Department of Applied Physics

Research Output

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2015

New patterning paradigm? : selective deposition may be the way forward to the far reaches of device scaling after 7nm.

Lapedus, M. & Kessels, W. M. M., 2015

Research output: Non-textual formWeb publication/siteProfessional

Open Access
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321 Downloads (Pure)
2012

Latest advances in plasma techniques used for atomic layer deposition

Kessels, W. M. M., 2012

Research output: Non-textual formWeb publication/siteProfessional