Thermal CVD

  • J.J.M. Sanders (Manager)

Facility/equipment: Equipment

    Equipments Details


    One of the two thermal CVD systems available in the PMP group. These systems are used for the growth of graphene  and carbon nanotubes.   The ovens can be heated up to 1200°C and the systems can be operated at atmospheric pressure and low pressure (down to 0.1 mbar). The following gases are available in the systems: hydrogen, argon, methane and ethanol.

    Photo associated with equipment - Thermal_CVD.jpg


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