Equipment
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Oscilloscope 30 GHz, 80 GSa/s
van Dommele, R. (Manager)
Integrated CircuitsFacility/equipment: Equipment
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Oxford Instruments FlexAL 1
Sanders, J. J. M. (Manager)
Plasma & Materials ProcessingFacility/equipment: Equipment
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Oxford Instruments FlexAL 2
Sanders, J. J. M. (Manager)
Plasma & Materials ProcessingFacility/equipment: Equipment
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Oxford Instruments OpAL
Sanders, J. J. M. (Manager)
Plasma & Materials ProcessingFacility/equipment: Equipment
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Paraffin Embedding station, Leica EG 1140H
Janssen-van den Broek, W. J. T. (Manager)
Departmental Office BMTFacility/equipment: Equipment
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Photonics and Semiconductor Nanophysics (PSN labs)
Koenraad, P. M. (Manager)
Photonics and Semiconductor NanophysicsFacility/equipment: Research lab
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Piuma nano-indentor
Janssen-van den Broek, W. J. T. (Manager)
Departmental Office BMTFacility/equipment: Equipment
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Plasma and Materials Processing (PMP labs)
Kessels, W. M. M. (Manager)
Plasma & Materials ProcessingFacility/equipment: Research lab
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Plasma-Enhanced Chemical Vapor Deposition (PECVD) reactors
Sanders, J. J. M. (Manager)
Plasma & Materials ProcessingFacility/equipment: Equipment