Projects per year
Introduction / mission
We aim to develop advanced atomic layer deposition and etching processes through in-depth understanding of the underlying reaction mechanisms. With this we try to enable future device technologies in nanoelectronics, photonics, photovoltaics and beyond.
Atomic scale processing for future device technologies
Whether it is in the field of nanoelectronics, photonics, photovoltaics or quantum technology, future device technologies will heavily depend on atomic scale processing techniques such as atomic layer deposition (ALD) and atomic layer etching (ALE). These techniques allow for atomic-scale control and they provide many opportunities for bottom-up processing of the multitude of materials that will make up future devices. With our research we try to develop advanced processes that will enable these future device technologies. Current interests include thermal and plasma-assisted ALD and ALE processes as well as area- and topographically-selective processing. Very importantly, it also involves fundamental studies of the underlying reaction mechanisms through advanced in situ studies coupled to atomistic modelling. Our direct research partners are mostly equipment manufacturers and suppliers of chemicals.
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A silicon carbide-based highly transparent passivating contact for crystalline silicon solar cells approaching efficiencies of 24%Köhler, M., Pomaska, M., Procel, P., Techn, D. U., Zamchiy, A., Macco, B., Lambertz, A., Duan, W., Cao, P., Klingebiel, B., Li, S., Eberst, A., Luysberg, M., Qiu, K., Isabella, O., Finger, F., Kirchartz, T., Rau, U. & Ding, K., May 2021, In: Nature Energy. 6, 5, p. 529-537 9 p.
Research output: Contribution to journal › Article › peer-reviewOpen Access
Atmospheric-pressure plasma-enhanced spatial Atomic Layer Deposition: a spectroscopic investigation of reaction mechanismsMione, M. A., 20 Oct 2021, Eindhoven: Eindhoven University of Technology. 221 p.
Research output: Thesis › Phd Thesis 1 (Research TU/e / Graduation TU/e)
Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ionsKarwal, S., Karasulu, B., Knoops, H. C. M., Vandalon, V., Kessels, W. M. M. & Creatore, M., 14 Jun 2021, In: Nanoscale. 13, 22, p. 10092-10099 8 p.
Research output: Contribution to journal › Article › peer-reviewOpen AccessFile1 Downloads (Pure)
W.M.M. (Erwin) Kessels (Speaker)10 Feb 2021
Activity: Talk or presentation types › Keynote talk › Scientific