Research Output per year
Organization profile
Introduction / mission
Our scientific objective is to obtain atomic-level understanding of the interaction of plasmas and reactive gases with materials in the field of atomic scale processing.
Highlighted phrase
We are unique in our approach to studying plasma and surface processes in situ and in real time with a large set of current and new diagnostics
Organisational profile
We focus on advancing the science and technology of plasma and materials processing, a multidisciplinary research area that encompasses the research fields of plasma physics, surface science and materials science. Our aim is to be an internationally leading group in the field of atomic scale processing, for present-day and future applications in energy technologies, nanoelectronics and nanotechnology.
The group studies the physics of the plasma medium, how reactive species interact with surfaces and how atomic scale processes can be used to fabricate, prepare or modify materials and their surfaces. We do so through our advanced processing facilities, our large set of plasma and surface diagnostics and state-of-the-art material analysis techniques.
The interaction of plasmas and reactive gases with materials plays a key role in many fields in science and technology. Consequently, our research ranges from fundamental plasma studies for CO2 recycling to nanoscale deposition and etch processes for nanoelectronics and technologies for energy conversion and storage technologies. Our application-oriented research is directly relevant for many current developments within society and industry. This is illustrated by our many close industrial collaborations and a significant number of valorization successes in the recent years.
The PMP group has established an internationally leading position in the area of atomic scale processing, particularly in the preparation of nanolayers and nanostructures by means of methods such as (plasma-based) atomic layer deposition (ALD). Building on this, we explore societally and technologically relevant new fields such as plasma-based approaches for CO2 recycling in renewable fuels, carrier-selective passivating contacts in silicon solar cells, area-selective ALD for semiconductor nanopatterning, nanolayer films to enable novel organo-lead halide perovskite solar cells and plasma-assisted ALD of 2D transition metal dichalcogenides (2D-TMDs). The common denominators between these research lines are the studies of the interaction of plasmas and reactive gases with materials by advanced diagnostics.
Fingerprint Dive into the research topics where Plasma & Materials Processing is active. These topic labels come from the works of this organisation's members. Together they form a unique fingerprint.
Atomic layer deposition
Engineering & Materials Science
atomic layer epitaxy
Physics & Astronomy
Plasmas
Engineering & Materials Science
passivity
Physics & Astronomy
solar cells
Physics & Astronomy
Silicon
Chemical Compounds
Passivation
Engineering & Materials Science
Solar cells
Engineering & Materials Science
Network
Recent external collaboration on country level. Dive into details by clicking on the dots.
Profiles
Morteza Aghaee
- Department of Applied Physics, Plasma & Materials Processing - Former Doctoral Candidate
Person: Unknown
Karsten Arts, MSc
- Department of Applied Physics, Plasma & Materials Processing - Doctoral Candidate
Person: Prom. : doctoral candidate (PhD)
Shashank Balasubramanyam
- Department of Applied Physics, Plasma & Materials Processing - Doctoral Candidate
Person: Prom. : doctoral candidate (PhD)
Research Output 1965 2020
Low-temperature atomic layer deposited Magnesium Oxide as a passivating electron contact for c-Si-based solar cells
