physics, Plasma & Materials Processing - Doctoral Candidate
Person: Prom. : doctoral candidate (PhD)
Shashank Balasubramanyam
- Department of Applied Physics, Plasma & Materials Processing - Doctoral Candidate
Person: Prom. : doctoral candidate (PhD)
Research Output 1965 2019
21.6%-efficient monolithic perovskite/Cu(In,Ga)Se2 tandem solar cells with thin conformal hole transport layers for integration on rough bottom bell surfaces
Jošt, M., Bertram, T., Koushik, D., Marquez, J. A., Verheijen, M. A., Heinemann, M. D., Köhnen, E., Al-Ashouri, A., Braunger, S., Lang, F., Rech, B., Unold, T., Creatore, M., Lauermann, I., Kaufmann, C. A., Schlatmann, R. & Albrecht, S., 24 Jan 2019, In : ACS Energy Letters. 4, p. 583-590 8 p.Research output: Contribution to journal › Article › Academic › peer-review
Perovskite
Solar cells
Conversion efficiency
Volatile organic compounds
Atomic layer deposition
Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
Di Palma, V., Zafeiropoulos, G., Goldsweer, T., Kessels, W. M. M., van de Sanden, M. C. M., Creatore, M. & Tsampas, M. N., 1 Jan 2019, In : Electrochemistry Communications. 98, p. 73-77 5 p.Research output: Contribution to journal › Article › Academic › peer-review
Open Access
File
Atomic layer deposition
Cobalt
Phosphates
Electrocatalysts
Oxygen
Chemical analysis of the interface between hybrid organic−inorganic perovskite and atomic layer deposited Al2O3
Koushik, D., Hazendonk, L., Zardetto, V., Vandalon, V., Verheijen, M. A., Kessels, W. M. M. & Creatore, M., 9 Jan 2019, In : ACS Applied Materials & Interfaces. 11, p. 5526-5535 10 p.Research output: Contribution to journal › Article › Academic › peer-review
Open Access
File
Perovskite
Atomic layer deposition
Chemical analysis
Infrared radiation
Stretching
Equipment
Atomic layer deposition
Chemical vapor deposition
Monolayers
Molecules
Surface reactions
Ceramic Cascade Arch
Richard van de Sanden (Manager)
Plasma & Materials ProcessingFacility/equipment: Equipment
Chemical Vapor Deposition
J.J.M. Sanders (Manager)
Plasma & Materials ProcessingFacility/equipment: Equipment
Chemical vapor deposition
Substrates
Plasma enhanced chemical vapor deposition
Byproducts
Flow of gases
Prizes
2nd prize student award competition
Bart Macco (Recipient), 26 Jul 2016
Recognition: Other › Career, activity or publication related prizes (lifetime, best paper, poster etc.) › Scientific
Atomic layer deposition of two-dimensional transition metal dichalcogenide nanolayers
Ageeth Bol (Recipient), 2014
Recognition: ERC › Consolidator › Scientific
atomic layer epitaxy
transition metals
synthesis
plasma chemistry
flakes
AVS James Harper Award
Alberto Perrotta (Recipient), 16 Nov 2016
Recognition: Other › Career, activity or publication related prizes (lifetime, best paper, poster etc.) › Scientific
Activities 1995 2018
New Process Concepts Towards Area-Selective Atomic Layer Deposition and Atomic Layer Etching of Zinc Oxide
A. Mameli (Member), M.A. Verheijen (Member), B. Karasulu (Member), A.J.M. Mackus (Member), W.M.M. Kessels (Member), F. Roozeboom (Speaker)30 Sep 2018 → 4 Oct 2018
Activity: Talk or presentation types › Contributed talk › Scientific
Overview of approaches for achieving area-selective ALD
A.J.M. Mackus (Invited speaker)29 Apr 2018 → 1 May 2018
Activity: Talk or presentation types › Invited talk › Scientific
Atomic Layer Etching of ZnO on 2D and 3D substrates, using acetylacetone and O2 plasma
A. Mameli (Member), M.A. Verheijen (Member), B. Karasulu (Member), A.J.M. Mackus (Member), W.M.M. Kessels (Member), F. Roozeboom (Invited speaker)24 Jul 2018 → 28 Jul 2018
Activity: Talk or presentation types › Invited talk › Scientific
Press / Media
WIPO PUBLISHES PATENT OF TECHNISCHE UNIVERSITEIT EINDHOVEN FOR "PEROVSKITE CONTACTING PASSIVATING BARRIER LAYER FOR SOLAR CELLS" (DUTCH INVENTORS)
Adriana Creatore & Dibyashree Koushik
14/01/18
1 item of media coverage
Press/Media: Expert Comment
Nano-hashtags could provide definite proof of Majorana particles - crucial step towards quantum computer ...
Erik Bakkers, Marcel Verheijen, Sasa Gazibegovic & Roy Op het Veld
29/08/17
1 item of media coverage
Press/Media: Expert Comment
'Nano-hashtags' could provide definite proof of Majorana particles
Erik Bakkers, Marcel Verheijen, Roy Op het Veld & Sasa Gazibegovic
23/08/17 → 28/08/17
5 items of media coverage
Press/Media: Expert Comment
Research areas
Advanced ALD technologies
ALD for energy
CO2 neutral fuels
Student theses
Magneetveldgeneratie in plasma's : spectroscopische metingen aan een expanderend cascadeboogplasma
Author: Bollen, G., 31 Dec 1988Supervisor: Gielen, H. (Supervisor 1) & Schram, D. (Supervisor 2)
Student thesis: Master
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