Research output per year
Research output per year
Organization profile
Introduction / mission
We focus on discovering how nanometer- to micrometer-scale particles interact with plasmas on the most fundamental level. These researched plasmas include electrically generated discharges and plasmas induced by highly energetic photons and electrons.
Fingerprint
Dive into the research topics where Complex Ionized Media is active. These topic labels come from the works of this organisation's members. Together they form a unique fingerprint.
Network
Recent external collaboration on country level. Dive into details by clicking on the dots or
Profiles
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Job Beckers
- Applied Physics, Complex Ionized Media
- Applied Physics, Elementary Processes in Gas Discharges - Associate Professor
Person: UHD : Associate Professor
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Tim J.M. Donders
- Applied Physics, Complex Ionized Media
- Applied Physics, Elementary Processes in Gas Discharges - Doctoral Candidate
Person: Prom. : doctoral candidate (PhD)
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Saman Hasani
- Applied Physics, Complex Ionized Media
- Applied Physics, Elementary Processes in Gas Discharges - Doctoral Candidate
Person: Prom. : doctoral candidate (PhD)
Research output
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Microparticle charging in spatial plasma afterglows
van Minderhout, B., 3 Feb 2021, Eindhoven: Technische Universiteit Eindhoven. 129 p.Research output: Thesis › Phd Thesis 1 (Research TU/e / Graduation TU/e)
Open AccessFile -
Addendum: Mapping electron dynamics in highly transient EUV photon-induced plasmas: a novel diagnostic approach using multi-mode microwave cavity resonance spectroscopy (2018 J PHYS D APPL PHYS 52 034004)
Platier, B., van de Wetering, F. M. J. H., van Ninhuijs, M., Brussaard, G. J. H. S., Banine, V. Y., Luiten, O. J. J. & Beckers, J., 26 Aug 2020, In : Journal of Physics D: Applied Physics. 53, 35, 3 p., 359401.Research output: Contribution to journal › Article › Academic › peer-review
Open Access -
Charge control of micro-particles in a shielded plasma afterglow
van Minderhout, B., van Huijstee, J. C. A., Platier, B., Peijnenburg, T., Blom, P. P. M., Kroesen, G. M. W. & Beckers, J., 9 Jun 2020, In : Plasma Sources Science and Technology. 29, 6, 11 p., 065005.Research output: Contribution to journal › Article › Academic › peer-review
1 Citation (Scopus)
Press / Media
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US Patent Issued to Technische Universiteit Eindhoven on Dec. 29 for "Plasma-assisted odour-free regulation of gas pressure inside stoma bag" (Dutch Inventors)
4/01/21
1 item of Media coverage
Press/Media: Expert Comment
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Seven new members at Eindhoven Young Academy of Engineering
Daniël Lakens, Frank P.T. Baaijens, Sandra Loerakker, Job Beckers, Patricia Y.W. Dankers, Yoeri B. van de Burgt, Bob Walrave, Danqing Liu, Johanna I. Höffken, S. Hofmann, J.P. (Jan Philipp) Hofmann, Federica Eduati, Roy van der Meel & Antoni Forner Cuenca
16/10/20
2 items of Media coverage
Press/Media: Expert Comment
Student theses
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A carbon-coated QCM-based atomic hydrogen sensor for in-situ plasma diagnostics
Author: van Mil, J., Dec 2020Supervisor: Beckers, J. (Supervisor 1) & van der Horst, R. M. (External coach)
Student thesis: Master
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A physical analysis of a plasma vacuum seal
Author: Kamycki, V. A., Nov 2020Supervisor: Blom, P. P. (Supervisor 1) & Beckers, J. (Supervisor 2)
Student thesis: Master
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Hydrogen plasma induced particle release: Effect of Hydrogen plasma on Zinc, Tin, Lead and Lead Oxides particles between 100nm and 10μm
Author: Oomen, O. A., Dec 2020Supervisor: Beckers, J. (Supervisor 1) & Nikipelov, A. (External coach)
Student thesis: Master
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