Chistaikova, G., Macco, B. & Korte, L., 17 Jan 2020, (Accepted/In press) In : IEEE Journal of Photovoltaics. 9 p.Research output: Contribution to journal › Article › Academic › peer-review
Magnesium Oxide
magnesium oxides
Magnesia
Silicon
Solar cells
Novel Responsive Materials for Reconfigurable Photonics
Mohammed, M., 30 Jan 2020, (Accepted/In press) Eindhoven: Technische Universiteit Eindhoven. 167 p.Research output: Thesis › Phd Thesis 1 (Research TU/e / Graduation TU/e)
Structure-property-performance relationships in photoanode materials
Sinha, R., 13 Jan 2020, Eindhoven: Technische Universiteit Eindhoven. 200 p.Research output: Thesis › Phd Thesis 1 (Research TU/e / Graduation TU/e)
Open Access
File
Equipment
Atomic layer deposition
Chemical vapor deposition
Monolayers
Molecules
Surface reactions
Ceramic Cascade Arch
M.C.M. (Richard) van de Sanden (Manager)
Plasma & Materials ProcessingFacility/equipment: Equipment
Chemical Vapor Deposition
J.J.M. Sanders (Manager)
Plasma & Materials ProcessingFacility/equipment: Equipment
Chemical vapor deposition
Substrates
Plasma enhanced chemical vapor deposition
Byproducts
Flow of gases
Prizes
2nd prize student award competition
Bart Macco (Recipient), 26 Jul 2016
Prize: Other › Career, activity or publication related prizes (lifetime, best paper, poster etc.) › Scientific
ALD Best Student Paper Award
Martijn Vos (Recipient), 23 Jul 2019
Prize: Other › Career, activity or publication related prizes (lifetime, best paper, poster etc.) › Scientific
ALD Innovator Award
Erwin Kessels (Recipient), 22 Jul 2019
Prize: Other › Career, activity or publication related prizes (lifetime, best paper, poster etc.) › Scientific
Activities 1995 2018
New Process Concepts Towards Area-Selective Atomic Layer Deposition and Atomic Layer Etching of Zinc Oxide
A. Mameli (Member), M.A. Verheijen (Member), B. Karasulu (Member), A.J.M. Mackus (Member), W.M.M. Kessels (Member), F. Roozeboom (Speaker)30 Sep 2018 → 4 Oct 2018
Activity: Talk or presentation types › Contributed talk › Scientific
Atomic Layer Etching of ZnO on 2D and 3D substrates, using acetylacetone and O2 plasma
A. Mameli (Member), M.A. Verheijen (Member), B. Karasulu (Member), A.J.M. Mackus (Member), W.M.M. Kessels (Member), F. Roozeboom (Invited speaker)24 Jul 2018 → 28 Jul 2018
Activity: Talk or presentation types › Invited talk › Scientific
Overview of approaches for achieving area-selective ALD
A.J.M. Mackus (Invited speaker)29 Apr 2018 → 1 May 2018
Activity: Talk or presentation types › Invited talk › Scientific
Press / Media
Better thermal conductivity by adjusting the arrangement of atoms
Erik P.A.M. Bakkers, Marcel A. Verheijen & Sebastian Kölling
19/07/19 → 22/07/19
2 items of Media coverage
Press/Media: Expert Comment
University of Basel: Better Thermal Conductivity By Adjusting the Arrangement of Atoms
Erik P.A.M. Bakkers & Marcel A. Verheijen
19/07/19
1 item of Media coverage
Press/Media: Expert Comment
Thin-film tandem cells made of perovskite and CIGSe semiconductors
M. (Adriana) Creatore, Marcel A. Verheijen & Dibyashree Koushik
1/02/19
1 item of Media coverage
Press/Media: Expert Comment
Research areas
Advanced ALD technologies
M. (Adriana) Creatore (Researcher), W.M.M. (Erwin) Kessels (Researcher), Adrie J.M. Mackus (Researcher)
Impact: Research Topic/Theme (at group level)
CO2 neutral fuels
Richard A.H. Engeln (Researcher), W.M.M. (Erwin) Kessels (Researcher)
Impact: Research Topic/Theme (at group level)
Student theses
Magneetveldgeneratie in plasma's : spectroscopische metingen aan een expanderend cascadeboogplasma
Author: Bollen, G., 31 Dec 1988Supervisor: Gielen, H. (Supervisor 1) & Schram, D. (Supervisor 2)
Student thesis: Master
File
Tuning the electronic structure of 2D materials through defectivity and alloying: A combined experimental and theoretical study
Author: Schulpen, J., 9 Nov 2018Student thesis: Master