Thermal CVD

    J.J.M. Sanders (Manager)
Plasma

Facility/equipment: Equipment

    Equipments Details

    Description

    One of the two thermal CVD systems available in the PMP group. These systems are used for the growth of graphene  and carbon nanotubes.   The ovens can be heated up to 1200°C and the systems can be operated at atmospheric pressure and low pressure (down to 0.1 mbar). The following gases are available in the systems: hydrogen, argon, methane and ethanol.

    Contact information

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    Equipment hierarchy

    Plasma and Materials Processing (PMP labs)
    Thermal CVD

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