Micro-reactor in which gases can be introduced and discharged and consisting of a small oven containing a chip with platinum resistor. The oven temperature can range from room temperature up to 500º C. By means of directing electrical pulses through the platinum resistor, the temperature on the platinum surface can be raised step by step to as much as 400 to 500º C above the steady-state temperature. Pulse frequency and/or pulse level enable the reaction that occurs above the platinum surface to be controlled.
|Name||Pulsed Heater Micro Reactor|
|Manufacturers||Equipment & Prototype Center|
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